SG11201806330UA - Positive type photosensitive siloxane composition - Google Patents

Positive type photosensitive siloxane composition

Info

Publication number
SG11201806330UA
SG11201806330UA SG11201806330UA SG11201806330UA SG11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA SG 11201806330U A SG11201806330U A SG 11201806330UA
Authority
SG
Singapore
Prior art keywords
international
chihama
kakegawa
shizuoka
shi
Prior art date
Application number
SG11201806330UA
Inventor
Motoki Misumi
Daishi Yokoyama
Megumi Takahashi
Toshiaki Nonaka
Original Assignee
Az Electronic Mat Luxembourg Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Mat Luxembourg Sarl filed Critical Az Electronic Mat Luxembourg Sarl
Publication of SG11201806330UA publication Critical patent/SG11201806330UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C08K5/08—Quinones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 31 August 2017 (31.08.2017) WIPO I PCT (10) International Publication Number WO 2017/144148 Al 111111111111110111011111111111010111110111010111111111101011111110111111111110111111 (51) International Patent Classification: G03F 7/004 (2006.01) GO3F 7/075 (2006.01) G03F 7/023 (2006.01) (21) International Application Number: PCT/EP2017/000070 (22) International Filing Date: 20 January 2017 (20.01.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2016-032209 23 February 2016 (23.02.2016) JP (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- EMBOURG) 5.A R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (72) Inventors: MISUMI, Motoki; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa- shi, Shizuoka 437-1412 (JP). YOKOYAMA, Daishi; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). TAKA- HASHI, Megumi; c/o Merck Performance Materials Man- ufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). NONAKA, Tshiaki; c/o Merck Perform- ance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). (74) Agent: B2B PATENTS; c/o Merck Patent GmbH, 64271 Darmstadt (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) W O 20 17 / 144148 Al (54) Title: POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION (57) : To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability.The present invention provides a positive type photosensitive siloxane compos - ition comprising : a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-gen- erator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
SG11201806330UA 2016-02-23 2017-01-20 Positive type photosensitive siloxane composition SG11201806330UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016032209A JP2017151209A (en) 2016-02-23 2016-02-23 Positive photosensitive siloxane composition
PCT/EP2017/000070 WO2017144148A1 (en) 2016-02-23 2017-01-20 Positive type photosensitive siloxane composition

Publications (1)

Publication Number Publication Date
SG11201806330UA true SG11201806330UA (en) 2018-09-27

Family

ID=58009774

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201806330UA SG11201806330UA (en) 2016-02-23 2017-01-20 Positive type photosensitive siloxane composition

Country Status (7)

Country Link
US (1) US10409161B2 (en)
JP (2) JP2017151209A (en)
KR (1) KR101999099B1 (en)
CN (1) CN108700807B (en)
SG (1) SG11201806330UA (en)
TW (1) TWI720135B (en)
WO (1) WO2017144148A1 (en)

Families Citing this family (9)

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Publication number Priority date Publication date Assignee Title
JP2018189738A (en) 2017-04-28 2018-11-29 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Positive type photosensitive siloxane composition and cured film formed by using the same
JP2018189732A (en) 2017-04-28 2018-11-29 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Positive type photosensitive siloxane composition and cured film formed by using the same
JP2019061166A (en) * 2017-09-27 2019-04-18 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Positive photosensitive siloxane composition and cured film containing the same
JP2019095695A (en) * 2017-11-27 2019-06-20 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same
JP2022523249A (en) 2019-03-08 2022-04-21 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング Crosslinkable siloxane compound for the preparation of dielectric materials
JP6639724B1 (en) * 2019-03-15 2020-02-05 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Positive photosensitive polysiloxane composition
TW202125098A (en) 2019-10-10 2021-07-01 德商馬克專利公司 Positive tone photoresist formulation using crosslinkable siloxane compounds
KR102316038B1 (en) 2020-09-29 2021-10-22 김준영 Mask
JP7397419B1 (en) * 2023-06-02 2023-12-13 Jsr株式会社 Radiation sensitive composition, cured film and method for producing the same, semiconductor element and display element

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Also Published As

Publication number Publication date
TW201804254A (en) 2018-02-01
KR101999099B1 (en) 2019-07-11
KR20180112070A (en) 2018-10-11
JP6487126B2 (en) 2019-03-20
CN108700807A (en) 2018-10-23
JP2019504359A (en) 2019-02-14
WO2017144148A1 (en) 2017-08-31
US20190064660A1 (en) 2019-02-28
JP2017151209A (en) 2017-08-31
TWI720135B (en) 2021-03-01
CN108700807B (en) 2020-04-10
US10409161B2 (en) 2019-09-10

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