SG152162A1 - An optical focus sensor, an inspection apparatus and a lithographic apparatus - Google Patents
An optical focus sensor, an inspection apparatus and a lithographic apparatusInfo
- Publication number
- SG152162A1 SG152162A1 SG200807574-9A SG2008075749A SG152162A1 SG 152162 A1 SG152162 A1 SG 152162A1 SG 2008075749 A SG2008075749 A SG 2008075749A SG 152162 A1 SG152162 A1 SG 152162A1
- Authority
- SG
- Singapore
- Prior art keywords
- focus sensor
- optical focus
- sub
- inspection apparatus
- substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Automatic Focus Adjustment (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96064407P | 2007-10-09 | 2007-10-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG152162A1 true SG152162A1 (en) | 2009-05-29 |
Family
ID=40279864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200807574-9A SG152162A1 (en) | 2007-10-09 | 2008-10-09 | An optical focus sensor, an inspection apparatus and a lithographic apparatus |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8125615B2 (ko) |
| EP (1) | EP2048543B1 (ko) |
| JP (1) | JP4940218B2 (ko) |
| KR (1) | KR101013471B1 (ko) |
| CN (1) | CN101520608B (ko) |
| IL (1) | IL194698A (ko) |
| SG (1) | SG152162A1 (ko) |
| TW (1) | TWI383269B (ko) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1036597A1 (nl) * | 2008-02-29 | 2009-09-01 | Asml Netherlands Bv | Metrology method and apparatus, lithographic apparatus, and device manufacturing method. |
| NL2008111A (en) | 2011-02-18 | 2012-08-21 | Asml Netherlands Bv | Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method. |
| US9716847B1 (en) | 2012-09-25 | 2017-07-25 | Google Inc. | Image capture device with angled image sensor |
| KR101924270B1 (ko) * | 2013-06-14 | 2018-11-30 | 가부시키가이샤 니콘 | 기판 처리 장치, 디바이스 제조 방법 및 노광 방법 |
| WO2016050453A1 (en) | 2014-10-03 | 2016-04-07 | Asml Netherlands B.V. | Focus monitoring arrangement and inspection apparatus including such an arragnement |
| NL2017505A (en) * | 2015-10-09 | 2017-04-11 | Asml Netherlands Bv | Method and apparatus for inspection and metrology |
| NL2017930A (en) * | 2015-12-31 | 2017-07-05 | Asml Netherlands Bv | Method and device for focusing in an inspection system |
| KR102200257B1 (ko) | 2016-09-06 | 2021-01-11 | 에이에스엠엘 홀딩 엔.브이. | 검사 시스템에서의 포커싱을 위한 디바이스 및 방법 |
| CN106325005B (zh) * | 2016-10-12 | 2018-03-23 | 中国科学院微电子研究所 | 一种光刻工艺窗口的测量方法 |
| JP2019079030A (ja) * | 2017-10-24 | 2019-05-23 | キヤノン株式会社 | 露光装置および物品の製造方法 |
| CN112020677B (zh) * | 2018-04-26 | 2023-03-21 | Asml荷兰有限公司 | 用于工艺灵敏度补偿的对准传感器装置 |
| US10801896B2 (en) | 2019-01-11 | 2020-10-13 | MP High Tech Solutions Pty Ltd | Sequential beam splitting in a radiation sensing apparatus |
| EP3705945A1 (en) * | 2019-03-08 | 2020-09-09 | ASML Netherlands B.V. | Methods and apparatus for estimating substrate shape |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58153327A (ja) * | 1982-03-08 | 1983-09-12 | Toshiba Corp | パタ−ン検査装置 |
| US4742218A (en) * | 1985-03-11 | 1988-05-03 | Hitachi, Ltd. | Focus error detection apparatus utilizing focusing an front and rear sides of focal planes |
| US4844617A (en) * | 1988-01-20 | 1989-07-04 | Tencor Instruments | Confocal measuring microscope with automatic focusing |
| JPH05297262A (ja) | 1992-04-23 | 1993-11-12 | Toshiba Corp | オートフォーカス装置 |
| US5747813A (en) * | 1992-06-16 | 1998-05-05 | Kla-Tencop. Corporation | Broadband microspectro-reflectometer |
| US20010049589A1 (en) * | 1993-01-21 | 2001-12-06 | Nikon Corporation | Alignment method and apparatus therefor |
| JP4250235B2 (ja) * | 1998-10-21 | 2009-04-08 | キヤノン株式会社 | 検出手段保持機構 |
| ATE290229T1 (de) * | 1998-12-21 | 2005-03-15 | Evotec Ag | Positionierung des messvolumens in einem scanning-mikroskopischen verfahren |
| US6111828A (en) * | 1999-01-12 | 2000-08-29 | Siros Technologies, Inc. | Focus error signal generation using confocally filtered detection |
| JP2004354088A (ja) * | 2003-05-27 | 2004-12-16 | Toshiba Corp | 検査装置及びマスク製造方法 |
| SG108975A1 (en) * | 2003-07-11 | 2005-02-28 | Asml Netherlands Bv | Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern |
| CN1237325C (zh) * | 2004-01-19 | 2006-01-18 | 哈尔滨工业大学 | 具有高空间分辨力的整形环形光束式差动共焦传感器 |
| US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| US7177012B2 (en) * | 2004-10-18 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20070002336A1 (en) * | 2005-06-30 | 2007-01-04 | Asml Netherlands B.V. | Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method |
| US7724351B2 (en) * | 2006-01-30 | 2010-05-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and exchangeable optical element |
| US7502103B2 (en) * | 2006-05-31 | 2009-03-10 | Asml Netherlands B.V. | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate |
| US20080135774A1 (en) * | 2006-12-08 | 2008-06-12 | Asml Netherlands B.V. | Scatterometer, a lithographic apparatus and a focus analysis method |
-
2008
- 2008-10-08 EP EP08253285.4A patent/EP2048543B1/en active Active
- 2008-10-09 JP JP2008262636A patent/JP4940218B2/ja active Active
- 2008-10-09 SG SG200807574-9A patent/SG152162A1/en unknown
- 2008-10-09 CN CN2008101778344A patent/CN101520608B/zh active Active
- 2008-10-09 TW TW097139011A patent/TWI383269B/zh active
- 2008-10-09 US US12/248,540 patent/US8125615B2/en active Active
- 2008-10-09 KR KR1020080099175A patent/KR101013471B1/ko active IP Right Grant
- 2008-10-12 IL IL194698A patent/IL194698A/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| KR101013471B1 (ko) | 2011-02-14 |
| EP2048543A3 (en) | 2012-01-25 |
| CN101520608B (zh) | 2011-11-09 |
| US8125615B2 (en) | 2012-02-28 |
| JP4940218B2 (ja) | 2012-05-30 |
| EP2048543A2 (en) | 2009-04-15 |
| EP2048543B1 (en) | 2013-12-04 |
| JP2009105395A (ja) | 2009-05-14 |
| US20090091726A1 (en) | 2009-04-09 |
| IL194698A0 (en) | 2009-08-03 |
| TWI383269B (zh) | 2013-01-21 |
| KR20090036531A (ko) | 2009-04-14 |
| TW200925796A (en) | 2009-06-16 |
| IL194698A (en) | 2013-10-31 |
| CN101520608A (zh) | 2009-09-02 |
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