SG11202005503VA - Process for transfer imprinting - Google Patents

Process for transfer imprinting

Info

Publication number
SG11202005503VA
SG11202005503VA SG11202005503VA SG11202005503VA SG11202005503VA SG 11202005503V A SG11202005503V A SG 11202005503VA SG 11202005503V A SG11202005503V A SG 11202005503VA SG 11202005503V A SG11202005503V A SG 11202005503VA SG 11202005503V A SG11202005503V A SG 11202005503VA
Authority
SG
Singapore
Prior art keywords
transfer imprinting
imprinting
transfer
Prior art date
Application number
SG11202005503VA
Other languages
English (en)
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Florian Delachat
Hubert Teyssedre
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11202005503VA publication Critical patent/SG11202005503VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B29C33/62—Releasing, lubricating or separating agents based on polymers or oligomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/06—Hydrocarbons
    • C08F112/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/26—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F130/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F130/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Eyeglasses (AREA)
  • Confectionery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Polymerization Catalysts (AREA)
  • Decoration By Transfer Pictures (AREA)
SG11202005503VA 2017-12-21 2018-12-19 Process for transfer imprinting SG11202005503VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1762830A FR3075800B1 (fr) 2017-12-21 2017-12-21 Couches anti adhesives pour les procedes d'impression par transfert
PCT/FR2018/053396 WO2019122705A1 (fr) 2017-12-21 2018-12-19 Procédé d'impression par transfert

Publications (1)

Publication Number Publication Date
SG11202005503VA true SG11202005503VA (en) 2020-07-29

Family

ID=61224154

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202005503VA SG11202005503VA (en) 2017-12-21 2018-12-19 Process for transfer imprinting

Country Status (9)

Country Link
US (2) US11880131B2 (zh)
EP (1) EP3729194A1 (zh)
JP (1) JP6997321B2 (zh)
KR (1) KR102446759B1 (zh)
CN (1) CN111492308B (zh)
FR (1) FR3075800B1 (zh)
SG (1) SG11202005503VA (zh)
TW (1) TWI696653B (zh)
WO (1) WO2019122705A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111941714B (zh) * 2020-07-03 2022-06-28 东莞市天沛塑料有限公司 一种eps塑料泡沫脱模工艺
CN113075858A (zh) * 2021-03-26 2021-07-06 歌尔股份有限公司 中间转印模板的处理方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3008920A (en) * 1959-04-27 1961-11-14 Dow Chemical Co Method of inhibiting homopolymerization in graft copolymers with copper salts
US20030080471A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US20030071016A1 (en) * 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
FR2866026B1 (fr) * 2004-02-06 2008-05-23 Arkema Procede de polymerisation radicalaire en emulsion mettant en oeuvre des alcoxyamines hydrosolubles
TWI248859B (en) * 2004-11-24 2006-02-11 Ind Tech Res Inst Manufacture of mold core used in nanoimprint
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
JP2011148117A (ja) 2010-01-19 2011-08-04 Fujifilm Corp インプリント用モールド離型剤
KR20130071426A (ko) * 2010-03-30 2013-06-28 호야 가부시키가이샤 임프린트용 이형층 부착 몰드 및 임프린트용 이형층 부착 몰드의 제조 방법, 카피 몰드의 제조 방법
JP5606826B2 (ja) 2010-08-24 2014-10-15 Ｈｏｙａ株式会社 インプリント用離型層、インプリント用離型層付きモールド及びインプリント用離型層付きモールドの製造方法
JP5459042B2 (ja) 2010-04-23 2014-04-02 横浜ゴム株式会社 タイヤ製造用ブラダーの製造方法
FR2974094A1 (fr) * 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
FR2983773B1 (fr) * 2011-12-09 2014-10-24 Arkema France Procede de preparation de surfaces
CN104220224B (zh) * 2012-04-10 2016-11-09 大金工业株式会社 压印用树脂模具材料组合物
EP2856258B1 (en) 2012-05-25 2021-01-06 Micro Resist Technology Gesellschaft für chemische Materialien spezieller Photoresistsysteme mbH Process of production of a nanopatterned article using nanoimprint lithography, nanopatterned article and uses thereof
CN105121157B (zh) * 2013-04-11 2017-08-08 综研化学株式会社 叠层体
FR3008986B1 (fr) * 2013-07-25 2016-12-30 Arkema France Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
FR3010414B1 (fr) * 2013-09-09 2015-09-25 Arkema France Procede d'obtention de films epais nano-structures obtenus a partir d'une composition de copolymeres a blocs
FR3014876B1 (fr) * 2013-12-13 2017-03-31 Arkema France Procede de realisation d'un film de copolymere a blocs sur un substrat
FR3031749B1 (fr) * 2015-01-21 2018-09-28 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymeres a blocs
FR3031751B1 (fr) * 2015-01-21 2018-10-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymere a blocs
RU2753172C2 (ru) * 2016-12-22 2021-08-12 Иллюмина, Инк. Устройство для выдавливания рельефа
WO2018195119A1 (en) * 2017-04-17 2018-10-25 Cornell University Fluorine-free oil repellent coating, methods of making same, and uses of same

Also Published As

Publication number Publication date
KR102446759B1 (ko) 2022-09-22
US20210072639A1 (en) 2021-03-11
FR3075800B1 (fr) 2020-10-09
CN111492308B (zh) 2023-10-31
KR20200093668A (ko) 2020-08-05
JP2021508169A (ja) 2021-02-25
EP3729194A1 (fr) 2020-10-28
FR3075800A1 (fr) 2019-06-28
US20240103361A1 (en) 2024-03-28
CN111492308A (zh) 2020-08-04
WO2019122705A1 (fr) 2019-06-27
JP6997321B2 (ja) 2022-01-17
TWI696653B (zh) 2020-06-21
US11880131B2 (en) 2024-01-23
TW201932519A (zh) 2019-08-16

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