SG11201507579UA - Plasma generator using dielectric resonator - Google Patents

Plasma generator using dielectric resonator

Info

Publication number
SG11201507579UA
SG11201507579UA SG11201507579UA SG11201507579UA SG11201507579UA SG 11201507579U A SG11201507579U A SG 11201507579UA SG 11201507579U A SG11201507579U A SG 11201507579UA SG 11201507579U A SG11201507579U A SG 11201507579UA SG 11201507579U A SG11201507579U A SG 11201507579UA
Authority
SG
Singapore
Prior art keywords
plasma generator
dielectric resonator
resonator
dielectric
plasma
Prior art date
Application number
SG11201507579UA
Inventor
Jovan Jevtic
Ashok Menon
Velibor Pikelja
Original Assignee
Radom Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radom Corp filed Critical Radom Corp
Publication of SG11201507579UA publication Critical patent/SG11201507579UA/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N22/00Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21BFUSION REACTORS
    • G21B1/00Thermonuclear fusion reactors
    • G21B1/05Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • G21B1/057Tokamaks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32467Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/718Laser microanalysis, i.e. with formation of sample plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002Cooling arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/105Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645Radiofrequency discharges
    • H05H1/4652Radiofrequency discharges using inductive coupling means, e.g. coils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00Auxiliary systems
    • H05H2242/20Power circuits
    • H05H2242/24Radiofrequency or microwave generators
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/10Nuclear fusion reactors
SG11201507579UA 2013-03-13 2014-03-12 Plasma generator using dielectric resonator SG11201507579UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361779557P 2013-03-13 2013-03-13
PCT/US2014/024306 WO2014159588A1 (en) 2013-03-13 2014-03-12 Plasma generator using dielectric resonator

Publications (1)

Publication Number Publication Date
SG11201507579UA true SG11201507579UA (en) 2015-10-29

Family

ID=51625209

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201507580UA SG11201507580UA (en) 2013-03-13 2014-03-12 Microwave plasma spectrometer using dielectric resonator
SG11201507579UA SG11201507579UA (en) 2013-03-13 2014-03-12 Plasma generator using dielectric resonator

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201507580UA SG11201507580UA (en) 2013-03-13 2014-03-12 Microwave plasma spectrometer using dielectric resonator

Country Status (9)

