SG11201806330UA - Positive type photosensitive siloxane composition - Google Patents
Positive type photosensitive siloxane compositionInfo
- Publication number
- SG11201806330UA SG11201806330UA SG11201806330UA SG11201806330UA SG11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- chihama
- kakegawa
- shizuoka
- shi
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/07—Aldehydes; Ketones
- C08K5/08—Quinones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Silicon Polymers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 31 August 2017 (31.08.2017) WIPO I PCT (10) International Publication Number WO 2017/144148 Al 111111111111110111011111111111010111110111010111111111101011111110111111111110111111 (51) International Patent Classification: G03F 7/004 (2006.01) GO3F 7/075 (2006.01) G03F 7/023 (2006.01) (21) International Application Number: PCT/EP2017/000070 (22) International Filing Date: 20 January 2017 (20.01.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2016-032209 23 February 2016 (23.02.2016) JP (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- EMBOURG) 5.A R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (72) Inventors: MISUMI, Motoki; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa- shi, Shizuoka 437-1412 (JP). YOKOYAMA, Daishi; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). TAKA- HASHI, Megumi; c/o Merck Performance Materials Man- ufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). NONAKA, Tshiaki; c/o Merck Perform- ance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). (74) Agent: B2B PATENTS; c/o Merck Patent GmbH, 64271 Darmstadt (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) W O 20 17 / 144148 Al (54) Title: POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION (57) : To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability.The present invention provides a positive type photosensitive siloxane compos - ition comprising : a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-gen- erator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016032209A JP2017151209A (en) | 2016-02-23 | 2016-02-23 | Positive photosensitive siloxane composition |
PCT/EP2017/000070 WO2017144148A1 (en) | 2016-02-23 | 2017-01-20 | Positive type photosensitive siloxane composition |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201806330UA true SG11201806330UA (en) | 2018-09-27 |
Family
ID=58009774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201806330UA SG11201806330UA (en) | 2016-02-23 | 2017-01-20 | Positive type photosensitive siloxane composition |
Country Status (7)
Country | Link |
---|---|
US (1) | US10409161B2 (en) |
JP (2) | JP2017151209A (en) |
KR (1) | KR101999099B1 (en) |
CN (1) | CN108700807B (en) |
SG (1) | SG11201806330UA (en) |
TW (1) | TWI720135B (en) |
WO (1) | WO2017144148A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018189738A (en) | 2017-04-28 | 2018-11-29 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Positive type photosensitive siloxane composition and cured film formed by using the same |
JP2018189732A (en) | 2017-04-28 | 2018-11-29 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Positive type photosensitive siloxane composition and cured film formed by using the same |
JP2019061166A (en) * | 2017-09-27 | 2019-04-18 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Positive photosensitive siloxane composition and cured film containing the same |
JP2019095695A (en) * | 2017-11-27 | 2019-06-20 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same |
JP2022523249A (en) | 2019-03-08 | 2022-04-21 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | Crosslinkable siloxane compound for the preparation of dielectric materials |
JP6639724B1 (en) * | 2019-03-15 | 2020-02-05 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Positive photosensitive polysiloxane composition |
TW202125098A (en) | 2019-10-10 | 2021-07-01 | 德商馬克專利公司 | Positive tone photoresist formulation using crosslinkable siloxane compounds |
KR102316038B1 (en) | 2020-09-29 | 2021-10-22 | 김준영 | Mask |
JP7397419B1 (en) * | 2023-06-02 | 2023-12-13 | Jsr株式会社 | Radiation sensitive composition, cured film and method for producing the same, semiconductor element and display element |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2961722B2 (en) | 1991-12-11 | 1999-10-12 | ジェイエスアール株式会社 | Radiation-sensitive resin composition |
JP2933879B2 (en) | 1995-08-11 | 1999-08-16 | シャープ株式会社 | Transmissive liquid crystal display device and method of manufacturing the same |
