SG11202107064VA - Method for purifying hexafluorobutadiene - Google Patents
Method for purifying hexafluorobutadieneInfo
- Publication number
- SG11202107064VA SG11202107064VA SG11202107064VA SG11202107064VA SG11202107064VA SG 11202107064V A SG11202107064V A SG 11202107064VA SG 11202107064V A SG11202107064V A SG 11202107064VA SG 11202107064V A SG11202107064V A SG 11202107064VA SG 11202107064V A SG11202107064V A SG 11202107064VA
- Authority
- SG
- Singapore
- Prior art keywords
- hexafluorobutadiene
- purifying
- purifying hexafluorobutadiene
- Prior art date
Links
- LGPPATCNSOSOQH-UHFFFAOYSA-N 1,1,2,3,4,4-hexafluorobuta-1,3-diene Chemical compound FC(F)=C(F)C(F)=C(F)F LGPPATCNSOSOQH-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
- C07C17/389—Separation; Purification; Stabilisation; Use of additives by adsorption on solids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
- C07C21/19—Halogenated dienes
- C07C21/20—Halogenated butadienes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018247366A JP6835061B2 (ja) | 2018-12-28 | 2018-12-28 | ヘキサフルオロブタジエンの精製方法 |
| PCT/JP2019/049986 WO2020137845A1 (ja) | 2018-12-28 | 2019-12-20 | ヘキサフルオロブタジエンの精製方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202107064VA true SG11202107064VA (en) | 2021-07-29 |
Family
ID=71126217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202107064VA SG11202107064VA (en) | 2018-12-28 | 2019-12-20 | Method for purifying hexafluorobutadiene |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP3904320A4 (de) |
| JP (1) | JP6835061B2 (de) |
| KR (1) | KR102634564B1 (de) |
| CN (1) | CN113227024A (de) |
| SG (1) | SG11202107064VA (de) |
| TW (1) | TWI816959B (de) |
| WO (1) | WO2020137845A1 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202124344A (zh) * | 2019-09-12 | 2021-07-01 | 日商關東電化工業股份有限公司 | 具有＝ｃｆ或＝ｃｈｆ構造的氟烯烴之精製方法，及高純度氟烯烴以及其製造方法 |
| CN113105303B (zh) * | 2021-03-27 | 2022-11-25 | 上海化工研究院有限公司 | 一种六氟丁二烯的精制方法 |
| CN113257671B (zh) * | 2021-07-02 | 2021-10-12 | 浙江陶特容器科技股份有限公司 | 一种利用高纯电子级六氟丁二烯的半导体器件蚀刻方法 |
| KR102612966B1 (ko) * | 2022-07-04 | 2023-12-15 | (주)원익머트리얼즈 | 신규의 옥타플루오로시클로부탄(c4f8) 정제방법 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3702886A (en) * | 1969-10-10 | 1972-11-14 | Mobil Oil Corp | Crystalline zeolite zsm-5 and method of preparing the same |
| JPS5439624A (en) | 1977-09-02 | 1979-03-27 | Matsushita Electric Ind Co Ltd | Diaphragm for speakers |
| US6544319B1 (en) | 2002-01-16 | 2003-04-08 | Air Products And Chemicals, Inc. | Purification of hexafluoro-1,3-butadiene |
| KR101045717B1 (ko) * | 2006-04-28 | 2011-06-30 | 쇼와 덴코 가부시키가이샤 | 헥사플루오로-1,3-부타디엔의 제조 방법 |
| JP4896965B2 (ja) * | 2006-04-28 | 2012-03-14 | 昭和電工株式会社 | １，２，３，４−テトラクロロヘキサフルオロブタンの製造方法 |
| CN101646640B (zh) * | 2007-03-30 | 2013-01-09 | 昭和电工株式会社 | 含氯含氟化合物的制造方法 |
| JP5607354B2 (ja) * | 2009-12-28 | 2014-10-15 | ユニオン昭和株式会社 | 高純度含フッ素化合物の製造方法及びその方法で得られた高純度含フッ素化合物 |
| WO2015093527A1 (ja) * | 2013-12-20 | 2015-06-25 | 日本ゼオン株式会社 | フッ素化炭化水素化合物の精製方法 |
| CN107032949B (zh) * | 2016-02-04 | 2020-09-22 | 浙江蓝天环保高科技股份有限公司 | 一种六氟丁二烯的纯化方法 |
| CN108276246A (zh) * | 2018-02-08 | 2018-07-13 | 浙江博瑞电子科技有限公司 | 一种六氟丁二烯精制的方法 |
| CN108623432A (zh) * | 2018-06-19 | 2018-10-09 | 宇极（廊坊）新材料有限公司 | 一种采用吸附-低温精馏法制备高纯六氟-1,3-丁二烯的工艺 |
-
2018
- 2018-12-28 JP JP2018247366A patent/JP6835061B2/ja active Active
-
2019
- 2019-12-20 CN CN201980086867.4A patent/CN113227024A/zh active Pending
- 2019-12-20 EP EP19903555.1A patent/EP3904320A4/de active Pending
- 2019-12-20 SG SG11202107064VA patent/SG11202107064VA/en unknown
- 2019-12-20 KR KR1020217023102A patent/KR102634564B1/ko active IP Right Grant
- 2019-12-20 WO PCT/JP2019/049986 patent/WO2020137845A1/ja unknown
- 2019-12-26 TW TW108147752A patent/TWI816959B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6835061B2 (ja) | 2021-02-24 |
| TWI816959B (zh) | 2023-10-01 |
| TW202037584A (zh) | 2020-10-16 |
| EP3904320A1 (de) | 2021-11-03 |
| CN113227024A (zh) | 2021-08-06 |
| WO2020137845A1 (ja) | 2020-07-02 |
| EP3904320A4 (de) | 2022-11-02 |
| KR102634564B1 (ko) | 2024-02-08 |
| KR20210107767A (ko) | 2021-09-01 |
| JP2020105135A (ja) | 2020-07-09 |
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