Country Link
US (4) US9491841B2 (en)
EP (2) EP2972241B1 (en)
JP (2) JP6411449B2 (en)
KR (1) KR102226852B1 (en)
CN (2) CN105122042B (en)
AU (2) AU2014240385B2 (en)
CA (2) CA2905929C (en)
SG (2) SG11201507580UA (en)
WO (2) WO2014159588A1 (en)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8783220B2 (en) * 2008-01-31 2014-07-22 West Virginia University Quarter wave coaxial cavity igniter for combustion engines
CA2905929C (en) * 2013-03-13 2022-04-12 Radom Corporation Plasma generator using dielectric resonator
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
US9550694B2 (en) 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
US20160200618A1 (en) * 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
US10249479B2 (en) * 2015-01-30 2019-04-02 Applied Materials, Inc. Magnet configurations for radial uniformity tuning of ICP plasmas
US9666415B2 (en) * 2015-02-11 2017-05-30 Ford Global Technologies, Llc Heated air plasma treatment
US9875884B2 (en) 2015-02-28 2018-01-23 Agilent Technologies, Inc. Ambient desorption, ionization, and excitation for spectrometry
US10340124B2 (en) * 2015-10-29 2019-07-02 Applied Materials, Inc. Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide
WO2017142523A1 (en) 2016-02-17 2017-08-24 Accustrata, Inc. System and method for monitoring atomic absorption during a surface modification process
US10541118B2 (en) * 2016-03-21 2020-01-21 Board Of Trustees Of Michigan State University Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors
PL235377B1 (en) 2016-04-05 2020-07-13 Edward Reszke Adapter shaping the microwave electromagnetic field that heats toroidal plasma discharge
US10638559B2 (en) * 2016-06-30 2020-04-28 Nxp Usa, Inc. Solid state microwave heating apparatus and method with stacked dielectric resonator antenna array
KR101850895B1 (en) * 2017-01-03 2018-04-20 한국표준과학연구원 Plasma Generation Apparatus
US10900907B2 (en) * 2017-02-17 2021-01-26 Radom Corporation Portable plasma source for optical spectroscopy
US10424467B2 (en) * 2017-03-13 2019-09-24 Applied Materials, Inc. Smart RF pulsing tuning using variable frequency generators
DE102017105410A1 (en) * 2017-03-14 2018-09-20 Epcos Ag plasma generator
EP3596343B1 (en) * 2017-03-17 2023-06-07 CU Aerospace, LLC Cyclotronic plasma actuator with arc-magnet for active flow control
US10446373B2 (en) * 2017-03-17 2019-10-15 Cu Aerospace, Llc Cyclotronic plasma actuator with arc-magnet for active flow control
WO2018183677A1 (en) * 2017-03-29 2018-10-04 Perkinelmer Health Sciences, Inc. Cooling devices and instruments including them
CN110998258A (en) * 2017-07-17 2020-04-10 赛默科技便携式分析仪器有限公司 Complementary safety system for laser induced breakdown spectroscopy
US20190186369A1 (en) * 2017-12-20 2019-06-20 Plasma Igniter, LLC Jet Engine with Plasma-assisted Combustion
JP7036380B2 (en) * 2018-04-27 2022-03-15 株式会社島津製作所 Analysis equipment
CN108593631B (en) * 2018-06-07 2020-07-14 华中科技大学 Method for detecting molecular free radical spectrum by aerosol-assisted laser probe
US11037765B2 (en) * 2018-07-03 2021-06-15 Tokyo Electron Limited Resonant structure for electron cyclotron resonant (ECR) plasma ionization
KR102183006B1 (en) * 2019-02-13 2020-11-25 경북대학교 산학협력단 Atmospheric pressure plasma device
CN109867261B (en) * 2019-02-28 2024-01-26 山东师范大学 Methane-carbon dioxide plasma catalytic reforming device and catalytic reforming method
CN109761304A (en) * 2019-03-05 2019-05-17 成都科衡环保技术有限公司 Module, reactor and its application occur for the microwave plasma for water process
EP3712923A1 (en) 2019-03-18 2020-09-23 ETH Zurich Ion source for inductively coupled plasma mass spectrometry
CN110049614B (en) * 2019-04-28 2021-12-03 中国科学院微电子研究所 Microwave plasma device and plasma excitation method
DE102019111908B4 (en) * 2019-05-08 2021-08-12 Dreebit Gmbh ECR ion source and method for operating an ECR ion source
CN110412015B (en) * 2019-06-23 2022-03-18 南京理工大学 High-sensitivity microwave molecular spectrometer
CN110739549B (en) * 2019-10-29 2021-05-11 Oppo广东移动通信有限公司 Array lens, lens antenna, and electronic apparatus
KR102339970B1 (en) * 2020-01-20 2021-12-16 주식회사 피에스엠 Low temperature microwave plasma generator of hand type
EP3890449A1 (en) 2020-04-02 2021-10-06 Tofwerk AG Microwave driven plasma ion source
CN113727508A (en) * 2020-05-26 2021-11-30 上海大学 Novel vacuum microwave plasma ion source
US11810763B2 (en) 2021-01-13 2023-11-07 Schlumberger Technology Corporation Distributed ground single antenna ion source
CN113314852A (en) * 2021-05-25 2021-08-27 上海交通大学 Plasma modulator and electromagnetic wave vector microscopic sensor
CN113533308A (en) * 2021-06-15 2021-10-22 杭州谱育科技发展有限公司 Device and method for detecting elements in radioactive sample
KR102555977B1 (en) 2021-07-15 2023-07-13 가천대학교 산학협력단 Device for detection comprising resonator and method of using the same
US11956882B2 (en) 2022-02-28 2024-04-09 Radom Corporation High-power plasma torch with dielectric resonator
WO2023244208A1 (en) * 2022-06-12 2023-12-21 Peter Butzloff Microwave plasma thrust system and methods
EP4339996A1 (en) 2022-09-15 2024-03-20 Analytik Jena GmbH+Co. KG System for analyzing a sample
DE102023125658A1 (en) 2022-10-07 2024-04-18 Analytik Jena Gmbh+Co. Kg System for analyzing a sample

