MY151756A - Polishing composition for hard disk substrate - Google Patents

Polishing composition for hard disk substrate

Info

Publication number
MY151756A
MY151756A MYPI20084288A MY151756A MY 151756 A MY151756 A MY 151756A MY PI20084288 A MYPI20084288 A MY PI20084288A MY 151756 A MY151756 A MY 151756A
Authority
MY
Malaysia
Prior art keywords
particles
hard disk
polishing composition
disk substrate
electron microscope
Prior art date
Application number
Inventor
Masahiko Suzuki
Kenichi Suenaga
Makoto Suzuki
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007341301A external-priority patent/JP2009163810A/en
Priority claimed from JP2008143257A external-priority patent/JP4981750B2/en
Application filed by Kao Corp filed Critical Kao Corp
Publication of MY151756A publication Critical patent/MY151756A/en

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

A POLISHING COMPOSITION FOR A HARD DISK SUBSTRATE INCLUDES ALUMINA PARTICLES, SILICA PARTICLES, AND WATER. THE VOLUME MEDIAN DIAMETER OF SECONDARY PARTICLES OF THE ALUMINA PARTICLES MEASURED BY A LASER BEAM DIFFRACTION METHOD IS 0.1 TO 0.8 µM. THE VOLUME MEDIAN DIAMETER OF PRIMARY PARTICLES OF THE SILICA PARTICLES MEASURED BY TRANSMISSION ELECTRON MICROSCOPE PARTICLES OF THE SILICA PARTICLES MEASURED BY TRANSMISSION ELECTRON MICROSCOPE OBSERVATION IS 40 TO 150 NM. THE STANDARD DEVIATION IN NUMBER BASIS PARTICLE SIZE OF THE PRIMARY PARTICLES OF THE SILICA PARTICLES MEASURED BY THE TRANSMISSION ELECTRON MICROSCOPE OBSERVATION IS 11 TO 35 NM. THE POLISHING COMPOSITION FOR A HARD DISK SUBSTRATE CAN PREFERABLY REDUCE THE EMBEDDING OF ALUMINA ABRASIVE GRAINS INTO THE SUBSTRATE WITHOUT IMPAIRING THE PRODUCTIVITY. (FIGURE 1)
MYPI20084288 2007-10-29 2008-10-28 Polishing composition for hard disk substrate MY151756A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007280862 2007-10-29
JP2007337482 2007-12-27
JP2007341301A JP2009163810A (en) 2007-12-28 2007-12-28 Method of manufacturing hard disk substrate
JP2008143257A JP4981750B2 (en) 2007-10-29 2008-05-30 Polishing liquid composition for hard disk substrate

Publications (1)

Publication Number Publication Date
MY151756A true MY151756A (en) 2014-06-30

Family

ID=44863755

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20084288 MY151756A (en) 2007-10-29 2008-10-28 Polishing composition for hard disk substrate

Country Status (3)

Country Link
CN (1) CN101423746B (en)
MY (1) MY151756A (en)
TW (1) TWI456033B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102127371B (en) * 2010-12-16 2015-06-10 苏州天科合达蓝光半导体有限公司 Preparation method and use method of polishing solution for silicon carbide
JP5979872B2 (en) * 2011-01-31 2016-08-31 花王株式会社 Manufacturing method of magnetic disk substrate
TWI453273B (en) * 2011-11-07 2014-09-21 Uwiz Technology Co Ltd Slurry composition and use thereof
JP6015259B2 (en) * 2012-09-06 2016-10-26 旭硝子株式会社 Manufacturing method of glass substrate for information recording medium and manufacturing method of magnetic disk
CN103571333B (en) * 2013-08-20 2015-06-17 曾锡强 CMP (Chemical-Mechanical Polishing) polishing liquid with mixed grinding materials for alkaline sapphire substrate and preparation method thereof
US20190153262A1 (en) * 2017-11-20 2019-05-23 Cabot Microelectronics Corporation Composition and method for polishing memory hard disks exhibiting reduced surface scratching
CN109590820B (en) * 2019-01-02 2021-07-06 中国科学院上海光学精密机械研究所 Method for processing surface roughness of superhard laser crystal
JP7431038B2 (en) * 2019-12-27 2024-02-14 ニッタ・デュポン株式会社 polishing slurry

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY144587A (en) * 2001-06-21 2011-10-14 Kao Corp Polishing composition
JP2003297777A (en) * 2002-03-29 2003-10-17 Speedfam Co Ltd Composition for polishing, method for modifying the same and method for polishing the same
US20050139119A1 (en) * 2003-12-24 2005-06-30 Rader W. S. Polishing composition

Also Published As

Publication number Publication date
CN101423746B (en) 2014-03-19
CN101423746A (en) 2009-05-06
TWI456033B (en) 2014-10-11
TW200927903A (en) 2009-07-01

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