SG173335A1 - Composition, article, its manufacture and use - Google Patents

Composition, article, its manufacture and use Download PDF

Info

Publication number
SG173335A1
SG173335A1 SG2011048386A SG2011048386A SG173335A1 SG 173335 A1 SG173335 A1 SG 173335A1 SG 2011048386 A SG2011048386 A SG 2011048386A SG 2011048386 A SG2011048386 A SG 2011048386A SG 173335 A1 SG173335 A1 SG 173335A1
Authority
SG
Singapore
Prior art keywords
imaged
dissolution
coating
precursor
hydrophobic
Prior art date
Application number
SG2011048386A
Other languages
English (en)
Inventor
Peter Andrew Reath Bennett
Roberto Massimo Allegrini
Original Assignee
Heidelberg Asia Procurement Ct Sdn Bhd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heidelberg Asia Procurement Ct Sdn Bhd filed Critical Heidelberg Asia Procurement Ct Sdn Bhd
Publication of SG173335A1 publication Critical patent/SG173335A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/16—Halogen-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C07F9/5456—Arylalkanephosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/12—Preparation of material for subsequent imaging, e.g. corona treatment, simultaneous coating, pre-treatments
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG2011048386A 2006-06-30 2007-07-02 Composition, article, its manufacture and use SG173335A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0612984A GB2439734A (en) 2006-06-30 2006-06-30 Coating for a lithographic precursor and use thereof

Publications (1)

Publication Number Publication Date
SG173335A1 true SG173335A1 (en) 2011-08-29

Family

ID=36888365

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011048386A SG173335A1 (en) 2006-06-30 2007-07-02 Composition, article, its manufacture and use

Country Status (16)

Country Link
US (1) US20100233444A1 (https=)
EP (1) EP2035231A2 (https=)
JP (1) JP5078999B2 (https=)
KR (1) KR20090024151A (https=)
CN (1) CN101495312B (https=)
AU (1) AU2007263607B2 (https=)
BR (1) BRPI0713208A2 (https=)
CA (1) CA2656340A1 (https=)
GB (1) GB2439734A (https=)
MY (1) MY146634A (https=)
NZ (1) NZ573590A (https=)
RU (1) RU2008152236A (https=)
SG (1) SG173335A1 (https=)
TN (1) TNSN08500A1 (https=)
WO (1) WO2008001127A2 (https=)
ZA (1) ZA200900302B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2012023474A1 (ja) * 2010-08-20 2013-10-28 Jsr株式会社 着色剤、着色組成物、カラーフィルタ及び表示素子
EP2693270B1 (en) * 2011-03-28 2015-12-09 FUJIFILM Corporation Method for producing lithographic printing plate
RU2497785C2 (ru) * 2011-06-30 2013-11-10 Юрий Ильич Реутов Способ получения удобрений пролонгированного действия
JP5866829B2 (ja) 2011-07-04 2016-02-24 日清紡ホールディングス株式会社 イオン液体
CN102845315A (zh) * 2012-09-16 2013-01-02 李理 一种喂料器的吸入式喂料装置
CN105818562B (zh) * 2015-01-05 2018-06-15 中国科学院化学研究所 一种水性油墨用版材及其制备方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3022473A1 (de) 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
JP2964874B2 (ja) * 1994-06-10 1999-10-18 信越化学工業株式会社 化学増幅ポジ型レジスト材料
US5554664A (en) 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
JP3147908B2 (ja) * 1996-04-23 2001-03-19 コダック ポリクローム グラフィックス カンパニー リミテッド 感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法
EP0953166B1 (en) * 1997-07-05 2001-08-16 Kodak Polychrome Graphics LLC Pattern-forming methods
GB9722861D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Improvements in relation to the manufacture of lithographic printing forms
GB9722862D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
US6153353A (en) 1998-03-14 2000-11-28 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive imaging element
JP3791187B2 (ja) * 1998-06-03 2006-06-28 コニカミノルタホールディングス株式会社 画像形成材料及びそれを用いる画像形成方法
US6352812B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
TWI250379B (en) * 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
IL143158A0 (en) * 1998-11-16 2002-04-21 Mitsubishi Chem Corp Positive-working photosensitive lithographic printing plate and method for producing the same
US6163353A (en) * 1998-12-03 2000-12-19 Industrial Technology Research Institute Method for fabricating a reflective liquid crystal display panel having a reflector with an inclined surface and devices made
US6254955B1 (en) 1999-07-20 2001-07-03 Taiwan Hopax Chems. Mfg. Co., Ltd. Self-stick writing note
US6706466B1 (en) 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
US6391524B2 (en) * 1999-11-19 2002-05-21 Kodak Polychrome Graphics Llc Article having imagable coatings
JP2002318452A (ja) * 2001-04-23 2002-10-31 Mitsubishi Chemicals Corp ポジ型感光性組成物、ポジ型感光性平版印刷版及びそれを用いたポジ画像形成方法
US6772687B2 (en) * 2001-06-15 2004-08-10 Agfa-Gevaert Method for the preparation of a lithographic printing plate
JP3917422B2 (ja) * 2001-07-26 2007-05-23 富士フイルム株式会社 画像形成材料
JP4102603B2 (ja) * 2002-03-08 2008-06-18 富士フイルム株式会社 自動現像装置の補充液補充方法
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7160667B2 (en) 2003-01-24 2007-01-09 Fuji Photo Film Co., Ltd. Image forming material
JP2004233854A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd 画像形成材料
JP4054264B2 (ja) * 2003-01-24 2008-02-27 富士フイルム株式会社 ポジ型画像形成材料
EP1543959B1 (en) * 2003-12-18 2009-07-15 Agfa Graphics N.V. Heat-sensitive lithographic printing plate precursor.
JP2006011152A (ja) * 2004-06-28 2006-01-12 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006058430A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006091766A (ja) * 2004-09-27 2006-04-06 Fuji Photo Film Co Ltd 平版印刷版原版

