SG162633A1 - Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof - Google Patents

Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof

Info

Publication number
SG162633A1
SG162633A1 SG200809489-8A SG2008094898A SG162633A1 SG 162633 A1 SG162633 A1 SG 162633A1 SG 2008094898 A SG2008094898 A SG 2008094898A SG 162633 A1 SG162633 A1 SG 162633A1
Authority
SG
Singapore
Prior art keywords
micron
sub
nanoimprinting
manufacture
structures
Prior art date
Application number
SG200809489-8A
Other languages
English (en)
Inventor
Kan Shyi-Herng
Original Assignee
Helios Applied Systems Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helios Applied Systems Pte Ltd filed Critical Helios Applied Systems Pte Ltd
Priority to SG200809489-8A priority Critical patent/SG162633A1/en
Priority to US12/933,803 priority patent/US9358737B2/en
Priority to EP09835361.8A priority patent/EP2361402B1/en
Priority to KR1020107020686A priority patent/KR101303500B1/ko
Priority to JP2011501750A priority patent/JP5500461B2/ja
Priority to CN2009801089772A priority patent/CN101971092B/zh
Priority to CN201210375152.0A priority patent/CN102981358B/zh
Priority to PCT/SG2009/000443 priority patent/WO2010074659A1/en
Priority to TW098143696A priority patent/TWI438578B/zh
Publication of SG162633A1 publication Critical patent/SG162633A1/en
Priority to HK11108144.5A priority patent/HK1154083A1/xx
Priority to US13/858,509 priority patent/US9272474B2/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)
SG200809489-8A 2008-12-22 2008-12-22 Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof SG162633A1 (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
SG200809489-8A SG162633A1 (en) 2008-12-22 2008-12-22 Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
CN2009801089772A CN101971092B (zh) 2008-12-22 2009-11-23 使用2d光子光刻和纳米压印来制造亚微米3d结构的3d模具及其工艺
EP09835361.8A EP2361402B1 (en) 2008-12-22 2009-11-23 Method of fabricating a multi-layer sub-micron 3d structure using 2-photon lithography and nanoimprinting
KR1020107020686A KR101303500B1 (ko) 2008-12-22 2009-11-23 2차원 광자 리소그래피 및 나노임프린트를 이용한 서브마이크론 3차원 구조물 제조용 3차원 몰드 및 그를 이용한 3차원 구조물 제조방법
JP2011501750A JP5500461B2 (ja) 2008-12-22 2009-11-23 ２ｄ光子リソグラフィ及びナノインプリントを使用してサブミクロン３ｄ構造を製造するための３ｄ金属鋳型ならびにそのプロセス
US12/933,803 US9358737B2 (en) 2008-12-22 2009-11-23 3D mold for manufacturing of sub-micron 3D structures using 2-D photon lithography and nanoimprinting and process thereof
CN201210375152.0A CN102981358B (zh) 2008-12-22 2009-11-23 3d金属模具及其制造系统和方法
PCT/SG2009/000443 WO2010074659A1 (en) 2008-12-22 2009-11-23 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
TW098143696A TWI438578B (zh) 2008-12-22 2009-12-18 利用雙光子微影法及奈米轉印法製造次微米３ｄ結構之３ｄ模具及其方法
HK11108144.5A HK1154083A1 (en) 2008-12-22 2011-08-04 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
US13/858,509 US9272474B2 (en) 2008-12-22 2013-04-08 3D mold for manufacturing of sub-micron 3D structures using 2-D photon lithography and nanoimprinting and process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200809489-8A SG162633A1 (en) 2008-12-22 2008-12-22 Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof

Publications (1)

Publication Number Publication Date
SG162633A1 true SG162633A1 (en) 2010-07-29

Family

ID=42288020

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200809489-8A SG162633A1 (en) 2008-12-22 2008-12-22 Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof

Country Status (9)

