SG11201804781VA - Process for improving the critical dimension uniformity of ordered films of block copolymer - Google Patents
Process for improving the critical dimension uniformity of ordered films of block copolymerInfo
- Publication number
- SG11201804781VA SG11201804781VA SG11201804781VA SG11201804781VA SG11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA SG 11201804781V A SG11201804781V A SG 11201804781VA
- Authority
- SG
- Singapore
- Prior art keywords
- improving
- block copolymer
- critical dimension
- dimension uniformity
- ordered films
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1562779A FR3045643A1 (fr) | 2015-12-18 | 2015-12-18 | Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs |
PCT/EP2016/081386 WO2017103073A1 (fr) | 2015-12-18 | 2016-12-16 | Procédé permettant d'améliorer l'uniformité de dimensions critiques de films ordonnés d'un copolymère à blocs |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201804781VA true SG11201804781VA (en) | 2018-07-30 |
Family
ID=55451377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201804781VA SG11201804781VA (en) | 2015-12-18 | 2016-12-16 | Process for improving the critical dimension uniformity of ordered films of block copolymer |
Country Status (9)
Country | Link |
---|---|
US (1) | US20180371145A1 (fr) |
EP (1) | EP3391141A1 (fr) |
JP (1) | JP2019505614A (fr) |
KR (1) | KR20180096725A (fr) |
CN (1) | CN108369374A (fr) |
FR (1) | FR3045643A1 (fr) |
SG (1) | SG11201804781VA (fr) |
TW (1) | TW201734101A (fr) |
WO (1) | WO2017103073A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3045644A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8193285B2 (en) * | 2006-05-16 | 2012-06-05 | Nippon Soda Co., Ltd. | Block copolymers |
US8398868B2 (en) * | 2009-05-19 | 2013-03-19 | International Business Machines Corporation | Directed self-assembly of block copolymers using segmented prepatterns |
JP2010283928A (ja) * | 2009-06-02 | 2010-12-16 | Kuraray Co Ltd | 高分子トランスデューサ |
US8349203B2 (en) * | 2009-09-04 | 2013-01-08 | International Business Machines Corporation | Method of forming self-assembled patterns using block copolymers, and articles thereof |
US8304493B2 (en) * | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
JP6218241B2 (ja) * | 2011-07-29 | 2017-10-25 | ウィスコンシン・アルムナイ・リサーチ・ファウンデーションWisconsin Alumni Research Foundation | 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物 |
FR2983773B1 (fr) * | 2011-12-09 | 2014-10-24 | Arkema France | Procede de preparation de surfaces |
JP5894445B2 (ja) * | 2012-01-23 | 2016-03-30 | 東京エレクトロン株式会社 | エッチング方法及びエッチング装置 |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
US9005877B2 (en) * | 2012-05-15 | 2015-04-14 | Tokyo Electron Limited | Method of forming patterns using block copolymers and articles thereof |
US9012545B2 (en) * | 2012-08-31 | 2015-04-21 | Rohm And Haas Electronic Materials Llc | Composition and method for preparing pattern on a substrate |
WO2014070431A1 (fr) * | 2012-10-31 | 2014-05-08 | Dow Global Technologies Llc | Nanocomposites de copolymères et de matières diélectriques |
FR3008413B1 (fr) * | 2013-07-11 | 2015-08-07 | Arkema France | Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs |
FR3008986B1 (fr) * | 2013-07-25 | 2016-12-30 | Arkema France | Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs |
FR3014877B1 (fr) * | 2013-12-17 | 2017-03-31 | Arkema France | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
EP3095127B1 (fr) * | 2014-01-16 | 2020-05-20 | Brewer Science, Inc. | Copolymères à blocs à haut paramètre d'interaction de flory-huggins pour auto-assemblage guidé |
FR3022249B1 (fr) * | 2014-06-11 | 2018-01-19 | Arkema France | Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
FR3045644A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
-
2015
- 2015-12-18 FR FR1562779A patent/FR3045643A1/fr active Pending
-
2016
- 2016-12-16 TW TW105141869A patent/TW201734101A/zh unknown
- 2016-12-16 SG SG11201804781VA patent/SG11201804781VA/en unknown
- 2016-12-16 CN CN201680073958.0A patent/CN108369374A/zh active Pending
- 2016-12-16 EP EP16809860.6A patent/EP3391141A1/fr not_active Withdrawn
- 2016-12-16 WO PCT/EP2016/081386 patent/WO2017103073A1/fr active Application Filing
- 2016-12-16 US US16/062,460 patent/US20180371145A1/en not_active Abandoned
- 2016-12-16 KR KR1020187020749A patent/KR20180096725A/ko not_active Application Discontinuation
- 2016-12-16 JP JP2018530695A patent/JP2019505614A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN108369374A (zh) | 2018-08-03 |
FR3045643A1 (fr) | 2017-06-23 |
WO2017103073A1 (fr) | 2017-06-22 |
JP2019505614A (ja) | 2019-02-28 |
US20180371145A1 (en) | 2018-12-27 |
EP3391141A1 (fr) | 2018-10-24 |
TW201734101A (zh) | 2017-10-01 |
KR20180096725A (ko) | 2018-08-29 |
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