SG11202107214UA - Method for producing cyclobutane - Google Patents
Method for producing cyclobutaneInfo
- Publication number
- SG11202107214UA SG11202107214UA SG11202107214UA SG11202107214UA SG11202107214UA SG 11202107214U A SG11202107214U A SG 11202107214UA SG 11202107214U A SG11202107214U A SG 11202107214UA SG 11202107214U A SG11202107214U A SG 11202107214UA SG 11202107214U A SG11202107214U A SG 11202107214UA
- Authority
- SG
- Singapore
- Prior art keywords
- cyclobutane
- producing
- producing cyclobutane
- Prior art date
Links
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/07—Preparation of halogenated hydrocarbons by addition of hydrogen halides
- C07C17/087—Preparation of halogenated hydrocarbons by addition of hydrogen halides to unsaturated halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C23/00—Compounds containing at least one halogen atom bound to a ring other than a six-membered aromatic ring
- C07C23/02—Monocyclic halogenated hydrocarbons
- C07C23/06—Monocyclic halogenated hydrocarbons with a four-membered ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Preparation Of Compounds By Using Micro-Organisms (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019001661A JP6874778B2 (ja) | 2019-01-09 | 2019-01-09 | シクロブタンの製造方法 |
PCT/JP2019/050022 WO2020145088A1 (ja) | 2019-01-09 | 2019-12-20 | シクロブタンの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202107214UA true SG11202107214UA (en) | 2021-07-29 |
Family
ID=71521517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202107214UA SG11202107214UA (en) | 2019-01-09 | 2019-12-20 | Method for producing cyclobutane |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6874778B2 (zh) |
KR (1) | KR102578063B1 (zh) |
CN (1) | CN113272268B (zh) |
SG (1) | SG11202107214UA (zh) |
TW (1) | TWI798518B (zh) |
WO (1) | WO2020145088A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023049515A1 (en) * | 2021-09-27 | 2023-03-30 | Honeywell International Inc. | Fluorine substituted cyclobutene compounds, and compositions, methods and uses including same |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2992279A (en) * | 1955-09-14 | 1961-07-11 | Haszeldine Robert Neville | 1-iodo, 2-trifluoromethyl perfluorocycloalkanes |
GB1342429A (en) * | 1970-05-10 | 1974-01-03 | Grace W R & Co | Anaesthetic cyclobutane compounds |
CN101432252B (zh) * | 2006-04-28 | 2012-03-28 | 昭和电工株式会社 | 1,2,3,4-四氯六氟丁烷的制造方法 |
JP4919283B2 (ja) * | 2007-03-28 | 2012-04-18 | 独立行政法人産業技術総合研究所 | 含フッ素環状化合物およびその製造方法 |
US8318991B2 (en) * | 2008-07-18 | 2012-11-27 | Zeon Corporation | Method for producing hydrogen-containing fluoroolefin compound |
JP5056963B2 (ja) * | 2010-03-31 | 2012-10-24 | ダイキン工業株式会社 | 含フッ素アルカンの製造方法 |
JP5682381B2 (ja) * | 2011-03-09 | 2015-03-11 | 日本ゼオン株式会社 | 含ハロゲノフッ素化シクロアルカン、及び含水素フッ素化シクロアルカンの製造方法 |
JP6257638B2 (ja) * | 2012-10-30 | 2018-01-10 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | 高アスペクト比酸化物エッチング用のフルオロカーボン分子 |
TWI695423B (zh) * | 2014-06-18 | 2020-06-01 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 用於tsv/mems/功率元件蝕刻的化學物質 |
US9790151B2 (en) * | 2015-11-12 | 2017-10-17 | Honeywell International Inc. | Process for making 2,3,3,3-tetrafluoropropene and/or vinylidine fluoride |
KR102411668B1 (ko) * | 2016-03-17 | 2022-06-20 | 니폰 제온 가부시키가이샤 | 플라즈마 에칭 방법 |
CN107721810B (zh) * | 2017-11-07 | 2020-12-01 | 中国民航大学 | 一种合成灭火剂八氟环丁烷的方法 |
-
2019
- 2019-01-09 JP JP2019001661A patent/JP6874778B2/ja active Active
- 2019-12-20 WO PCT/JP2019/050022 patent/WO2020145088A1/ja active Application Filing
- 2019-12-20 CN CN201980088269.0A patent/CN113272268B/zh active Active
- 2019-12-20 SG SG11202107214UA patent/SG11202107214UA/en unknown
- 2019-12-20 KR KR1020217024996A patent/KR102578063B1/ko active IP Right Grant
-
2020
- 2020-01-06 TW TW109100254A patent/TWI798518B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN113272268A (zh) | 2021-08-17 |
TWI798518B (zh) | 2023-04-11 |
KR20210113300A (ko) | 2021-09-15 |
WO2020145088A1 (ja) | 2020-07-16 |
TW202035347A (zh) | 2020-10-01 |
JP2020111520A (ja) | 2020-07-27 |
JP6874778B2 (ja) | 2021-05-19 |
CN113272268B (zh) | 2024-06-21 |
KR102578063B1 (ko) | 2023-09-14 |
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