Country Link
US (2) US9358737B2 (ko)
EP (1) EP2361402B1 (ko)
JP (1) JP5500461B2 (ko)
KR (1) KR101303500B1 (ko)
CN (2) CN102981358B (ko)
HK (1) HK1154083A1 (ko)
SG (1) SG162633A1 (ko)
TW (1) TWI438578B (ko)
WO (1) WO2010074659A1 (ko)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8294025B2 (en) 2002-06-08 2012-10-23 Solarity, Llc Lateral collection photovoltaics
SG162633A1 (en) * 2008-12-22 2010-07-29 Helios Applied Systems Pte Ltd Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
CN101817121B (zh) * 2010-04-15 2012-03-28 华中科技大学 零件与模具的熔积成形复合制造方法及其辅助装置
US20140242744A1 (en) * 2011-09-26 2014-08-28 Solarity, Inc. Substrate and superstrate design and process for nano-imprinting lithography of light and carrier collection management devices
US9016199B2 (en) * 2011-10-25 2015-04-28 Unipixel Displays, Inc. Optimization of UV curing
AU2013245862A1 (en) 2012-04-11 2014-10-30 University Of Florida Research Foundation, Inc. System and method for analyzing random patterns
US10186458B2 (en) 2012-07-05 2019-01-22 Infineon Technologies Ag Component and method of manufacturing a component using an ultrathin carrier
CA2909178A1 (en) * 2013-04-11 2014-10-16 University Of Florida Research Foundation, Inc. Organ construct and methods of manufacture thereof
CN103241054B (zh) * 2013-05-02 2015-04-01 陈琰 一种由3d数字模型制作彩色金属模型的方法
WO2015188909A1 (de) * 2014-06-10 2015-12-17 Hueck Folien Ges.M.B.H. Verfahren zur herstellung eines prägewerkzeugs mittels 3d-lithographie
KR101600498B1 (ko) * 2014-06-25 2016-03-07 인하대학교 산학협력단 족교정구의 설계 및 제조시스템 및 방법
US9724878B2 (en) * 2014-10-20 2017-08-08 Lenovo Enterprise Solutions (Singapore) Pte. Ltd. Three-dimensional printer having an expandable envelope
TWI560141B (en) * 2014-11-21 2016-12-01 Force Prec Instr Co Ltd Micro/nano-molding template and method of forming micro-structure on substrate by use of such micor/nano-molding template
JP6674218B2 (ja) * 2014-12-09 2020-04-01 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
DE102015213473A1 (de) * 2015-07-17 2017-01-19 Robert Bosch Gmbh Herstellungsverfahren für eine mikromechanische Fensterstruktur und entsprechende mikromechanische Fensterstruktur
TWI557586B (zh) * 2015-12-14 2016-11-11 財團法人金屬工業研究發展中心 齒輪模具的補償成型方法
HK1220859A2 (zh) * 2016-02-29 2017-05-12 Master Dynamic Ltd 製作工藝
EP3551411A4 (en) * 2016-12-09 2020-08-19 The University of Massachusetts SAMPLE FORM FOR SAMPLE TRANSFER
US11040482B2 (en) * 2017-02-28 2021-06-22 Toshiba Kikai Kabushiki Kaisha Transfer method, transfer apparatus, and mold
KR101932120B1 (ko) * 2017-04-05 2019-03-20 한국식품연구원 크랙 주형의 환원 리소그래피를 이용한 나노 와이어의 제조방법
KR101977122B1 (ko) * 2017-05-24 2019-05-10 한국과학기술원 나노몰드 및 그 제조방법
DE102017009092A1 (de) * 2017-09-28 2019-03-28 Giesecke+Devrient Currency Technology Gmbh Verfahren zur Herstellung eines optisch variablen Elements sowie entsprechendes Element
CN111316166B (zh) * 2017-10-31 2023-09-08 劳伦斯·利弗莫尔国家安全有限责任公司 用于可缩放亚微米增材制造的深度分辨的并行双光子聚合的系统和方法
US20190139789A1 (en) * 2017-11-06 2019-05-09 Canon Kabushiki Kaisha Apparatus for imprint lithography comprising a logic element configured to generate a fluid droplet pattern and a method of using such apparatus
KR102119165B1 (ko) 2018-04-24 2020-06-05 한국기계연구원 광학식 리소그래피 장치 및 그 제어 방법
KR102155828B1 (ko) * 2018-11-22 2020-09-14 연세대학교 산학협력단 생체인공삽입물 접착용 고분자 필름 및 그 제조방법
CN109856904A (zh) * 2019-03-29 2019-06-07 刘刚 超大型视角可控等离子菲涅尔复合屏幕
WO2020232150A2 (en) * 2019-05-13 2020-11-19 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools processes
CN110412684A (zh) * 2019-08-01 2019-11-05 国家纳米科学中心 一种近眼显示器衍射光栅波导的制备方法
KR20210044088A (ko) * 2019-10-14 2021-04-22 경북대학교 산학협력단 의료 진단용 칩 및 의료 진단용 칩의 제조 방법
CN113031252B (zh) * 2019-12-09 2023-05-09 觉芯电子(无锡)有限公司 一种具有微纳结构的微镜、微镜制备方法及激光显示系统
CN111474822B (zh) * 2020-05-19 2021-09-17 中国科学院光电技术研究所 一种基于三维光刻胶掩膜快速修正光学基底均匀性的方法
WO2022266066A1 (en) * 2021-06-18 2022-12-22 Kansas State University Research Foundation Uv-led lithography for 3d microfabrication

