SG11201703869UA - Balanced barrier discharge neutralization in variable pressure environments - Google Patents
Balanced barrier discharge neutralization in variable pressure environmentsInfo
- Publication number
- SG11201703869UA SG11201703869UA SG11201703869UA SG11201703869UA SG11201703869UA SG 11201703869U A SG11201703869U A SG 11201703869UA SG 11201703869U A SG11201703869U A SG 11201703869UA SG 11201703869U A SG11201703869U A SG 11201703869UA SG 11201703869U A SG11201703869U A SG 11201703869UA
- Authority
- SG
- Singapore
- Prior art keywords
- variable pressure
- barrier discharge
- pressure environments
- discharge neutralization
- balanced barrier
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
- H05F1/00—Preventing the formation of electrostatic charges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T23/00—Apparatus for generating ions to be introduced into non-enclosed gases, e.g. into the atmosphere
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
- H05F3/00—Carrying-off electrostatic charges
- H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Fluid Mechanics (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Elimination Of Static Electricity (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/536,983 US9084334B1 (en) | 2014-11-10 | 2014-11-10 | Balanced barrier discharge neutralization in variable pressure environments |
| PCT/US2015/055183 WO2016076998A1 (en) | 2014-11-10 | 2015-10-13 | Balanced barrier discharge neutralization in variable pressure environments |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201703869UA true SG11201703869UA (en) | 2017-06-29 |
Family
ID=53506913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201703869UA SG11201703869UA (en) | 2014-11-10 | 2015-10-13 | Balanced barrier discharge neutralization in variable pressure environments |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US9084334B1 (zh) |
| EP (1) | EP3219176B1 (zh) |
| JP (1) | JP6659687B2 (zh) |
| KR (1) | KR102509754B1 (zh) |
| CN (1) | CN107430975B (zh) |
| SG (1) | SG11201703869UA (zh) |
| TW (1) | TWI655881B (zh) |
| WO (1) | WO2016076998A1 (zh) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6088247B2 (ja) * | 2011-06-03 | 2017-03-01 | 株式会社和廣武 | Ｃｖｄ装置、及び、ｃｖｄ膜の製造方法 |
| US10020800B2 (en) | 2013-11-14 | 2018-07-10 | Eagle Harbor Technologies, Inc. | High voltage nanosecond pulser with variable pulse width and pulse repetition frequency |
| US10978955B2 (en) | 2014-02-28 | 2021-04-13 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
| US11171568B2 (en) | 2017-02-07 | 2021-11-09 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
| CN109873621B (zh) | 2013-11-14 | 2023-06-16 | 鹰港科技有限公司 | 高压纳秒脉冲发生器 |
| US11539352B2 (en) | 2013-11-14 | 2022-12-27 | Eagle Harbor Technologies, Inc. | Transformer resonant converter |
| US10483089B2 (en) | 2014-02-28 | 2019-11-19 | Eagle Harbor Technologies, Inc. | High voltage resistive output stage circuit |
| US10969370B2 (en) * | 2015-06-05 | 2021-04-06 | Semilab Semiconductor Physics Laboratory Co., Ltd. | Measuring semiconductor doping using constant surface potential corona charging |
| US10304661B2 (en) | 2017-08-25 | 2019-05-28 | Eagle Harbor Technologies, Inc. | Arbitarary waveform generation using nanosecond pulses |
| JP6865417B2 (ja) * | 2016-09-23 | 2021-04-28 | 国立大学法人茨城大学 | 除電装置 |
| US11302518B2 (en) | 2018-07-27 | 2022-04-12 | Eagle Harbor Technologies, Inc. | Efficient energy recovery in a nanosecond pulser circuit |
| US11222767B2 (en) | 2018-07-27 | 2022-01-11 | Eagle Harbor Technologies, Inc. | Nanosecond pulser bias compensation |
| JP6579635B1 (ja) * | 2018-09-12 | 2019-09-25 | 春日電機株式会社 | 除電装置及びプラズマ発生装置 |
| US11246955B2 (en) * | 2018-10-29 | 2022-02-15 | Phoenixaire, Llc | Method and system for generating non-thermal plasma |
| KR20210111841A (ko) | 2019-01-08 | 2021-09-13 | 이글 하버 테크놀로지스, 인코포레이티드 | 나노초 펄서 회로의 효율적 에너지 회수 |
