SG11201707265QA - Process for producing flexible organic-inorganic laminates - Google Patents

Process for producing flexible organic-inorganic laminates

Info

Publication number
SG11201707265QA
SG11201707265QA SG11201707265QA SG11201707265QA SG11201707265QA SG 11201707265Q A SG11201707265Q A SG 11201707265QA SG 11201707265Q A SG11201707265Q A SG 11201707265QA SG 11201707265Q A SG11201707265Q A SG 11201707265QA SG 11201707265Q A SG11201707265Q A SG 11201707265QA
Authority
SG
Singapore
Prior art keywords
flexible organic
producing flexible
inorganic laminates
laminates
inorganic
Prior art date
Application number
SG11201707265QA
Other languages
English (en)
Inventor
Maraike Ahlf
Juergen Frank
Torben Adermann
Stephan Klotz
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of SG11201707265QA publication Critical patent/SG11201707265QA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Film Transistor (AREA)
SG11201707265QA 2015-03-25 2016-03-15 Process for producing flexible organic-inorganic laminates SG11201707265QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP15160789 2015-03-25
PCT/EP2016/055534 WO2016150759A1 (en) 2015-03-25 2016-03-15 Process for producing flexible organic-inorganic laminates

Publications (1)

Publication Number Publication Date
SG11201707265QA true SG11201707265QA (en) 2017-10-30

Family

ID=52779530

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201707265QA SG11201707265QA (en) 2015-03-25 2016-03-15 Process for producing flexible organic-inorganic laminates

Country Status (12)

Country Link
US (1) US11286561B2 (zh)
EP (1) EP3274487A1 (zh)
JP (1) JP6986447B2 (zh)
KR (1) KR102596710B1 (zh)
CN (1) CN107429390A (zh)
BR (1) BR112017020245A2 (zh)
CA (1) CA2978031A1 (zh)
MX (1) MX2017012134A (zh)
RU (1) RU2721247C2 (zh)
SG (1) SG11201707265QA (zh)
TW (1) TWI782892B (zh)
WO (1) WO2016150759A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107208265B (zh) 2015-01-20 2021-03-23 巴斯夫涂料有限公司 生产挠性有机-无机层合物的方法
US20210269917A1 (en) 2018-07-05 2021-09-02 Basf Coatings Gmbh Transparent conductive film
WO2023018308A1 (ko) * 2021-08-12 2023-02-16 한양대학교 산학협력단 분자선 구조를 갖는 다층 분자막 포토레지스트 및 이의 제조방법

Family Cites Families (18)

* Cited by examiner, † Cited by third party
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DE69129055T2 (de) * 1990-10-03 1998-08-06 Dow Chemical Co Hydroxy-funktionalisierte Polyetheramine zur Verwendung als Sperrschicht bei sauerstoffempfindlichen Materialien
US6690044B1 (en) * 1993-03-19 2004-02-10 Micron Technology, Inc. Approach to avoid buckling BPSG by using an intermediate barrier layer
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
US6926572B2 (en) * 2002-01-25 2005-08-09 Electronics And Telecommunications Research Institute Flat panel display device and method of forming passivation film in the flat panel display device
JP2007090803A (ja) 2005-09-30 2007-04-12 Fujifilm Corp ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子
WO2008069894A2 (en) 2006-11-13 2008-06-12 The Regents Of The University Of Colorado, A Body Corporate Molecular layer deposition process for making organic or organic-inorganic polymers
JP5220106B2 (ja) * 2007-06-22 2013-06-26 ザ・リージエンツ・オブ・ザ・ユニバーシティ・オブ・コロラド 原子層堆積法及び分子層堆積法を用いて製造された有機電子デバイス用の保護被膜
US20090169904A1 (en) * 2007-12-27 2009-07-02 Makoto Yamada Barrier laminate, gas-barrier film, device and optical component
JP2009224190A (ja) * 2008-03-17 2009-10-01 Fujifilm Corp バリア性積層体とその製造方法、デバイスおよび光学部材
EP2300225A1 (en) * 2008-07-08 2011-03-30 DSM IP Assets B.V. A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
EP2360293A1 (en) 2010-02-11 2011-08-24 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and apparatus for depositing atomic layers on a substrate
KR101997941B1 (ko) * 2011-09-26 2019-07-08 니폰게이긴조쿠가부시키가이샤 알루미늄 수지 접합체 및 그 제조 방법
WO2013062486A1 (en) * 2011-10-24 2013-05-02 Tera-Barrier Films Pte Ltd Encapsulation barrier stack
KR20140045716A (ko) * 2012-10-09 2014-04-17 건국대학교 산학협력단 유무기 합금 필름의 제조방법 및 그로부터 제조된 유무기 합금 필름
RU2672962C2 (ru) * 2013-08-30 2018-11-21 Июкф-Хю (Индастри-Юниверсити-Кооперейшн Фаундейшн Ханян Юниверсити) Структура подложки и способ ее изготовления
KR102439664B1 (ko) 2014-06-12 2022-09-02 바스프 코팅스 게엠베하 가요성 유기물-무기물 라미네이트의 제조 방법
CN106460171B (zh) 2014-06-13 2020-10-16 巴斯夫涂料有限公司 生产有机-无机层合物的方法
CN107208265B (zh) 2015-01-20 2021-03-23 巴斯夫涂料有限公司 生产挠性有机-无机层合物的方法

Also Published As

Publication number Publication date
RU2721247C2 (ru) 2020-05-18
JP6986447B2 (ja) 2021-12-22
KR20170130415A (ko) 2017-11-28
KR102596710B1 (ko) 2023-11-01
MX2017012134A (es) 2018-02-09
TWI782892B (zh) 2022-11-11
WO2016150759A1 (en) 2016-09-29
JP2018513271A (ja) 2018-05-24
RU2017135503A3 (zh) 2019-09-05
BR112017020245A2 (pt) 2018-06-05
TW201700789A (zh) 2017-01-01
US11286561B2 (en) 2022-03-29
CA2978031A1 (en) 2016-09-29
CN107429390A (zh) 2017-12-01
US20180119279A1 (en) 2018-05-03
RU2017135503A (ru) 2019-04-26
EP3274487A1 (en) 2018-01-31

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