SG11201811602QA - Extreme ultraviolet mask blank with alloy absorber and method of manufacture - Google Patents
Extreme ultraviolet mask blank with alloy absorber and method of manufactureInfo
- Publication number
- SG11201811602QA SG11201811602QA SG11201811602QA SG11201811602QA SG11201811602QA SG 11201811602Q A SG11201811602Q A SG 11201811602QA SG 11201811602Q A SG11201811602Q A SG 11201811602QA SG 11201811602Q A SG11201811602Q A SG 11201811602QA SG 11201811602Q A SG11201811602Q A SG 11201811602QA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- go3f
- absorber
- manufacture
- extreme ultraviolet
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 239000000956 alloy Substances 0.000 title abstract 3
- 229910045601 alloy Inorganic materials 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 3
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- ZQICGTYUOSVFMN-UHFFFAOYSA-N Iselin Natural products CC1=C(COc2c3ccoc3cc3oc(=O)ccc23)CC(C)(C)CC1 ZQICGTYUOSVFMN-UHFFFAOYSA-N 0.000 abstract 1
- 230000008520 organization Effects 0.000 abstract 1
- 239000002023 wood Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/52—Reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
- Printing Plates And Materials Therefor (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662367390P | 2016-07-27 | 2016-07-27 | |
| US15/652,501 US10877368B2 (en) | 2016-07-27 | 2017-07-18 | Extreme ultraviolet mask blank with alloy absorber and method of manufacture |
| PCT/US2017/042748 WO2018022372A1 (en) | 2016-07-27 | 2017-07-19 | Extreme ultraviolet mask blank with alloy absorber and method of manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201811602QA true SG11201811602QA (en) | 2019-02-27 |
Family
ID=61012029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201811602QA SG11201811602QA (en) | 2016-07-27 | 2017-07-19 | Extreme ultraviolet mask blank with alloy absorber and method of manufacture |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US10877368B2 (ja) |
| JP (2) | JP2019527382A (ja) |
| SG (1) | SG11201811602QA (ja) |
| TW (2) | TWI763686B (ja) |
| WO (1) | WO2018022372A1 (ja) |
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| TWI811037B (zh) | 2016-07-27 | 2023-08-01 | 美商應用材料股份有限公司 | 具多層吸收劑的極紫外遮罩坯料及製造方法 |
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| US10996553B2 (en) | 2017-11-14 | 2021-05-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same |
| KR102506466B1 (ko) | 2018-06-22 | 2023-03-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 금속 막들의 촉매화된 증착 |
| TW202008073A (zh) * | 2018-07-19 | 2020-02-16 | 美商應用材料股份有限公司 | 極紫外光遮罩吸收劑材料 |
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| TWI835896B (zh) * | 2018-10-26 | 2024-03-21 | 美商應用材料股份有限公司 | 具有後側塗層的極紫外線掩模 |
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| TW202035792A (zh) | 2019-01-31 | 2020-10-01 | 美商應用材料股份有限公司 | 極紫外光遮罩吸收體材料 |
| US11249390B2 (en) | 2019-01-31 | 2022-02-15 | Applied Materials, Inc. | Extreme ultraviolet mask absorber materials |
| TWI828843B (zh) | 2019-01-31 | 2024-01-11 | 美商應用材料股份有限公司 | 極紫外線（ｅｕｖ）遮罩素材及其製造方法 |
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| TW202104666A (zh) * | 2019-05-22 | 2021-02-01 | 美商應用材料股份有限公司 | 極紫外光遮罩吸收劑材料 |
| TW202104668A (zh) * | 2019-05-22 | 2021-02-01 | 美商應用材料股份有限公司 | 極紫外光遮罩吸收劑材料 |
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| TWI836072B (zh) | 2019-05-22 | 2024-03-21 | 美商應用材料股份有限公司 | 具有嵌入吸收層之極紫外光遮罩 |
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| TW202131087A (zh) | 2020-01-27 | 2021-08-16 | 美商應用材料股份有限公司 | 極紫外光遮罩吸收劑材料 |
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-
2017
- 2017-07-11 TW TW106123154A patent/TWI763686B/zh active
- 2017-07-11 TW TW111114004A patent/TWI821984B/zh active
- 2017-07-18 US US15/652,501 patent/US10877368B2/en active Active
- 2017-07-19 JP JP2019503652A patent/JP2019527382A/ja active Pending
- 2017-07-19 WO PCT/US2017/042748 patent/WO2018022372A1/en active Application Filing
- 2017-07-19 SG SG11201811602QA patent/SG11201811602QA/en unknown
-
2020
- 2020-12-24 US US17/133,760 patent/US20210124256A1/en not_active Abandoned
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2022
- 2022-02-10 US US17/668,901 patent/US20220163882A1/en active Pending
- 2022-12-28 JP JP2022211287A patent/JP2023052147A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TWI763686B (zh) | 2022-05-11 |
| JP2023052147A (ja) | 2023-04-11 |
| TW201830122A (zh) | 2018-08-16 |
| JP2019527382A (ja) | 2019-09-26 |
| US10877368B2 (en) | 2020-12-29 |
| US20210124256A1 (en) | 2021-04-29 |
| TWI821984B (zh) | 2023-11-11 |
| TW202232225A (zh) | 2022-08-16 |
| US20220163882A1 (en) | 2022-05-26 |
| US20180031965A1 (en) | 2018-02-01 |
| WO2018022372A1 (en) | 2018-02-01 |
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