SG11201700461VA - Composition, use thereof and method for electrodepositing gold containing layers - Google Patents

Composition, use thereof and method for electrodepositing gold containing layers

Info

Publication number
SG11201700461VA
SG11201700461VA SG11201700461VA SG11201700461VA SG11201700461VA SG 11201700461V A SG11201700461V A SG 11201700461VA SG 11201700461V A SG11201700461V A SG 11201700461VA SG 11201700461V A SG11201700461V A SG 11201700461VA SG 11201700461V A SG11201700461V A SG 11201700461VA
Authority
SG
Singapore
Prior art keywords
composition
containing layers
gold containing
electrodepositing gold
electrodepositing
Prior art date
Application number
SG11201700461VA
Other languages
English (en)
Inventor
Jana Breitfelder
Robert Rüther
Olaf Kurtz
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51390050&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG11201700461V(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of SG11201700461VA publication Critical patent/SG11201700461VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
SG11201700461VA 2014-08-25 2015-08-21 Composition, use thereof and method for electrodepositing gold containing layers SG11201700461VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14182083.7A EP2990507A1 (fr) 2014-08-25 2014-08-25 Composition, utilisation de la composition et procédé pour le dépôt galvanique de couches contenant de l'or
PCT/EP2015/069234 WO2016030290A1 (fr) 2014-08-25 2015-08-21 Composition, son utilisation et procédé d'électrodéposition de couches contenant de l'or

Publications (1)

Publication Number Publication Date
SG11201700461VA true SG11201700461VA (en) 2017-03-30

Family

ID=51390050

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201700461VA SG11201700461VA (en) 2014-08-25 2015-08-21 Composition, use thereof and method for electrodepositing gold containing layers

Country Status (8)

Country Link
US (1) US20170159195A1 (fr)
EP (2) EP2990507A1 (fr)
JP (1) JP6726173B2 (fr)
KR (1) KR102315943B1 (fr)
CN (1) CN106661751B (fr)
SG (1) SG11201700461VA (fr)
TW (1) TWI669296B (fr)
WO (1) WO2016030290A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107709628B (zh) * 2015-06-26 2020-06-16 美泰乐科技(日本)股份有限公司 用于电解硬质金镀敷液的防置换剂和包含其的电解硬质金镀敷液
CN108063219B (zh) * 2017-11-23 2020-01-10 浙江大学 一种高效液态碱金属合金电极及其制备方法和应用
US11674235B2 (en) * 2018-04-11 2023-06-13 Hutchinson Technology Incorporated Plating method to reduce or eliminate voids in solder applied without flux
CN108998817B (zh) * 2018-07-06 2021-04-16 鹤山市精工制版有限公司 一种打底镀镍液用添加剂及其应用
CN108754554B (zh) * 2018-09-18 2019-10-22 泉州益丰贵金属科技有限公司 一种镀金液及一种镀金方法
EP4370732A1 (fr) 2021-07-15 2024-05-22 Seolfor Aktiebolag Compositions d'électrodéposition et leurs procédés de préparation

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004176171A (ja) * 2002-09-30 2004-06-24 Shinko Electric Ind Co Ltd 非シアン電解金めっき液
JP4868123B2 (ja) * 2005-02-04 2012-02-01 学校法人早稲田大学 金−ニッケル系アモルファス合金めっき皮膜、電気めっき液及び電気めっき方法
SG127854A1 (en) * 2005-06-02 2006-12-29 Rohm & Haas Elect Mat Improved gold electrolytes
JP4868121B2 (ja) * 2005-12-21 2012-02-01 学校法人早稲田大学 アモルファス金−ニッケル系合金めっき皮膜形成用電気めっき液及び電気めっき方法
JP4719822B2 (ja) * 2008-06-11 2011-07-06 日本高純度化学株式会社 電解金めっき液及びそれを用いて得られた金皮膜
US8608931B2 (en) * 2009-09-25 2013-12-17 Rohm And Haas Electronic Materials Llc Anti-displacement hard gold compositions
ITFI20120103A1 (it) * 2012-06-01 2013-12-02 Bluclad Srl Bagni galvanici per l'ottenimento di una lega di oro a bassa caratura e processo galvanico che utilizza detti bagni.

Also Published As

Publication number Publication date
EP2990507A1 (fr) 2016-03-02
JP6726173B2 (ja) 2020-07-22
US20170159195A1 (en) 2017-06-08
CN106661751B (zh) 2019-11-12
TWI669296B (zh) 2019-08-21
EP3186413A1 (fr) 2017-07-05
CN106661751A (zh) 2017-05-10
TW201615628A (zh) 2016-05-01
KR102315943B1 (ko) 2021-10-21
JP2017527700A (ja) 2017-09-21
WO2016030290A1 (fr) 2016-03-03
EP3186413B1 (fr) 2019-02-06
KR20170046651A (ko) 2017-05-02

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