SG151244A1 - Lithographic apparatus, projection assembly and active damping - Google Patents

Lithographic apparatus, projection assembly and active damping

Info

Publication number
SG151244A1
SG151244A1 SG200807527-7A SG2008075277A SG151244A1 SG 151244 A1 SG151244 A1 SG 151244A1 SG 2008075277 A SG2008075277 A SG 2008075277A SG 151244 A1 SG151244 A1 SG 151244A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
active damping
projection system
projection
damping
Prior art date
Application number
SG200807527-7A
Other languages
English (en)
Inventor
Der Wijst Marc Wilhelmus Maria Van
Erik Roelof Loopstra
Hoon Cornelius Adrianus Lambertus De
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG151244A1 publication Critical patent/SG151244A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F7/00—Vibration-dampers; Shock-absorbers
    • F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
    • F16F7/1005—Vibration-dampers; Shock-absorbers using inertia effect characterised by active control of the mass
SG200807527-7A 2007-10-04 2008-10-03 Lithographic apparatus, projection assembly and active damping SG151244A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96057907P 2007-10-04 2007-10-04

Publications (1)

Publication Number Publication Date
SG151244A1 true SG151244A1 (en) 2009-04-30

Family

ID=40210688

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200807527-7A SG151244A1 (en) 2007-10-04 2008-10-03 Lithographic apparatus, projection assembly and active damping
SG201102389-2A SG170831A1 (en) 2007-10-04 2008-10-03 Lithographic apparatus, projection assembly and active damping

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG201102389-2A SG170831A1 (en) 2007-10-04 2008-10-03 Lithographic apparatus, projection assembly and active damping

Country Status (7)

Country Link
US (1) US8203694B2 (ko)
EP (1) EP2045664B1 (ko)
JP (2) JP4933509B2 (ko)
KR (2) KR101155066B1 (ko)
CN (2) CN101452222B (ko)
SG (2) SG151244A1 (ko)
TW (1) TWI474124B (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8164737B2 (en) * 2007-10-23 2012-04-24 Asml Netherlands B.V. Lithographic apparatus having an active damping subassembly
NL1036161A1 (nl) * 2007-11-20 2009-05-25 Asml Netherlands Bv Combination of structure and an active damping system, and a lithographic apparatus.
NL2003424A (en) * 2008-10-07 2010-04-08 Asml Netherlands Bv Projection assembly and lithographic apparartus.
NL2003835A (en) * 2008-12-22 2010-06-23 Asml Netherlands Bv Lithographic apparatus and control method.
EP2447777B1 (en) 2010-10-27 2019-08-07 ASML Netherlands BV Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method
EP2469340B1 (en) 2010-12-21 2021-01-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2008272A (en) * 2011-03-09 2012-09-11 Asml Netherlands Bv Lithographic apparatus.
US9958793B2 (en) 2013-07-02 2018-05-01 Asml Netherlands B.V. Lithographic apparatus, positioning system for use in a lithographic apparatus and method
CN104678711B (zh) * 2013-11-26 2017-06-27 上海微电子装备有限公司 运动台反力抵消装置
CN107290933B (zh) * 2016-03-30 2018-11-09 上海微电子装备（集团）股份有限公司 一种光刻机投影物镜的调平装置及调平方法
CN105957828B (zh) * 2016-07-01 2019-07-02 广东工业大学 一种平台的定位系统及其控制方法
US20200209757A1 (en) * 2016-07-22 2020-07-02 Asml Netherlands B.V. Lithographic Apparatus, Lithographic Projection Apparatus and Device Manufacturing Method
CN108121166B (zh) * 2016-11-30 2020-01-24 上海微电子装备（集团）股份有限公司 一种主动吸振器及微动台
DE102017002542A1 (de) * 2017-03-16 2018-09-20 Applied Materials, Inc. (N.D.Ges.D. Staates Delaware) Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts

