SG155145A1 - Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device - Google Patents

Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Info

Publication number
SG155145A1
SG155145A1 SG200901294-9A SG2009012949A SG155145A1 SG 155145 A1 SG155145 A1 SG 155145A1 SG 2009012949 A SG2009012949 A SG 2009012949A SG 155145 A1 SG155145 A1 SG 155145A1
Authority
SG
Singapore
Prior art keywords
radiation
forming
coloring layer
sensitive composition
liquid crystal
Prior art date
Application number
SG200901294-9A
Other languages
English (en)
Inventor
Satoshi Morishita
Hitoshi Hamaguchi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG155145A1 publication Critical patent/SG155145A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
SG200901294-9A 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device SG155145A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008047132A JP5109716B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Publications (1)

Publication Number Publication Date
SG155145A1 true SG155145A1 (en) 2009-09-30

Family

ID=41122972

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200901294-9A SG155145A1 (en) 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5109716B2 (zh)
KR (1) KR20090093823A (zh)
CN (1) CN101539723B (zh)
SG (1) SG155145A1 (zh)
TW (1) TWI444768B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5698128B2 (ja) 2009-06-09 2015-04-08 国立大学法人 岡山大学 ジヒドロキシヘキセン酸エステル及びその製造方法
CN105842984A (zh) * 2015-01-30 2016-08-10 住友化学株式会社 着色感光性树脂组合物
KR101840584B1 (ko) * 2017-01-17 2018-03-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7410746B2 (en) * 2002-03-29 2008-08-12 Dai Nippon Printing Co., Ltd. Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
JP4561101B2 (ja) * 2003-03-06 2010-10-13 Jsr株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP4431453B2 (ja) * 2004-07-15 2010-03-17 富士フイルム株式会社 感光性組成物および平版印刷版原版
TWI396042B (zh) * 2004-09-29 2013-05-11 Sumitomo Chemical Co 著色感光性樹脂組成物
JP2006317794A (ja) * 2005-05-13 2006-11-24 Fuji Photo Film Co Ltd レジスト組成物及びそれを用いたパターン形成方法
JP4586655B2 (ja) * 2005-07-05 2010-11-24 東レ株式会社 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子

Also Published As

Publication number Publication date
TW200949447A (en) 2009-12-01
CN101539723B (zh) 2014-08-13
JP5109716B2 (ja) 2012-12-26
JP2009204883A (ja) 2009-09-10
TWI444768B (zh) 2014-07-11
KR20090093823A (ko) 2009-09-02
CN101539723A (zh) 2009-09-23

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