JP3783512B2 (en) | 2000-02-29 | 2006-06-07 | Jsr株式会社 | Radiation-sensitive resin composition and interlayer insulating film formed therefrom |
WO2009123122A1 (en) * | 2008-03-31 | 2009-10-08 | 大日本印刷株式会社 | Base-generating agent, photosensitive resin composition, pattern-forming material comprising the photosensitive resin composition, pattern formation method using the photosensitive resin composition, and article |
WO2010113813A1 (en) * | 2009-03-31 | 2010-10-07 | 大日本印刷株式会社 | Base-generating agent, photosensitive resin composition, patterning material comprising the photosensitive resin composition, patterning method and article using the photosensitive resin composition |
JP2011052214A (en) * | 2009-08-07 | 2011-03-17 | Dainippon Printing Co Ltd | Base generator, photosensitive resin composition, material for forming pattern including the photosensitive resin composition, and method for forming pattern, and article using the photosensitive resin composition |
CN102575140A (en) * | 2009-09-30 | 2012-07-11 | 大日本印刷株式会社 | Base-generating agent, photosensitive resin composition, material for pattern-forming comprising said photosensitive resin composition, pattern-forming method using said photosensitive resin composition, and article |
US20120237873A1 (en) * | 2009-12-20 | 2012-09-20 | Toray Industries Inc. | Positive photosensitive resin composition, cured film formed from the same, and device having cured film |
JP5776301B2 (en) | 2011-04-20 | 2015-09-09 | Jsr株式会社 | Polysiloxane composition and pattern forming method |
JP5707407B2 (en) * | 2010-08-24 | 2015-04-30 | メルクパフォーマンスマテリアルズIp合同会社 | Positive photosensitive siloxane composition |
JP5994235B2 (en) * | 2010-11-10 | 2016-09-21 | 大日本印刷株式会社 | Photobase generator, photosensitive polyimide resin composition, method for producing relief pattern, and article |
JP5617564B2 (en) | 2010-11-26 | 2014-11-05 | 和光純薬工業株式会社 | Photosensitive resin composition |
JP5726632B2 (en) | 2011-05-19 | 2015-06-03 | メルクパフォーマンスマテリアルズIp合同会社 | Photosensitive siloxane resin composition |
US8993214B2 (en) | 2011-05-20 | 2015-03-31 | Az Electronic Materials Usa Corp. | Positive photosensitive siloxane composition |
JP5867006B2 (en) | 2011-11-22 | 2016-02-24 | Jsr株式会社 | Positive radiation sensitive composition, cured film for display element, method for forming cured film for display element, and display element |
JP5803635B2 (en) | 2011-12-07 | 2015-11-04 | Jsr株式会社 | Positive radiation-sensitive composition, cured film, and method for forming cured film |
EP2799928B1 (en) * | 2011-12-26 | 2019-05-22 | Toray Industries, Inc. | Photosensitive resin composition and process for producing semiconductor element |
JP6013150B2 (en) | 2012-11-22 | 2016-10-25 | メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 | Method for producing positive photosensitive siloxane composition |
JP2014198403A (en) * | 2013-03-29 | 2014-10-23 | 大日本印刷株式会社 | Method for producing fiber-reinforced resin molding, fiber-reinforced resin molding material, and curable resin composition for fiber-reinforced resin molding material |
JP6195623B2 (en) * | 2013-09-25 | 2017-09-13 | 東京応化工業株式会社 | Radiation-sensitive composition and pattern manufacturing method |
TWI521308B (en) * | 2014-03-28 | 2016-02-11 | 奇美實業股份有限公司 | Photosensitive polysiloxane composition and uses thereof |
-
2016
- 2016-02-23 JP JP2016032209A patent/JP2017151209A/en active Pending
-
2017
- 2017-01-20 KR KR1020187027776A patent/KR101999099B1/en active IP Right Grant
- 2017-01-20 JP JP2018534866A patent/JP6487126B2/en active Active
- 2017-01-20 SG SG11201806330UA patent/SG11201806330UA/en unknown
- 2017-01-20 CN CN201780012825.7A patent/CN108700807B/en active Active
- 2017-01-20 WO PCT/EP2017/000070 patent/WO2017144148A1/en active Application Filing
- 2017-01-20 US US16/078,767 patent/US10409161B2/en active Active
- 2017-02-22 TW TW106105824A patent/TWI720135B/en active
Also Published As
Publication number | Publication date |
---|---|
TW201804254A (en) | 2018-02-01 |
KR101999099B1 (en) | 2019-07-11 |
KR20180112070A (en) | 2018-10-11 |
JP6487126B2 (en) | 2019-03-20 |
CN108700807A (en) | 2018-10-23 |
JP2019504359A (en) | 2019-02-14 |
WO2017144148A1 (en) | 2017-08-31 |
US20190064660A1 (en) | 2019-02-28 |
JP2017151209A (en) | 2017-08-31 |
TWI720135B (en) | 2021-03-01 |
CN108700807B (en) | 2020-04-10 |
US10409161B2 (en) | 2019-09-10 |
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