Also Published As

Publication number Publication date
GB0612984D0 (en) 2006-08-09
RU2008152236A (ru) 2010-08-10
EP2035231A2 (en) 2009-03-18
TNSN08500A1 (en) 2010-04-14
AU2007263607A1 (en) 2008-01-03
JP2009543105A (ja) 2009-12-03
WO2008001127A3 (en) 2008-05-02
MY146634A (en) 2012-09-14
AU2007263607B2 (en) 2012-06-28
CN101495312A (zh) 2009-07-29
BRPI0713208A2 (pt) 2012-04-10
GB2439734A (en) 2008-01-09
CA2656340A1 (en) 2008-01-03
CN101495312B (zh) 2014-08-20
NZ573590A (en) 2012-12-21
KR20090024151A (ko) 2009-03-06
ZA200900302B (en) 2010-01-27
WO2008001127A2 (en) 2008-01-03
JP5078999B2 (ja) 2012-11-21
US20100233444A1 (en) 2010-09-16

Similar Documents

Publication Publication Date Title
SG173335A1 (en) Composition, article, its manufacture and use
CN111867838B (zh) 平版印刷版前体
DE69934229T2 (de) Zusammensetzung zur entschichtung von photolack und organischen materialien von substratoberflächen
US4439516A (en) High temperature positive diazo photoresist processing using polyvinyl phenol
US20050112503A1 (en) Developing solution for photoresist
CA1172492A (en) Process for the production of lithographic printing forms using a light-sensitive material based on diazonium salt polycondensation products
CN103261965A (zh) 柔性印刷版原版
CN103879169B (zh) 一种耐uv油墨的阳图热敏ctp版材
TR201809750T4 (tr) Fleksografik baskı levhası üretilmesine yönelik yöntem.
JP5323698B2 (ja) 微細パターン形成用組成物およびそれを用いた微細パターン形成方法
KR20070054185A (ko) 미세 패턴 형성 재료, 미세 레지스트 패턴 형성 방법 및전자 디바이스 장치
JPH07175222A (ja) 曇った放射線感応性記録材料
KR100881245B1 (ko) 양이온 광중합성 에폭시 수지 조성물, 이것을 사용한 미세구조체, 및 미세 구조체의 제조 방법
US10859916B2 (en) Composition for forming fine pattern and method for forming fine pattern using the same
US6391530B1 (en) Process for developing exposed radiation-sensitive printing plate precursors
JPH01105246A (ja) 水なしオフセツト印刷法を使用する印刷版のための現像剤
BR102015018917A2 (pt) composição de tinta de máscara de solda
US6296982B1 (en) Imaging articles
US20170032960A1 (en) Composition for coating photoresist pattern and method for forming fine pattern using the same
EP1204003B1 (en) Process for developing exposed radiation-sensitive printing plate precursors
WO2019151019A1 (ja) ポジ型レジスト組成物、レジスト膜形成方法、及び積層体の製造方法
EP1634126A2 (en) Developer composition for resists and method for formation of resist pattern
CN1963677A (zh) 一种光阻显影液
JPH1039504A (ja) ドライフィルムレジスト
KR20110124099A (ko) 마이크로 렌즈용 화학증폭형 포토레지스트 조성물, 및 이를 사용하여 제조된 마이크로 렌즈