SG11201507580UA - Microwave plasma spectrometer using dielectric resonator - Google Patents

Microwave plasma spectrometer using dielectric resonator

Info

Publication number
SG11201507580UA
SG11201507580UA SG11201507580UA SG11201507580UA SG11201507580UA SG 11201507580U A SG11201507580U A SG 11201507580UA SG 11201507580U A SG11201507580U A SG 11201507580UA SG 11201507580U A SG11201507580U A SG 11201507580UA SG 11201507580U A SG11201507580U A SG 11201507580UA
Authority
SG
Singapore
Prior art keywords
dielectric resonator
microwave plasma
plasma spectrometer
spectrometer
microwave
Prior art date
Application number
SG11201507580UA
Other languages
English (en)
Inventor
Jovan Jevtic
Ashok Menon
Velibor Pikelja
Original Assignee
Radom Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radom Corp filed Critical Radom Corp
Publication of SG11201507580UA publication Critical patent/SG11201507580UA/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N22/00Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21BFUSION REACTORS
    • G21B1/00Thermonuclear fusion reactors
    • G21B1/05Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • G21B1/057Tokamaks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32467Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/718Laser microanalysis, i.e. with formation of sample plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002Cooling arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/105Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645Radiofrequency discharges
    • H05H1/4652Radiofrequency discharges using inductive coupling means, e.g. coils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00Auxiliary systems
    • H05H2242/20Power circuits
    • H05H2242/24Radiofrequency or microwave generators
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Electron Tubes For Measurement (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Lasers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
SG11201507580UA 2013-03-13 2014-03-12 Microwave plasma spectrometer using dielectric resonator SG11201507580UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361779557P 2013-03-13 2013-03-13
PCT/US2014/024312 WO2014159590A1 (en) 2013-03-13 2014-03-12 Microwave plasma spectrometer using dielectric resonator

Publications (1)

Publication Number Publication Date
SG11201507580UA true SG11201507580UA (en) 2015-10-29

Family

ID=51625209

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201507580UA SG11201507580UA (en) 2013-03-13 2014-03-12 Microwave plasma spectrometer using dielectric resonator
SG11201507579UA SG11201507579UA (en) 2013-03-13 2014-03-12 Plasma generator using dielectric resonator

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201507579UA SG11201507579UA (en) 2013-03-13 2014-03-12 Plasma generator using dielectric resonator

Country Status (9)

Country Link
US (4) US10285256B2 (ko)
EP (2) EP2974559B1 (ko)
JP (2) JP6411449B2 (ko)
KR (1) KR102226852B1 (ko)
CN (2) CN105122951B (ko)
AU (2) AU2014240385B2 (ko)
CA (2) CA2905929C (ko)
SG (2) SG11201507580UA (ko)
WO (2) WO2014159590A1 (ko)

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Also Published As

Publication number Publication date
US10285256B2 (en) 2019-05-07
CA2905929A1 (en) 2014-10-02
WO2014159590A1 (en) 2014-10-02
US9491841B2 (en) 2016-11-08
AU2014240387A1 (en) 2015-10-01
WO2014159590A9 (en) 2015-02-19
KR102226852B1 (ko) 2021-03-11
EP2974559A4 (en) 2016-09-21
US9706635B2 (en) 2017-07-11
US20190215943A1 (en) 2019-07-11
EP2972241B1 (en) 2019-09-04
CN105122042A (zh) 2015-12-02
CN105122042B (zh) 2019-09-20
KR20150128841A (ko) 2015-11-18
WO2014159588A1 (en) 2014-10-02
US20160029472A1 (en) 2016-01-28
AU2014240385B2 (en) 2018-02-15
JP2016522533A (ja) 2016-07-28
CN105122951B (zh) 2018-05-04
CA2905929C (en) 2022-04-12
EP2972241A1 (en) 2016-01-20
JP6568050B2 (ja) 2019-08-28
US20160025656A1 (en) 2016-01-28
EP2974559A1 (en) 2016-01-20
AU2014240385A1 (en) 2015-10-01
US20170027051A1 (en) 2017-01-26
SG11201507579UA (en) 2015-10-29
CN105122951A (zh) 2015-12-02
CA2905931A1 (en) 2014-10-02
JP2016520797A (ja) 2016-07-14
US10863611B2 (en) 2020-12-08
EP2972241A4 (en) 2016-09-21
AU2014240387B2 (en) 2017-11-30
CA2905931C (en) 2021-10-26
EP2974559B1 (en) 2020-05-13
JP6411449B2 (ja) 2018-10-24

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