SG128652A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG128652A1
SG128652A1 SG200604391A SG200604391A SG128652A1 SG 128652 A1 SG128652 A1 SG 128652A1 SG 200604391 A SG200604391 A SG 200604391A SG 200604391 A SG200604391 A SG 200604391A SG 128652 A1 SG128652 A1 SG 128652A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200604391A
Other languages
English (en)
Inventor
Martinus Hendricus Hendr Hoeks
Patricius Aloysius J Tinnemans
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG128652A1 publication Critical patent/SG128652A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200604391A 2005-06-28 2006-06-27 Lithographic apparatus and device manufacturing method SG128652A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/167,918 US7965373B2 (en) 2005-06-28 2005-06-28 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load

Publications (1)

Publication Number Publication Date
SG128652A1 true SG128652A1 (en) 2007-01-30

Family

ID=36708057

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200604391A SG128652A1 (en) 2005-06-28 2006-06-27 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7965373B2 (de)
EP (1) EP1739494A3 (de)
JP (1) JP4481958B2 (de)
KR (1) KR100756503B1 (de)
CN (1) CN1892437B (de)
SG (1) SG128652A1 (de)
TW (1) TWI327686B (de)

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US7508491B2 (en) * 2006-04-12 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity
US8776052B2 (en) * 2007-02-16 2014-07-08 International Business Machines Corporation Method, an apparatus and a system for managing a distributed compression system
JP5253037B2 (ja) * 2008-08-18 2013-07-31 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
US8531648B2 (en) * 2008-09-22 2013-09-10 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
WO2010134017A1 (en) * 2009-05-20 2010-11-25 Mapper Lithography Ip B.V. Method of generating a two-level pattern for lithographic processing and pattern generator using the same
NL2005523A (en) 2009-10-28 2011-05-02 Asml Netherlands Bv Selection of optimum patterns in a design layout based on diffraction signature analysis.
WO2011104176A1 (en) * 2010-02-23 2011-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2013091222A (ja) * 2011-10-25 2013-05-16 Canon Inc 画像形成処理装置及び画像処理方法
US8627245B1 (en) * 2012-08-28 2014-01-07 International Business Machines Corporation Density balancing in multiple patterning lithography using integrated circuit layout fill
US8647893B1 (en) 2012-08-28 2014-02-11 International Business Machines Corporation Method for post decomposition density balancing in integrated circuit layouts, related system and program product
JP6037752B2 (ja) * 2012-09-28 2016-12-07 株式会社Ｓｃｒｅｅｎホールディングス 画像記録装置および画像記録方法
CN107924811B (zh) * 2015-09-30 2021-08-17 株式会社国际电气 基板处理系统、基板处理装置的文件管理方法及存储介质
KR102185748B1 (ko) * 2016-07-19 2020-12-03 에이에스엠엘 네델란즈 비.브이. 직접 기록 마스크리스 리소그래피용 장치
US10509328B2 (en) * 2018-04-27 2019-12-17 Applied Materials, Inc. Fabrication and use of dose maps and feature size maps during substrate processing
US11241823B2 (en) * 2018-07-10 2022-02-08 3D Systems, Inc. Three dimensional (3D) printer with high resolution light engine
EP3647873A1 (de) * 2018-11-02 2020-05-06 ASML Netherlands B.V. Verfahren zur charakterisierung von nachbearbeitungsdaten in bezug auf individuelle beiträge von verarbeitungsstationen

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DE59105735D1 (de) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung Belichtungsvorrichtung.
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
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JPH06274608A (ja) 1993-03-23 1994-09-30 Seiko Epson Corp マルチプロセッサ画像処理装置
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
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DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab Taeb Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
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Also Published As

Publication number Publication date
US20070009146A1 (en) 2007-01-11
JP4481958B2 (ja) 2010-06-16
CN1892437B (zh) 2011-05-18
US7965373B2 (en) 2011-06-21
TW200707134A (en) 2007-02-16
CN1892437A (zh) 2007-01-10
EP1739494A2 (de) 2007-01-03
KR100756503B1 (ko) 2007-09-10
KR20070001025A (ko) 2007-01-03
JP2007011329A (ja) 2007-01-18
TWI327686B (en) 2010-07-21
EP1739494A3 (de) 2007-05-02

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