SG155145A1 - Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device - Google Patents

Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Info

Publication number
SG155145A1
SG155145A1 SG200901294-9A SG2009012949A SG155145A1 SG 155145 A1 SG155145 A1 SG 155145A1 SG 2009012949 A SG2009012949 A SG 2009012949A SG 155145 A1 SG155145 A1 SG 155145A1
Authority
SG
Singapore
Prior art keywords
radiation
forming
coloring layer
sensitive composition
liquid crystal
Prior art date
Application number
SG200901294-9A
Inventor
Satoshi Morishita
Hitoshi Hamaguchi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG155145A1 publication Critical patent/SG155145A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502—Antiglare, refractive index matching layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

Provided is a radiation-sensitive composition for forming a coloring layer that can form a high-quality pixel even with low exposure dose, in which chipping or peeling in a pixel pattern at the time of development does not occur and the pixel is free from water unevenness (smudge-like color unevenness generated on the pixel pattern after development and water washing). The radiation-sensitive composition for forming a coloring layer contains a colorant (A), an alkali-soluble resin (B), a polyfunctional monomer (C), a photopolymerization initiator (D), and a specific imide compound (E) typified by N-hydroxyphthalimide.
SG200901294-9A 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device SG155145A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008047132A JP5109716B2 (en) 2008-02-28 2008-02-28 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element

Publications (1)

Publication Number Publication Date
SG155145A1 true SG155145A1 (en) 2009-09-30

Family

ID=41122972

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200901294-9A SG155145A1 (en) 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5109716B2 (en)
KR (1) KR20090093823A (en)
CN (1) CN101539723B (en)
SG (1) SG155145A1 (en)
TW (1) TWI444768B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010143700A1 (en) 2009-06-09 2010-12-16 国立大学法人 岡山大学 Dihydroxyhexenoic acid ester and method for producing same
TW202127141A (en) * 2015-01-30 2021-07-16 日商住友化學股份有限公司 Colored photosensitive resin composition
KR101840584B1 (en) * 2017-01-17 2018-03-20 동우 화인켐 주식회사 Colored Photosensitive Resin Composition, Color Filter and Display Device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7410746B2 (en) * 2002-03-29 2008-08-12 Dai Nippon Printing Co., Ltd. Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
JP4561101B2 (en) * 2003-03-06 2010-10-13 Ｊｓｒ株式会社 Radiation sensitive composition for color filter and color filter
JP4431453B2 (en) * 2004-07-15 2010-03-17 富士フイルム株式会社 Photosensitive composition and planographic printing plate precursor
TWI396042B (en) * 2004-09-29 2013-05-11 Sumitomo Chemical Co Colored photosensitive resin composition
JP2006317794A (en) * 2005-05-13 2006-11-24 Fuji Photo Film Co Ltd Resist composition and pattern forming method using the same
JP4586655B2 (en) * 2005-07-05 2010-11-24 東レ株式会社 Photosensitive siloxane composition, cured film formed therefrom, and device having cured film

Also Published As

Publication number Publication date
CN101539723B (en) 2014-08-13
KR20090093823A (en) 2009-09-02
TW200949447A (en) 2009-12-01
JP2009204883A (en) 2009-09-10
JP5109716B2 (en) 2012-12-26
CN101539723A (en) 2009-09-23
TWI444768B (en) 2014-07-11

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