SG11201606160RA - Beam homogenizer for laser annealing - Google Patents
Beam homogenizer for laser annealingInfo
- Publication number
- SG11201606160RA SG11201606160RA SG11201606160RA SG11201606160RA SG11201606160RA SG 11201606160R A SG11201606160R A SG 11201606160RA SG 11201606160R A SG11201606160R A SG 11201606160RA SG 11201606160R A SG11201606160R A SG 11201606160RA SG 11201606160R A SG11201606160R A SG 11201606160RA
- Authority
- SG
- Singapore
- Prior art keywords
- laser annealing
- beam homogenizer
- homogenizer
- annealing
- laser
- Prior art date
Links
- 238000005224 laser annealing Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0966—Cylindrical lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/48—Laser speckle optics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
- G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0087—Simple or compound lenses with index gradient
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B2003/0093—Simple or compound lenses characterised by the shape
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Recrystallisation Techniques (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410043852.9A CN104808343B (en) | 2014-01-29 | 2014-01-29 | A kind of laser annealing dodging device |
PCT/CN2015/070747 WO2015113469A1 (en) | 2014-01-29 | 2015-01-15 | Laser annealing dodging apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201606160RA true SG11201606160RA (en) | 2016-09-29 |
Family
ID=53693308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201606160RA SG11201606160RA (en) | 2014-01-29 | 2015-01-15 | Beam homogenizer for laser annealing |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP3101463B1 (en) |
JP (1) | JP6531107B2 (en) |
KR (1) | KR101918252B1 (en) |
CN (1) | CN104808343B (en) |
SG (1) | SG11201606160RA (en) |
TW (1) | TWI584904B (en) |
WO (1) | WO2015113469A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106646716A (en) * | 2017-02-14 | 2017-05-10 | 山西大学 | Space stacking light beam distributed phase delayer and speckle elimination method thereof |
JP2018195676A (en) * | 2017-05-16 | 2018-12-06 | 株式会社ブイ・テクノロジー | Laser annealing apparatus and laser annealing method |
KR102467462B1 (en) * | 2017-12-05 | 2022-11-16 | 삼성디스플레이 주식회사 | Laser crystallization apparatus |
CN111383916A (en) * | 2018-12-28 | 2020-07-07 | 上海微电子装备(集团)股份有限公司 | Laser annealing device for SiC substrate |
CN111061062B (en) * | 2020-01-09 | 2021-05-11 | 山西大学 | Laser speckle suppression element and suppression method |
CN116184681B (en) * | 2023-04-27 | 2023-08-04 | 成都莱普科技股份有限公司 | Beam shaping device and beam shaping method for carbon dioxide laser |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0721583B2 (en) * | 1985-01-22 | 1995-03-08 | 株式会社ニコン | Exposure equipment |
US5963305A (en) * | 1996-09-12 | 1999-10-05 | Canon Kabushiki Kaisha | Illumination system and exposure apparatus |
US6898216B1 (en) * | 1999-06-30 | 2005-05-24 | Lambda Physik Ag | Reduction of laser speckle in photolithography by controlled disruption of spatial coherence of laser beam |
US6069739A (en) * | 1998-06-30 | 2000-05-30 | Intel Corporation | Method and lens arrangement to improve imaging performance of microlithography exposure tool |
TW523791B (en) * | 2000-09-01 | 2003-03-11 | Semiconductor Energy Lab | Method of processing beam, laser irradiation apparatus, and method of manufacturing semiconductor device |
JP3969197B2 (en) * | 2002-06-06 | 2007-09-05 | 石川島播磨重工業株式会社 | Laser irradiation device |
JP2004200497A (en) * | 2002-12-19 | 2004-07-15 | Sony Corp | Light emitting device and laser annealing device |
US7521651B2 (en) * | 2003-09-12 | 2009-04-21 | Orbotech Ltd | Multiple beam micro-machining system and method |
JP4291230B2 (en) * | 2004-08-06 | 2009-07-08 | 株式会社日本製鋼所 | Method and apparatus for forming crystallized film |
JP2007214527A (en) * | 2006-01-13 | 2007-08-23 | Ihi Corp | Laser annealing method and laser annealer |
DE202006007691U1 (en) * | 2006-05-13 | 2006-08-24 | Coherent Lambda Physik Gmbh | Laser beam homogenizing device for e.g. laser ablation, has cylindrical lens dividing laser beam into partial beams, where path length difference of two of partial beams is larger than temporal coherence length of laser beam |
DE102006047941B4 (en) * | 2006-10-10 | 2008-10-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for homogenizing radiation with non-regular microlens arrays |
US8192030B2 (en) * | 2007-03-19 | 2012-06-05 | Panasonic Corporation | Laser illuminating device and image display device |
JP2008294186A (en) * | 2007-05-24 | 2008-12-04 | Shimadzu Corp | Crystallization device and crystallization method |
CN102057467B (en) * | 2008-06-12 | 2013-02-13 | 株式会社Ihi | Laser annealing method and laser annealing apparatus |
TW201001555A (en) * | 2008-06-17 | 2010-01-01 | Ihi Corp | Laser anneal method and laser anneal device |
JP2012518791A (en) * | 2009-02-23 | 2012-08-16 | ディメンジョナル フォトニクス インターナショナル,インコーポレイテッド | Speckle noise reduction in coherent illumination imaging systems |
DE102009037141B4 (en) * | 2009-07-31 | 2013-01-03 | Carl Zeiss Laser Optics Gmbh | Optical system for generating a light beam for treating a substrate |
CN104752267B (en) * | 2013-12-31 | 2018-04-27 | 上海微电子装备(集团)股份有限公司 | A kind of laser anneal device and method |
-
2014
- 2014-01-29 CN CN201410043852.9A patent/CN104808343B/en active Active
-
2015
- 2015-01-15 SG SG11201606160RA patent/SG11201606160RA/en unknown
- 2015-01-15 JP JP2016549057A patent/JP6531107B2/en active Active
- 2015-01-15 WO PCT/CN2015/070747 patent/WO2015113469A1/en active Application Filing
- 2015-01-15 EP EP15742551.3A patent/EP3101463B1/en active Active
- 2015-01-15 KR KR1020167022637A patent/KR101918252B1/en active IP Right Grant
- 2015-01-26 TW TW104102507A patent/TWI584904B/en active
Also Published As
Publication number | Publication date |
---|---|
EP3101463B1 (en) | 2024-09-04 |
JP6531107B2 (en) | 2019-06-12 |
KR101918252B1 (en) | 2018-11-13 |
WO2015113469A1 (en) | 2015-08-06 |
KR20160111467A (en) | 2016-09-26 |
CN104808343B (en) | 2018-03-30 |
JP2017510975A (en) | 2017-04-13 |
TWI584904B (en) | 2017-06-01 |
CN104808343A (en) | 2015-07-29 |
TW201540408A (en) | 2015-11-01 |
EP3101463A4 (en) | 2017-01-18 |
EP3101463A1 (en) | 2016-12-07 |
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