SG115671A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG115671A1
SG115671A1 SG200402027A SG200402027A SG115671A1 SG 115671 A1 SG115671 A1 SG 115671A1 SG 200402027 A SG200402027 A SG 200402027A SG 200402027 A SG200402027 A SG 200402027A SG 115671 A1 SG115671 A1 SG 115671A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200402027A
Other languages
English (en)
Inventor
Armand Eugene Albert Koolen
Edwin Wilhelmus Marie Knols
Manfred Maul
Original Assignee
Asml Netherlands Bv
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Zeiss Carl Smt Ag filed Critical Asml Netherlands Bv
Publication of SG115671A1 publication Critical patent/SG115671A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733—Geometry aspects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06716—Elastic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/36—Arrangements for testing, measuring or monitoring the electrical condition of accumulators or electric batteries, e.g. capacity or state of charge [SoC]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
SG200402027A 2003-04-17 2004-04-14 Lithographic apparatus and device manufacturing method SG115671A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03076142A EP1469347A1 (fr) 2003-04-17 2003-04-17 Appareil de projection lithographique et méthode de fabrication d'un dispositif

Publications (1)

Publication Number Publication Date
SG115671A1 true SG115671A1 (en) 2005-10-28

Family

ID=32892938

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200402027A SG115671A1 (en) 2003-04-17 2004-04-14 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US20040257547A1 (fr)
EP (1) EP1469347A1 (fr)
JP (1) JP2004349686A (fr)
KR (1) KR20040090734A (fr)
CN (1) CN1542552A (fr)
SG (1) SG115671A1 (fr)
TW (1) TWI240152B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7342644B2 (en) * 2004-12-29 2008-03-11 Asml Netherlands B.V. Methods and systems for lithographic beam generation
US7525638B2 (en) * 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070046917A1 (en) * 2005-08-31 2007-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU
US7397535B2 (en) * 2005-12-21 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036614A1 (nl) * 2008-03-21 2009-09-22 Asml Netherlands Bv A target material, a source, an EUV lithographic apparatus and a device manufacturing method using the same.
DE102009010560A1 (de) * 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren, Projektionsbelichtungsanlage, Laserstrahlungsquelle und Bandbreiten-Einengungsmodul für eine Laserstrahlungsquelle
WO2012116710A1 (fr) * 2011-02-28 2012-09-07 Carl Zeiss Smt Gmbh Système d'éclairage d'un appareil d'exposition à projection microlithographique
JP5682799B2 (ja) * 2013-07-18 2015-03-11 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
WO2015044182A2 (fr) * 2013-09-25 2015-04-02 Asml Netherlands B.V. Appareil d'acheminement de faisceau et procédé associé
KR101828711B1 (ko) 2016-10-18 2018-02-13 인하대학교 산학협력단 복수의 dmd를 구비하는 노광장치
EP3647872A1 (fr) 2018-11-01 2020-05-06 ASML Netherlands B.V. Procédé permettant de commander le réglage de profil de dose d'un appareil lithographique
CN117355794A (zh) * 2021-04-01 2024-01-05 Asml荷兰有限公司 激光系统
EP4390544A1 (fr) * 2022-12-23 2024-06-26 ASML Netherlands B.V. Système optique

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
JPH05217844A (ja) * 1992-01-30 1993-08-27 Matsushita Electric Ind Co Ltd 投影露光装置
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
JPH10229044A (ja) * 1996-12-13 1998-08-25 Nikon Corp 露光装置および該露光装置を用いた半導体デバイスの製造方法
US6313918B1 (en) * 1998-09-18 2001-11-06 Zygo Corporation Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion
JP2000277421A (ja) * 1999-03-26 2000-10-06 Nikon Corp 照明装置
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
JP2001155993A (ja) * 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
JP3495992B2 (ja) * 2001-01-26 2004-02-09 キヤノン株式会社 補正装置、露光装置、デバイス製造方法及びデバイス
JP4401060B2 (ja) * 2001-06-01 2010-01-20 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置、およびデバイス製造方法

Also Published As

Publication number Publication date
TWI240152B (en) 2005-09-21
KR20040090734A (ko) 2004-10-26
TW200426540A (en) 2004-12-01
EP1469347A1 (fr) 2004-10-20
JP2004349686A (ja) 2004-12-09
CN1542552A (zh) 2004-11-03
US20040257547A1 (en) 2004-12-23

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