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE155897T1 (de) 1990-05-21 1997-08-15 Nashua Corp Mikrolinsen-bildschirme aus photopolymerisierbaren materialien und verfahren zur ihrer herstellung
US6168100B1 (en) * 1997-10-23 2001-01-02 Toyota Jidosha Kabushiki Kaisha Method for producing embossed metallic flakelets
US7371400B2 (en) * 2001-01-02 2008-05-13 The General Hospital Corporation Multilayer device for tissue engineering
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
US7374864B2 (en) 2003-02-13 2008-05-20 The Regents Of The University Of Michigan Combined nanoimprinting and photolithography for micro and nano devices fabrication
US20040202865A1 (en) * 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
US8097456B2 (en) * 2003-08-18 2012-01-17 The Charles Stark Draper Laboratory Nanotopographic compositions and methods for cellular organization in tissue engineered structures
JP2005153091A (ja) 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US7052926B2 (en) 2003-12-18 2006-05-30 Corporation For National Research Initiatives Fabrication of movable micromechanical components employing low-cost, high-resolution replication technology method
TW200538871A (en) * 2004-01-23 2005-12-01 Univ Massachusetts Structured materials and methods
US8069782B2 (en) * 2004-12-20 2011-12-06 Nanoink, Inc. Stamps with micrometer- and nanometer-scale features and methods of fabrication thereof
TWI269889B (en) 2005-11-29 2007-01-01 Univ Tsinghua Tunable micro-aspheric lens, and manufacturing method thereof
ATE549294T1 (de) * 2005-12-09 2012-03-15 Obducat Ab Vorrichtung und verfahren zum transfer von mustern mit zwischenstempel
JP2007203678A (ja) * 2006-02-03 2007-08-16 Fujifilm Corp 凹凸状シートの製造方法及び装置
US7718351B2 (en) * 2006-03-14 2010-05-18 Agency For Science, Technology & Research Three-dimensional fabrication of biocompatible structures in anatomical shapes and dimensions for tissue engineering and organ replacement
US7862756B2 (en) * 2006-03-30 2011-01-04 Asml Netherland B.V. Imprint lithography
US20070264424A1 (en) 2006-05-12 2007-11-15 Nanoopto Corporation Lens arrays and methods of making the same
US20080028360A1 (en) 2006-07-31 2008-01-31 Picciotto Carl E Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features
JP2008065223A (ja) * 2006-09-11 2008-03-21 Fujitsu Ltd パターン形成方法、パターン形成装置、記録媒体の製造方法および部材の製造方法
JP5223218B2 (ja) 2007-03-29 2013-06-26 凸版印刷株式会社 フェムト秒レーザ加工による針状体アレイの製造方法
US8027086B2 (en) * 2007-04-10 2011-09-27 The Regents Of The University Of Michigan Roll to roll nanoimprint lithography
JP4919232B2 (ja) * 2008-06-04 2012-04-18 独立行政法人科学技術振興機構 微小物体操作・計測用の局所蛍光標識マイクロデバイス
JP2010080011A (ja) * 2008-09-26 2010-04-08 Fujifilm Corp モールド構造体及びその製造方法、被転写用基板及びその製造方法、並びにインプリント方法、磁気記録媒体及びその製造方法
SG162633A1 (en) 2008-12-22 2010-07-29 Helios Applied Systems Pte Ltd Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof

Also Published As

Publication number Publication date
EP2361402B1 (en) 2016-04-20
CN102981358A (zh) 2013-03-20
JP5500461B2 (ja) 2014-05-21
CN101971092B (zh) 2012-11-21
KR20100119793A (ko) 2010-11-10
US20110046764A1 (en) 2011-02-24
EP2361402A4 (en) 2014-07-09
WO2010074659A1 (en) 2010-07-01
US9272474B2 (en) 2016-03-01
TWI438578B (zh) 2014-05-21
TW201107888A (en) 2011-03-01
HK1154083A1 (en) 2012-04-13
CN102981358B (zh) 2015-07-29
EP2361402A1 (en) 2011-08-31
US20130286485A1 (en) 2013-10-31
JP2011523199A (ja) 2011-08-04
KR101303500B1 (ko) 2013-09-09
CN101971092A (zh) 2011-02-09
US9358737B2 (en) 2016-06-07

Similar Documents

Publication Publication Date Title
SG162633A1 (en) Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
UY33735A (es) Compuestos antivirales
CY1118682T1 (el) Ενωσεις πυραζολης ως αναστολεις του υποδοχεα σιγμα
CO6620050A2 (es) Derivados de aminopirimidina como moduladores de la lrrk2
BRPI0809990A2 (pt) Pó de paek, em particular para o uso em um metodo para uma manufatura em camadas de um objeto tridimensional, bem como o método para a sua produção
DOP2011000176A (es) Compuestos organicos
TW200637614A (en) Bendamustine pharmaceutical compositions
UY33503A (es) Imidazo [1,2-a]pirimidinas y piridinas sustituidas
ECSP13012611A (es) Derivados de pirazol-aminopirimidina como moduladores de la lrrk2
AU2010233994A8 (en) Bispecific anti-ErbB-3/anti-c-Met antibodies
UY32648A (es) Nuevos derivados de pirimidina y su uso en el tratamiento de enfermedades
BR112012016376A2 (pt) compostos de pirrolo-aminopirimida substituída
BR112012013431A2 (pt) composto, composição farmacêutica e seu uso
BR112013000254A2 (pt) derivados heterocíclicos 1-fenil-substituídos e seu uso como moduladores do receptor de prostaglandina d2
ECSP11011347A (es) Nicotinamida sustituida como moduladores KCNQ2/3
UY33526A (es) Nuevas aminopirazoloquinazolinas
MX2011008825A (es) 3-aminoisoxazolopiridinas sustituidas como moduladores de kcnq2/3.
UY33950A (es) Inhibidores de benzodioxano de la producciòn de leucotrieno
UY33766A (es) COMPUESTOS CON ESTRUCTURA DE PIRIMIDINONA PARA USO EN EL TRATAMIENTO DE ENFERMEDADES MEDIADAS POR Lp-PLA2
ECSP11011095A (es) Amidas del ácido 4-(1,2,3,4-tetrahidroisoquinolina-2-il)-4-oxobutírico sustituidas como moduladores de KCNQ2/3.
CU20130063A7 (es) Proceso de producción de depsipéptidos cíclicos
MX2011008662A (es) 2-mercapto-3-aminopiridinas sustituidas como moduladores de kcnq2/3.
MX2011009338A (es) 3-amino-2-mercaptoquinolinas sustituidas como moduladores de kcnq2/3.
SMT201500111B (it) Processo catalizzato da un ossido di fosfina per la produzione di idrogeno da derivati sililati cometrasportatori d'ossigeno
UA112764C2 (uk) Оптимізований синтез чистих, неполіморфних кристалічних жовчних кислот із заданим розміром частинок