SG115641A1 - Device and method for manipulation and routing of a metrology beam - Google Patents

Device and method for manipulation and routing of a metrology beam

Info

Publication number
SG115641A1
SG115641A1 SG200401492A SG200401492A SG115641A1 SG 115641 A1 SG115641 A1 SG 115641A1 SG 200401492 A SG200401492 A SG 200401492A SG 200401492 A SG200401492 A SG 200401492A SG 115641 A1 SG115641 A1 SG 115641A1
Authority
SG
Singapore
Prior art keywords
routing
manipulation
metrology beam
metrology
Prior art date
Application number
SG200401492A
Other languages
English (en)
Inventor
Der Pasch Engelbertus Anto Van
Marcel Hendrikus Maria Beems
Emiel Jozef Melanie Eussen
Engelbertus Johanne Klijntunte
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG115641A1 publication Critical patent/SG115641A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200401492A 2003-03-06 2004-02-27 Device and method for manipulation and routing of a metrology beam SG115641A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03075659 2003-03-06

Publications (1)

Publication Number Publication Date
SG115641A1 true SG115641A1 (en) 2005-10-28

Family

ID=33442798

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200401492A SG115641A1 (en) 2003-03-06 2004-02-27 Device and method for manipulation and routing of a metrology beam

Country Status (6)

Country Link
US (1) US7177059B2 (ko)
JP (1) JP2004343058A (ko)
KR (1) KR20040078902A (ko)
CN (1) CN100524027C (ko)
SG (1) SG115641A1 (ko)
TW (1) TWI285794B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100471246C (zh) * 2005-08-01 2009-03-18 深圳市欧曼特微显示科技有限公司 一种用于投影系统的光学结构
CN101526746A (zh) * 2009-01-07 2009-09-09 上海微电子装备有限公司 可调整零平面位置的垂向测量系统
CN102353389A (zh) * 2011-07-22 2012-02-15 Tcl集团股份有限公司 提高阵列探测器成像分辨率的系统及其实现方法
KR101259327B1 (ko) 2012-04-09 2013-05-06 포항공과대학교 산학협력단 자체상관기
JP6940757B2 (ja) * 2017-06-30 2021-09-29 日亜化学工業株式会社 パターン化基板の製造方法および半導体装置の製造方法

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FR2669441B1 (fr) * 1990-11-16 1993-01-22 Thomson Csf Dispositif de stabilisation de la reflectivite de miroirs a conjugaison de phase par diffusion brillouin stimulee a haute cadence de repetition d'impulsions.
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JPH07106230A (ja) * 1993-10-07 1995-04-21 Nikon Corp プロキシミティ露光装置
JPH08122036A (ja) * 1994-10-27 1996-05-17 Olympus Optical Co Ltd 走査型近接場光学顕微鏡
US5715059A (en) * 1996-06-28 1998-02-03 Polaroid Corporation Dark field, photon tunneling imaging systems and methods
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JPH10111471A (ja) * 1996-08-09 1998-04-28 Toyota Motor Corp レーザ光学系およびレーザ溶接装置
DE69735016T2 (de) * 1996-12-24 2006-08-17 Asml Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
EP0956516B1 (en) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
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Also Published As

Publication number Publication date
US20040233494A1 (en) 2004-11-25
CN100524027C (zh) 2009-08-05
CN1527140A (zh) 2004-09-08
TWI285794B (en) 2007-08-21
TW200426530A (en) 2004-12-01
KR20040078902A (ko) 2004-09-13
US7177059B2 (en) 2007-02-13
JP2004343058A (ja) 2004-12-02

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