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US6392741B1 (en) * 1995-09-05 2002-05-21 Nikon Corporation Projection exposure apparatus having active vibration isolator and method of controlling vibration by the active vibration isolator
JPH11230246A (ja) * 1998-02-18 1999-08-27 Tokkyo Kiki Kk アクティブ除振装置
WO1999053217A1 (fr) 1998-04-09 1999-10-21 Nikon Corporation Systeme d'elimination des vibrations et d'exposition
JPH11325821A (ja) * 1998-05-19 1999-11-26 Nikon Corp ステージ制御方法および露光装置
JP2001102286A (ja) * 1999-09-29 2001-04-13 Nikon Corp 露光装置
JP2001140972A (ja) * 1999-11-18 2001-05-22 Canon Inc 除振装置
JP2001148341A (ja) * 1999-11-19 2001-05-29 Nikon Corp 露光装置
DE10062786A1 (de) * 2000-12-15 2002-06-20 Zeiss Carl System zur Dämpfung von Schwingungen
EP1225482A1 (en) 2001-01-19 2002-07-24 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3961311B2 (ja) * 2001-01-19 2007-08-22 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイスの製造方法
DE10106605A1 (de) * 2001-02-13 2002-08-22 Zeiss Carl System zur Beseitigung oder wenigstens Dämpfung von Schwingungen
US6912041B2 (en) * 2001-06-29 2005-06-28 Asml Netherlands B.V. Lithographic apparatus and method
DE10134387A1 (de) * 2001-07-14 2003-01-23 Zeiss Carl Optisches System mit mehreren optischen Elementen
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
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TWI230844B (en) 2002-06-07 2005-04-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004343075A (ja) * 2003-04-14 2004-12-02 Asml Netherlands Bv 投影システム及びその使用方法
US7075623B2 (en) * 2003-11-17 2006-07-11 Asml Holding N.V. Flexure-supported split reaction mass
US7110083B2 (en) * 2003-11-19 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005073592A1 (en) * 2004-01-26 2005-08-11 Koninklijke Philips Electronics N.V. Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
US7817243B2 (en) * 2004-04-12 2010-10-19 Asml Netherlands B.V. Vibration isolation system
JP2005311165A (ja) * 2004-04-23 2005-11-04 Canon Inc アクティブマウントおよび露光装置
US7180571B2 (en) 2004-12-08 2007-02-20 Asml Netherlands B.V. Lithographic projection apparatus and actuator
JP2006250291A (ja) * 2005-03-11 2006-09-21 Tokyo Univ Of Agriculture & Technology 防振装置
CN1658075A (zh) * 2005-03-25 2005-08-24 上海微电子装备有限公司 一种曝光装置
US7726452B2 (en) 2005-06-02 2010-06-01 Technical Manufacturing Corporation Systems and methods for active vibration damping
JP2007120646A (ja) * 2005-10-28 2007-05-17 Canon Inc 制振装置およびそれを備えた露光装置
US20070097340A1 (en) * 2005-10-31 2007-05-03 Nikon Corporation Active damper with counter mass to compensate for structural vibrations of a lithographic system
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus

Also Published As

Publication number Publication date
EP2045664B1 (en) 2013-03-06
EP2045664A3 (en) 2012-01-04
CN101452222A (zh) 2009-06-10
KR101155066B1 (ko) 2012-06-11
EP2045664A2 (en) 2009-04-08
TWI474124B (zh) 2015-02-21
CN101452222B (zh) 2011-04-13
KR20120007086A (ko) 2012-01-19
JP4933509B2 (ja) 2012-05-16
TW200923593A (en) 2009-06-01
JP5284502B2 (ja) 2013-09-11
KR20090034782A (ko) 2009-04-08
KR101428619B1 (ko) 2014-08-13
JP2009111366A (ja) 2009-05-21
US8203694B2 (en) 2012-06-19
CN102096340B (zh) 2014-03-19
JP2012104862A (ja) 2012-05-31
US20090091725A1 (en) 2009-04-09
CN102096340A (zh) 2011-06-15
SG170831A1 (en) 2011-05-30

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