SG138559A1 - Resonant scanning mirror - Google Patents

Resonant scanning mirror

Info

Publication number
SG138559A1
SG138559A1 SG200704354-0A SG2007043540A SG138559A1 SG 138559 A1 SG138559 A1 SG 138559A1 SG 2007043540 A SG2007043540 A SG 2007043540A SG 138559 A1 SG138559 A1 SG 138559A1
Authority
SG
Singapore
Prior art keywords
scanning
substrate
frequency
flexures
scanning mirror
Prior art date
Application number
SG200704354-0A
Other languages
English (en)
Inventor
Santiago E Del Puerto
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG138559A1 publication Critical patent/SG138559A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200704354-0A 2006-06-23 2007-06-13 Resonant scanning mirror SG138559A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/473,326 US7697115B2 (en) 2006-06-23 2006-06-23 Resonant scanning mirror

Publications (1)

Publication Number Publication Date
SG138559A1 true SG138559A1 (en) 2008-01-28

Family

ID=38362178

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200704354-0A SG138559A1 (en) 2006-06-23 2007-06-13 Resonant scanning mirror

Country Status (7)

Country Link
US (1) US7697115B2 (fr)
EP (1) EP1870773A3 (fr)
JP (1) JP4860557B2 (fr)
KR (1) KR100923930B1 (fr)
CN (1) CN101154053B (fr)
SG (1) SG138559A1 (fr)
TW (1) TWI363934B (fr)

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US9645496B2 (en) * 2014-08-08 2017-05-09 David A. Markle Maskless digital lithography systems and methods with image motion compensation
DE102015212878A1 (de) * 2015-07-09 2017-01-12 Carl Zeiss Smt Gmbh Strahlführungsvorrichtung
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CN109212871B (zh) * 2018-11-13 2023-11-28 深圳创维新世界科技有限公司 投影显示装置
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US11689678B2 (en) * 2021-07-06 2023-06-27 Anhui Gaozhe Information Technology Co., Ltd Double-sided synchronous scanning device and double-sided synchronous scanner

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Also Published As

Publication number Publication date
US7697115B2 (en) 2010-04-13
EP1870773A2 (fr) 2007-12-26
JP4860557B2 (ja) 2012-01-25
EP1870773A3 (fr) 2009-07-22
CN101154053A (zh) 2008-04-02
KR100923930B1 (ko) 2009-10-28
KR20070122164A (ko) 2007-12-28
TWI363934B (en) 2012-05-11
CN101154053B (zh) 2011-05-18
TW200807182A (en) 2008-02-01
JP2008003608A (ja) 2008-01-10
US20080013097A1 (en) 2008-01-17

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