SG11201808803QA - Foup measurement chamber - Google Patents
Foup measurement chamberInfo
- Publication number
- SG11201808803QA SG11201808803QA SG11201808803QA SG11201808803QA SG11201808803QA SG 11201808803Q A SG11201808803Q A SG 11201808803QA SG 11201808803Q A SG11201808803Q A SG 11201808803QA SG 11201808803Q A SG11201808803Q A SG 11201808803QA SG 11201808803Q A SG11201808803Q A SG 11201808803QA
- Authority
- SG
- Singapore
- Prior art keywords
- foup
- sensor
- gas
- nest
- flowmeter
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 238000007599 discharging Methods 0.000 abstract 1
- 238000011010 flushing procedure Methods 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000010926 purge Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102016205597.6A DE102016205597B4 (de) | 2016-04-05 | 2016-04-05 | Purge-Messsystem für FOUPs |
| PCT/EP2017/057917 WO2017174540A1 (fr) | 2016-04-05 | 2017-04-04 | Chambre de mesure d'enceinte foup |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201808803QA true SG11201808803QA (en) | 2018-11-29 |
Family
ID=58530523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201808803QA SG11201808803QA (en) | 2016-04-05 | 2017-04-04 | Foup measurement chamber |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10847396B2 (fr) |
| DE (1) | DE102016205597B4 (fr) |
| SG (1) | SG11201808803QA (fr) |
| WO (1) | WO2017174540A1 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102130872B1 (ko) * | 2016-04-27 | 2020-07-06 | 주식회사 엘지화학 | 고체 시료의 수분 측정 장치, 고체 시료 수분 함량 측정 방법 및 이미드화율 분석 방법 |
| US10861692B2 (en) * | 2017-10-26 | 2020-12-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Substrate carrier deterioration detection and repair |
| US11031265B2 (en) | 2018-11-28 | 2021-06-08 | Brooks Automation, Inc. | Load port module |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5879458A (en) * | 1996-09-13 | 1999-03-09 | Semifab Incorporated | Molecular contamination control system |
| JPH11168135A (ja) * | 1997-12-03 | 1999-06-22 | Toshiba Corp | 基板保管装置および基板保管方法 |
| JP2000353738A (ja) * | 1999-06-11 | 2000-12-19 | Sony Corp | 密閉コンテナ、保管装置および電子部品搬送システム、ならびに電子部品の保管および搬送方法 |
| JP4235076B2 (ja) | 2003-10-08 | 2009-03-04 | 東京エレクトロン株式会社 | 半導体製造装置および半導体製造方法 |
| CN100468616C (zh) * | 2004-02-05 | 2009-03-11 | 安格斯公司 | 晶圆传送容器的净化 |
| JP3983254B2 (ja) * | 2005-06-24 | 2007-09-26 | Ｔｄｋ株式会社 | 製品収容容器用パージシステム及び該パージシステムに供せられる台 |
| WO2007107983A2 (fr) | 2006-03-17 | 2007-09-27 | Shlomo Shmuelov | Système de stockage et de purge pour tranches semi-conductrices |
| KR101474572B1 (ko) * | 2006-06-19 | 2014-12-18 | 엔테그리스, 아이엔씨. | 레티클 스토리지 정화시스템 |
| IL180875A0 (en) | 2007-01-22 | 2007-07-04 | Ricor Ltd | Gas purge method and apparatus |
| US9212786B2 (en) * | 2009-06-30 | 2015-12-15 | Roylan Developments Limited | Apparatus for purging containers for storing sensitive materials |
| JP5598728B2 (ja) * | 2011-12-22 | 2014-10-01 | 株式会社ダイフク | 不活性ガス注入装置 |
| JP6087161B2 (ja) * | 2012-02-03 | 2017-03-01 | 東京エレクトロン株式会社 | 基板収容容器のパージ方法 |
| KR101418812B1 (ko) * | 2012-10-31 | 2014-07-16 | 크린팩토메이션 주식회사 | 웨이퍼 퍼지 가능한 천장 보관 장치 |
| JP6047228B2 (ja) * | 2013-03-15 | 2016-12-21 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法およびプログラム |
| US9257320B2 (en) | 2013-06-05 | 2016-02-09 | GlobalFoundries, Inc. | Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication |
| DE102013222900B4 (de) | 2013-11-11 | 2017-04-06 | Fabmatics Gmbh | Flexibles Purge-Management System |
| WO2015087310A1 (fr) * | 2013-12-13 | 2015-06-18 | Brooks Ccs Gmbh | Systèmes et procédés de purge de contenants de substrats par recirculation |
| CN105940487B (zh) * | 2014-02-07 | 2018-12-04 | 村田机械株式会社 | 净化装置以及净化方法 |
| WO2015166710A1 (fr) * | 2014-04-28 | 2015-11-05 | 村田機械株式会社 | Dispositif de purge et procédé de purge |
| JP6492884B2 (ja) * | 2015-03-31 | 2019-04-03 | Tdk株式会社 | ロードポート装置 |
| US10586721B2 (en) * | 2015-08-25 | 2020-03-10 | Murata Machinery, Ltd. | Purge device, purge stocker, and purge method |
| KR20180032624A (ko) * | 2015-08-28 | 2018-03-30 | 무라다기카이가부시끼가이샤 | 보관 장치 및 보관 방법 |
| JP6414525B2 (ja) * | 2015-09-02 | 2018-10-31 | 株式会社ダイフク | 保管設備 |
| TWI567856B (zh) * | 2015-09-08 | 2017-01-21 | 古震維 | 具有吹淨功能的晶圓傳送裝置 |
| JP6632403B2 (ja) * | 2016-02-02 | 2020-01-22 | 東京エレクトロン株式会社 | 基板収納容器の連結機構および連結方法 |
| KR101852323B1 (ko) * | 2016-07-05 | 2018-04-26 | 로체 시스템즈(주) | 퍼지 모듈 지그 및 이를 포함한 퍼지 모듈 |
| JP6817757B2 (ja) * | 2016-09-16 | 2021-01-20 | 東京エレクトロン株式会社 | 基板処理装置及び基板移送方法 |
| KR102423761B1 (ko) * | 2017-06-23 | 2022-07-20 | 어플라이드 머티어리얼스, 인코포레이티드 | 인덱서블 측면 저장 포드 장치, 가열식 측면 저장 포드 장치, 시스템들, 및 방법들 |
| TWI635559B (zh) * | 2017-07-25 | 2018-09-11 | 春田科技顧問股份有限公司 | 裝載埠的吹淨裝置及其吹淨方法 |
-
2016
- 2016-04-05 DE DE102016205597.6A patent/DE102016205597B4/de active Active
-
2017
- 2017-04-04 SG SG11201808803QA patent/SG11201808803QA/en unknown
- 2017-04-04 US US16/091,532 patent/US10847396B2/en active Active
- 2017-04-04 WO PCT/EP2017/057917 patent/WO2017174540A1/fr active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| DE102016205597A1 (de) | 2017-10-05 |
| US10847396B2 (en) | 2020-11-24 |
| US20190131155A1 (en) | 2019-05-02 |
| DE102016205597B4 (de) | 2022-06-23 |
| WO2017174540A1 (fr) | 2017-10-12 |
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