SG11202004183TA - Composition and method for polishing memory hard disks exhibiting reduced surface scratching - Google Patents

Composition and method for polishing memory hard disks exhibiting reduced surface scratching

Info

Publication number
SG11202004183TA
SG11202004183TA SG11202004183TA SG11202004183TA SG11202004183TA SG 11202004183T A SG11202004183T A SG 11202004183TA SG 11202004183T A SG11202004183T A SG 11202004183TA SG 11202004183T A SG11202004183T A SG 11202004183TA SG 11202004183T A SG11202004183T A SG 11202004183TA
Authority
SG
Singapore
Prior art keywords
composition
hard disks
reduced surface
exhibiting reduced
memory hard
Prior art date
Application number
SG11202004183TA
Inventor
Ke Zhang
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of SG11202004183TA publication Critical patent/SG11202004183TA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG11202004183TA 2017-11-20 2018-10-25 Composition and method for polishing memory hard disks exhibiting reduced surface scratching SG11202004183TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/817,959 US20190153262A1 (en) 2017-11-20 2017-11-20 Composition and method for polishing memory hard disks exhibiting reduced surface scratching
PCT/US2018/057478 WO2019099161A2 (en) 2017-11-20 2018-10-25 Composition and method for polishing memory hard disks exhibiting reduced surface scratching

Publications (1)

Publication Number Publication Date
SG11202004183TA true SG11202004183TA (en) 2020-06-29

Family

ID=66533873

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202004183TA SG11202004183TA (en) 2017-11-20 2018-10-25 Composition and method for polishing memory hard disks exhibiting reduced surface scratching

Country Status (8)

Country Link
US (1) US20190153262A1 (en)
EP (1) EP3714013B8 (en)
JP (1) JP7163387B2 (en)
KR (1) KR20200078670A (en)
CN (1) CN111655809B (en)
SG (1) SG11202004183TA (en)
TW (1) TWI692510B (en)
WO (1) WO2019099161A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11202006025YA (en) * 2017-12-27 2020-07-29 Kao Corp Method for producing aluminum platter

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6083419A (en) * 1997-07-28 2000-07-04 Cabot Corporation Polishing composition including an inhibitor of tungsten etching
JP3869608B2 (en) * 2000-01-25 2007-01-17 Ｎｅｃエレクトロニクス株式会社 Anticorrosive
JP4009986B2 (en) * 2000-11-29 2007-11-21 株式会社フジミインコーポレーテッド Polishing composition and polishing method for polishing memory hard disk using the same
US6805812B2 (en) * 2001-10-11 2004-10-19 Cabot Microelectronics Corporation Phosphono compound-containing polishing composition and method of using same
KR100952870B1 (en) * 2001-10-26 2010-04-13 아사히 가라스 가부시키가이샤 Polishing compound, method for production thereof and polishing method
US6682575B2 (en) * 2002-03-05 2004-01-27 Cabot Microelectronics Corporation Methanol-containing silica-based CMP compositions
KR20060016498A (en) * 2004-08-18 2006-02-22 삼성전자주식회사 Slurry composition, method for forming the slurry composition and method for polishing an object using the slurry composition
US20090094901A1 (en) * 2006-04-24 2009-04-16 Hitachi Chemical Co. Ltd. CMP Polishing Liquid and Polishing Method
KR20130027057A (en) * 2006-07-05 2013-03-14 히타치가세이가부시끼가이샤 Polishing liquid for cmp and polishing method
US8821750B2 (en) * 2007-02-27 2014-09-02 Hitachi Chemical Co., Ltd. Metal polishing slurry and polishing method
JP5285866B2 (en) * 2007-03-26 2013-09-11 富士フイルム株式会社 Polishing liquid
MY151756A (en) * 2007-10-29 2014-06-30 Kao Corp Polishing composition for hard disk substrate
US8247326B2 (en) * 2008-07-10 2012-08-21 Cabot Microelectronics Corporation Method of polishing nickel-phosphorous
US8883034B2 (en) * 2009-09-16 2014-11-11 Brian Reiss Composition and method for polishing bulk silicon
JP5657247B2 (en) * 2009-12-25 2015-01-21 花王株式会社 Polishing liquid composition
JP5695367B2 (en) * 2010-08-23 2015-04-01 株式会社フジミインコーポレーテッド Polishing composition and polishing method using the same
JP5979871B2 (en) * 2011-03-09 2016-08-31 花王株式会社 Manufacturing method of magnetic disk substrate
KR102028217B1 (en) * 2011-11-25 2019-10-02 가부시키가이샤 후지미인코퍼레이티드 Polishing composition
US9039914B2 (en) * 2012-05-23 2015-05-26 Cabot Microelectronics Corporation Polishing composition for nickel-phosphorous-coated memory disks
US8518135B1 (en) * 2012-08-27 2013-08-27 Cabot Microelectronics Corporation Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks
KR101573113B1 (en) * 2013-08-30 2015-12-01 엘티씨에이엠 주식회사 Slurry Composition for Chemical Mechanical Polishing
WO2015138209A1 (en) * 2014-03-12 2015-09-17 Cabot Microelectronics Corporation Compositions and methods for cmp of tungsten materials
US9401104B2 (en) * 2014-05-05 2016-07-26 Cabot Microelectronics Corporation Polishing composition for edge roll-off improvement
US9803109B2 (en) * 2015-02-03 2017-10-31 Cabot Microelectronics Corporation CMP composition for silicon nitride removal
US10315285B2 (en) * 2015-04-06 2019-06-11 Cabot Microelectronics Corporation CMP composition and method for polishing rigid disks
KR101854499B1 (en) * 2015-04-24 2018-05-04 삼성에스디아이 주식회사 Cmp slurry composition for copper wire and polishing method using the same
JPWO2017061109A1 (en) * 2015-10-07 2018-07-19 三洋化成工業株式会社 Abrasive material for magnetic disk and method of manufacturing magnetic disk
KR101854510B1 (en) * 2015-12-11 2018-05-03 삼성에스디아이 주식회사 Cmp slurry composition for metal wiring and polishing method using the same
CN106928861A (en) * 2015-12-31 2017-07-07 安集微电子科技(上海)有限公司 A kind of barrier layer chemical mechanical polishing liquid of alkalescence
JP2017139386A (en) * 2016-02-04 2017-08-10 東京応化工業株式会社 Polishing liquid for CMP and polishing method

Also Published As

Publication number Publication date
CN111655809B (en) 2022-05-17
EP3714013A4 (en) 2021-09-01
EP3714013A2 (en) 2020-09-30
EP3714013B1 (en) 2023-12-27
TWI692510B (en) 2020-05-01
CN111655809A (en) 2020-09-11
KR20200078670A (en) 2020-07-01
WO2019099161A2 (en) 2019-05-23
TW201922980A (en) 2019-06-16
JP2021503684A (en) 2021-02-12
US20190153262A1 (en) 2019-05-23
EP3714013B8 (en) 2024-04-03
WO2019099161A3 (en) 2019-06-27
JP7163387B2 (en) 2022-10-31

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