SG120087A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG120087A1
SG120087A1 SG200300238A SG200300238A SG120087A1 SG 120087 A1 SG120087 A1 SG 120087A1 SG 200300238 A SG200300238 A SG 200300238A SG 200300238 A SG200300238 A SG 200300238A SG 120087 A1 SG120087 A1 SG 120087A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200300238A
Other languages
English (en)
Inventor
Jeroen Johannes Sophia Mertens
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG120087A1 publication Critical patent/SG120087A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200300238A 2002-02-01 2003-01-30 Lithographic apparatus and device manufacturing method SG120087A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02250707 2002-02-01

Publications (1)

Publication Number Publication Date
SG120087A1 true SG120087A1 (en) 2006-03-28

Family

ID=27771931

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200300238A SG120087A1 (en) 2002-02-01 2003-01-30 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US6847430B2 (zh)
JP (1) JP2004006690A (zh)
KR (1) KR100733128B1 (zh)
CN (1) CN1288504C (zh)
DE (1) DE60321842D1 (zh)
SG (1) SG120087A1 (zh)
TW (1) TW587278B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101353868B1 (ko) * 2005-09-13 2014-01-20 칼 짜이스 에스엠테 게엠베하 노출 공정을 위한 광학 요소 유닛
US8454749B2 (en) * 2005-12-19 2013-06-04 Tokyo Electron Limited Method and system for sealing a first assembly to a second assembly of a processing system
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
NL1036543A1 (nl) * 2008-02-20 2009-08-24 Asml Netherlands Bv Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method.
DE102008000957A1 (de) * 2008-04-03 2009-10-08 Carl Zeiss Smt Ag Schutzmodul sowie EUV-Lithographievorrichtung mit Schutzmodul
DE102008041827A1 (de) * 2008-09-05 2010-03-18 Carl Zeiss Smt Ag Schutzmodul für EUV-Lithographievorrichtung sowie EUV-Lithographievorrichtung
DE102009029282A1 (de) 2009-09-08 2011-03-24 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere in einer Projektionsbelichtungsanlage für die EUV-Lithographie
US9111729B2 (en) * 2009-12-03 2015-08-18 Lam Research Corporation Small plasma chamber systems and methods
CN102411265A (zh) * 2011-11-22 2012-04-11 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
US9662688B2 (en) 2012-07-09 2017-05-30 Kla-Tencor Corporation Apparatus and method for cross-flow purge for optical components in a chamber
CN104749893B (zh) * 2013-12-30 2019-01-29 上海微电子装备（集团）股份有限公司 一种极紫外光刻设备投影系统的环境控制装置
CN105842997B (zh) * 2016-06-03 2018-03-06 中国科学院光电研究院 一种动态气体锁的试验装置和试验方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0397216A (ja) 1989-09-11 1991-04-23 Hitachi Ltd 投影露光装置
US4989031A (en) 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
KR970067591A (ko) * 1996-03-04 1997-10-13 오노 시게오 투영노광장치
US6177668B1 (en) * 1996-06-06 2001-01-23 Mds Inc. Axial ejection in a multipole mass spectrometer
US5971009A (en) * 1997-02-10 1999-10-26 Tanksafe Inc. Dual containment assembly
JP4181647B2 (ja) * 1997-04-15 2008-11-19 キヤノン株式会社 露光方法
US6268904B1 (en) * 1997-04-23 2001-07-31 Nikon Corporation Optical exposure apparatus and photo-cleaning method
WO1998057213A1 (fr) * 1997-06-10 1998-12-17 Nikon Corporation Dispositif optique, son procede de nettoyage, dispositif d'alignement de projection et son procede de fabrication
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
JPH11274050A (ja) * 1998-03-25 1999-10-08 Canon Inc 露光装置およびデバイス製造方法
JP3832984B2 (ja) * 1998-10-27 2006-10-11 キヤノン株式会社 露光装置およびデバイス製造方法
KR100805142B1 (ko) 1999-07-16 2008-02-21 가부시키가이샤 니콘 노광방법 및 노광장치
EP1098226A3 (en) 1999-11-05 2002-01-09 Asm Lithography B.V. Lithographic apparatus with gas flushing system
EP1098225A3 (en) 1999-11-05 2002-04-10 Asm Lithography B.V. Lithographic projection apparatus with purge gas system and method using the same
TWI226972B (en) * 2000-06-01 2005-01-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2001358056A (ja) * 2000-06-15 2001-12-26 Canon Inc 露光装置

Also Published As

Publication number Publication date
US6847430B2 (en) 2005-01-25
US20030197844A1 (en) 2003-10-23
KR100733128B1 (ko) 2007-06-27
CN1441317A (zh) 2003-09-10
TW200305192A (en) 2003-10-16
TW587278B (en) 2004-05-11
CN1288504C (zh) 2006-12-06
KR20030080191A (ko) 2003-10-11
DE60321842D1 (de) 2008-08-14
JP2004006690A (ja) 2004-01-08

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