MY151756A - Polishing composition for hard disk substrate - Google Patents
Polishing composition for hard disk substrateInfo
- Publication number
- MY151756A MY151756A MYPI20084288A MY151756A MY 151756 A MY151756 A MY 151756A MY PI20084288 A MYPI20084288 A MY PI20084288A MY 151756 A MY151756 A MY 151756A
- Authority
- MY
- Malaysia
- Prior art keywords
- particles
- hard disk
- polishing composition
- disk substrate
- electron microscope
- Prior art date
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
A POLISHING COMPOSITION FOR A HARD DISK SUBSTRATE INCLUDES ALUMINA PARTICLES, SILICA PARTICLES, AND WATER. THE VOLUME MEDIAN DIAMETER OF SECONDARY PARTICLES OF THE ALUMINA PARTICLES MEASURED BY A LASER BEAM DIFFRACTION METHOD IS 0.1 TO 0.8 µM. THE VOLUME MEDIAN DIAMETER OF PRIMARY PARTICLES OF THE SILICA PARTICLES MEASURED BY TRANSMISSION ELECTRON MICROSCOPE PARTICLES OF THE SILICA PARTICLES MEASURED BY TRANSMISSION ELECTRON MICROSCOPE OBSERVATION IS 40 TO 150 NM. THE STANDARD DEVIATION IN NUMBER BASIS PARTICLE SIZE OF THE PRIMARY PARTICLES OF THE SILICA PARTICLES MEASURED BY THE TRANSMISSION ELECTRON MICROSCOPE OBSERVATION IS 11 TO 35 NM. THE POLISHING COMPOSITION FOR A HARD DISK SUBSTRATE CAN PREFERABLY REDUCE THE EMBEDDING OF ALUMINA ABRASIVE GRAINS INTO THE SUBSTRATE WITHOUT IMPAIRING THE PRODUCTIVITY. (FIGURE 1)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007280862 | 2007-10-29 | ||
JP2007337482 | 2007-12-27 | ||
JP2007341301A JP2009163810A (en) | 2007-12-28 | 2007-12-28 | Method of manufacturing hard disk substrate |
JP2008143257A JP4981750B2 (en) | 2007-10-29 | 2008-05-30 | Polishing liquid composition for hard disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY151756A true MY151756A (en) | 2014-06-30 |
Family
ID=44863755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20084288 MY151756A (en) | 2007-10-29 | 2008-10-28 | Polishing composition for hard disk substrate |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN101423746B (en) |
MY (1) | MY151756A (en) |
TW (1) | TWI456033B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102127371B (en) * | 2010-12-16 | 2015-06-10 | 苏州天科合达蓝光半导体有限公司 | Preparation method and use method of polishing solution for silicon carbide |
JP5979872B2 (en) * | 2011-01-31 | 2016-08-31 | 花王株式会社 | Manufacturing method of magnetic disk substrate |
TWI453273B (en) * | 2011-11-07 | 2014-09-21 | Uwiz Technology Co Ltd | Slurry composition and use thereof |
JP6015259B2 (en) * | 2012-09-06 | 2016-10-26 | 旭硝子株式会社 | Manufacturing method of glass substrate for information recording medium and manufacturing method of magnetic disk |
CN103571333B (en) * | 2013-08-20 | 2015-06-17 | 曾锡强 | CMP (Chemical-Mechanical Polishing) polishing liquid with mixed grinding materials for alkaline sapphire substrate and preparation method thereof |
US20190153262A1 (en) * | 2017-11-20 | 2019-05-23 | Cabot Microelectronics Corporation | Composition and method for polishing memory hard disks exhibiting reduced surface scratching |
CN109590820B (en) * | 2019-01-02 | 2021-07-06 | 中国科学院上海光学精密机械研究所 | Method for processing surface roughness of superhard laser crystal |
JP7431038B2 (en) * | 2019-12-27 | 2024-02-14 | ニッタ・デュポン株式会社 | polishing slurry |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MY144587A (en) * | 2001-06-21 | 2011-10-14 | Kao Corp | Polishing composition |
JP2003297777A (en) * | 2002-03-29 | 2003-10-17 | Speedfam Co Ltd | Composition for polishing, method for modifying the same and method for polishing the same |
US20050139119A1 (en) * | 2003-12-24 | 2005-06-30 | Rader W. S. | Polishing composition |
-
2008
- 2008-10-28 MY MYPI20084288 patent/MY151756A/en unknown
- 2008-10-29 CN CN200810173817.3A patent/CN101423746B/en not_active Expired - Fee Related
- 2008-10-29 TW TW097141659A patent/TWI456033B/en active
Also Published As
Publication number | Publication date |
---|---|
CN101423746B (en) | 2014-03-19 |
CN101423746A (en) | 2009-05-06 |
TWI456033B (en) | 2014-10-11 |
TW200927903A (en) | 2009-07-01 |
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