| IT201900016091A1 (it) * | 2019-09-11 | 2021-03-11 | Ima Spa | Apparato e metodo per neutralizzare elettricità statica presente sulla superficie di contenitori e/o vassoi portacontenitori. |
| JP7471584B2 (ja) * | 2019-12-09 | 2024-04-22 | シシド静電気株式会社 | 荷電粒子照射装置、システム、方法及びプログラム |
| JP7471583B2 (ja) * | 2019-12-09 | 2024-04-22 | シシド静電気株式会社 | 荷電粒子照射装置、システム、方法及びプログラム |
| JP7417262B2 (ja) * | 2020-05-11 | 2024-01-18 | 株式会社イー・エム・ディー | プラズマ生成装置 |
| US11569641B2 (en) | 2020-11-16 | 2023-01-31 | Nrd Llc | Ionizer bar |
| CN113009495B (zh) * | 2021-02-24 | 2022-07-22 | 国网山东省电力公司济南市历城区供电公司 | 一种带电工件尺寸远程精准测量装置及方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5946797A (ja) * | 1982-09-10 | 1984-03-16 | 増田 閃一 | 管路式除電器 |
| US4951172A (en) * | 1988-07-20 | 1990-08-21 | Ion Systems, Inc. | Method and apparatus for regulating air ionization |
| JP2816037B2 (ja) | 1991-07-25 | 1998-10-27 | 忠弘 大見 | 帯電物体の中和装置 |
| JPH06216060A (ja) | 1993-01-12 | 1994-08-05 | Tokyo Electron Ltd | 真空処理方法 |
| US5930105A (en) * | 1997-11-10 | 1999-07-27 | Ion Systems, Inc. | Method and apparatus for air ionization |
| US6465795B1 (en) | 2000-03-28 | 2002-10-15 | Applied Materials, Inc. | Charge neutralization of electron beam systems |
| JP4738636B2 (ja) | 2001-05-29 | 2011-08-03 | 株式会社テクノ菱和 | 防爆型無発塵イオナイザー |
| FR2855361A1 (fr) | 2003-05-23 | 2004-11-26 | Gestion Et De Services Soc D | Dispositif de generation de decharges electriques froides |
| JP4516304B2 (ja) | 2003-11-20 | 2010-08-04 | 株式会社アルバック | 巻取式真空蒸着方法及び巻取式真空蒸着装置 |
| JP2005216763A (ja) | 2004-01-30 | 2005-08-11 | Hiroshi Motokawa | イオン化気流発生装置 |
| KR100777759B1 (ko) | 2005-02-16 | 2007-11-19 | 가부시키가이샤 아루박 | 권취식 진공 막형성장치 |
| US8773837B2 (en) | 2007-03-17 | 2014-07-08 | Illinois Tool Works Inc. | Multi pulse linear ionizer |
| DE112008003721T5 (de) * | 2008-04-14 | 2011-06-09 | ULVAC, Inc., Chigasaki-shi | Vakuumabscheidungsvorrichtung des aufwickelnden Typs |
| JP4918628B2 (ja) * | 2009-06-30 | 2012-04-18 | 新東ホールディングス株式会社 | イオン発生装置及びイオン発生素子 |
| US9125284B2 (en) * | 2012-02-06 | 2015-09-01 | Illinois Tool Works Inc. | Automatically balanced micro-pulsed ionizing blower |
| EP2812964B1 (en) * | 2012-02-06 | 2020-09-02 | Illinois Tool Works Inc. | Multi pulse linear ionizer |
| US8681470B2 (en) * | 2012-08-22 | 2014-03-25 | Illinois Tool Works Inc. | Active ionization control with interleaved sampling and neutralization |
| CN103060934A (zh) * | 2013-01-30 | 2013-04-24 | 上海安可泰环保科技有限公司 | 一种用于静电纺丝的离子风控制方法 |
| US20140367030A1 (en) * | 2013-06-17 | 2014-12-18 | Corning Incorporated | Apparatuses and methods to process flexible glass laminates |
-
2014
- 2014-11-10 US US14/536,983 patent/US9084334B1/en active Active
-
2015
- 2015-06-01 US US14/727,709 patent/US9357624B1/en active Active
- 2015-10-13 EP EP15790722.1A patent/EP3219176B1/en active Active
- 2015-10-13 SG SG11201703869UA patent/SG11201703869UA/en unknown
- 2015-10-13 KR KR1020177014778A patent/KR102509754B1/ko active IP Right Grant
- 2015-10-13 TW TW104133547A patent/TWI655881B/zh active
- 2015-10-13 WO PCT/US2015/055183 patent/WO2016076998A1/en active Application Filing
- 2015-10-13 JP JP2017525381A patent/JP6659687B2/ja active Active
- 2015-10-13 CN CN201580071285.0A patent/CN107430975B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201625074A (zh) | 2016-07-01 |
| US9357624B1 (en) | 2016-05-31 |
| EP3219176B1 (en) | 2020-02-26 |
| US20160135273A1 (en) | 2016-05-12 |
| TWI655881B (zh) | 2019-04-01 |
| US9084334B1 (en) | 2015-07-14 |
| CN107430975B (zh) | 2019-06-28 |
| JP2018500723A (ja) | 2018-01-11 |
| KR102509754B1 (ko) | 2023-03-13 |
| CN107430975A (zh) | 2017-12-01 |
| WO2016076998A1 (en) | 2016-05-19 |
| JP6659687B2 (ja) | 2020-03-04 |
| KR20170084130A (ko) | 2017-07-19 |
| EP3219176A1 (en) | 2017-09-20 |
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