SG147336A1 - Cleaning process and apparatus - Google Patents

Cleaning process and apparatus

Info

Publication number
SG147336A1
SG147336A1 SG200702957-2A SG2007029572A SG147336A1 SG 147336 A1 SG147336 A1 SG 147336A1 SG 2007029572 A SG2007029572 A SG 2007029572A SG 147336 A1 SG147336 A1 SG 147336A1
Authority
SG
Singapore
Prior art keywords
cleaning
substrate
brush
relation
disclosed
Prior art date
Application number
SG200702957-2A
Inventor
Hock Huat Yeo
Original Assignee
Jcs Echigo Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jcs Echigo Pte Ltd filed Critical Jcs Echigo Pte Ltd
Priority to SG200702957-2A priority Critical patent/SG147336A1/en
Priority to SG2010079713A priority patent/SG180053A1/en
Priority to SG200719147-1A priority patent/SG147361A1/en
Priority to MYPI20094436A priority patent/MY154924A/en
Priority to PCT/SG2008/000133 priority patent/WO2008133593A2/en
Priority to CN200880021905XA priority patent/CN101687228B/en
Priority to TW97115680A priority patent/TWI473667B/en
Publication of SG147336A1 publication Critical patent/SG147336A1/en

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Cleaning Process and Apparatus A cleaning module for cleaning one or more substrates, more particularly but not exclusively for cleaning aluminium discs, is disclosed. In particular, the cleaning module comprises one or more brushes operable to move along a radial path in relation to the substrate. In addition, a method of positioning at least one brush during the cleaning of the substrate by moving the brush along a radial path in relation to the substrate is also disclosed. Finally, a method of cleaning the substrate by moving the brush along the radial path in relation to the substrate and overlapping a scrubbing portion of the brush with a corresponding portion of the at least one substrate is disclosed.
SG200702957-2A 2007-04-27 2007-04-27 Cleaning process and apparatus SG147336A1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SG200702957-2A SG147336A1 (en) 2007-04-27 2007-04-27 Cleaning process and apparatus
SG2010079713A SG180053A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus
SG200719147-1A SG147361A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus
MYPI20094436A MY154924A (en) 2007-04-27 2008-04-22 Cleaning process and apparatus
PCT/SG2008/000133 WO2008133593A2 (en) 2007-04-27 2008-04-22 Cleaning process and apparatus
CN200880021905XA CN101687228B (en) 2007-04-27 2008-04-22 Cleaning process and apparatus
TW97115680A TWI473667B (en) 2007-04-27 2008-04-28 Cleaning process and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200702957-2A SG147336A1 (en) 2007-04-27 2007-04-27 Cleaning process and apparatus

Publications (1)

Publication Number Publication Date
SG147336A1 true SG147336A1 (en) 2008-11-28

Family

ID=40032348

Family Applications (3)

Application Number Title Priority Date Filing Date
SG200702957-2A SG147336A1 (en) 2007-04-27 2007-04-27 Cleaning process and apparatus
SG200719147-1A SG147361A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus
SG2010079713A SG180053A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG200719147-1A SG147361A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus
SG2010079713A SG180053A1 (en) 2007-04-27 2007-12-24 Cleaning process and apparatus

Country Status (3)

Country Link
CN (1) CN101687228B (en)
SG (3) SG147336A1 (en)
TW (1) TWI473667B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105057273A (en) * 2015-08-27 2015-11-18 苏州凯锝微电子有限公司 Ultrasonic lens cleaning device
CN107716273A (en) * 2016-08-12 2018-02-23 宁波创润新材料有限公司 To the processing method of metalliferous material
CN107401893A (en) * 2017-08-21 2017-11-28 无锡市强力干燥设备厂 PCR reacts lid plate rubber dedicated drying case
JP7101528B2 (en) * 2018-04-25 2022-07-15 東京エレクトロン株式会社 Board processing equipment
CN112354764B (en) * 2020-11-12 2021-08-06 湖南昕泰装饰材料有限公司 Surface pretreatment device for aluminum profile machining
CN114683163A (en) * 2020-12-31 2022-07-01 上海新昇半导体科技有限公司 Dehumidifying device and polishing equipment

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4601223A (en) * 1984-07-16 1986-07-22 Westinghouse Electric Corp. Flail tube cutter
JPH0652977U (en) * 1992-12-22 1994-07-19 株式会社北村製作所 Cleaning equipment
US5937469A (en) * 1996-12-03 1999-08-17 Intel Corporation Apparatus for mechanically cleaning the edges of wafers
JPH10323635A (en) * 1997-05-26 1998-12-08 Sony Corp Ultrasonic cleaning device
JP2001274130A (en) * 2000-03-24 2001-10-05 Mitsubishi Electric Corp Method of wet cleaning and manufacturing semiconductor device
US6532974B2 (en) * 2001-04-06 2003-03-18 Akrion Llc Process tank with pressurized mist generation
US6871657B2 (en) * 2001-04-06 2005-03-29 Akrion, Llc Low profile wafer carrier
TWI234497B (en) * 2004-08-17 2005-06-21 Yang-Kuan Wang Device using ultrasonic waves to clean LP records
US20070006892A1 (en) * 2005-07-08 2007-01-11 Imtec Acculine, Inc. Uniform, far-field megasonic cleaning method and apparatus
TWI348939B (en) * 2006-12-22 2011-09-21 Hon Hai Prec Ind Co Ltd Apparatus for cleaning article

Also Published As

Publication number Publication date
SG180053A1 (en) 2012-05-30
TW200900166A (en) 2009-01-01
CN101687228A (en) 2010-03-31
TWI473667B (en) 2015-02-21
CN101687228B (en) 2013-05-01
SG147361A1 (en) 2008-11-28

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