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4765179A (en) * 1985-09-09 1988-08-23 Solid State Farms, Inc. Radio frequency spectroscopy apparatus and method using multiple frequency waveforms
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
US4918031A (en) * 1988-12-28 1990-04-17 American Telephone And Telegraph Company,At&T Bell Laboratories Processes depending on plasma generation using a helical resonator
JP3284278B2 (en) 1992-10-30 2002-05-20 株式会社日立製作所 Plasma processing equipment
US5517157A (en) * 1993-04-27 1996-05-14 Ball Corporation Evanescent-field interrogator for atomic frequency standards
JPH0757894A (en) * 1993-08-20 1995-03-03 Mitsubishi Heavy Ind Ltd Method and device for generating discharge by microwave
TW312815B (en) * 1995-12-15 1997-08-11 Hitachi Ltd
US5942855A (en) * 1996-08-28 1999-08-24 Northeastern University Monolithic miniaturized inductively coupled plasma source
US6071372A (en) * 1997-06-05 2000-06-06 Applied Materials, Inc. RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
US6265717B1 (en) 1998-07-15 2001-07-24 Agilent Technologies Inductively coupled plasma mass spectrometer and method
JP4066214B2 (en) * 1998-07-24 2008-03-26 財団法人国際科学振興財団 Plasma process equipment
KR20010080572A (en) * 1998-11-26 2001-08-22 가나이 쓰토무 Dry etching apparatus and dry etching method
FR2788854B1 (en) 1999-01-22 2001-05-04 Cit Alcatel SYSTEM AND METHOD FOR IDENTIFYING GASEOUS EFFLUENTS, EQUIPMENT PROVIDED WITH SUCH A SYSTEM
CN1350698A (en) * 1999-05-12 2002-05-22 熔化照明股份有限公司 High brightness microwave lamp
US6504159B1 (en) * 1999-09-14 2003-01-07 International Business Machines Corporation SOI plasma source ion implantation
JP4454781B2 (en) 2000-04-18 2010-04-21 東京エレクトロン株式会社 Plasma processing equipment
JP3625197B2 (en) * 2001-01-18 2005-03-02 東京エレクトロン株式会社 Plasma apparatus and plasma generation method
EP1409714A4 (en) * 2001-06-26 2004-07-28 Mds Proteomics Inc Methods and systems for identifying kinases, phosphatases and substrates thereof
AUPS044202A0 (en) * 2002-02-11 2002-03-07 Varian Australia Pty Ltd Microwave plasma source
JP2003273615A (en) 2002-03-18 2003-09-26 Ngk Spark Plug Co Ltd Dielectric resonator and adjusting method for resonance frequency thereof
US20050212626A1 (en) * 2002-05-07 2005-09-29 Toshiyuki Takamatsu High frequency reaction processing system
WO2003096769A1 (en) * 2002-05-07 2003-11-20 Toshiyuki Takamatsu High frequency reaction processing system
WO2004062326A2 (en) 2002-12-30 2004-07-22 Northeastern University Low power plasma generator
US20060137613A1 (en) 2004-01-27 2006-06-29 Shigeru Kasai Plasma generating apparatus, plasma generating method and remote plasma processing apparatus
JP4471589B2 (en) 2003-05-26 2010-06-02 三井造船株式会社 Antenna device for plasma generation and plasma processing apparatus
WO2005017494A2 (en) * 2003-08-18 2005-02-24 Trustees Of Stevens Institute Of Technology A frequency selective terahertz radiation detector
US7268549B2 (en) 2003-09-18 2007-09-11 Electroplated Metal Solutions Magnetic resonance spectrometer
US7273533B2 (en) * 2003-11-19 2007-09-25 Tokyo Electron Limited Plasma processing system with locally-efficient inductive plasma coupling
JP2005251546A (en) 2004-03-04 2005-09-15 Yokogawa Analytical Systems Inc Icp-ms plasma interface for high-melting point matrix sample
US7305935B1 (en) * 2004-08-25 2007-12-11 The United States Of America As Represented By The Administration Of Nasa Slotted antenna waveguide plasma source
US8031824B2 (en) * 2005-03-07 2011-10-04 Regents Of The University Of California Inductive plasma source for plasma electric generation system
US8633416B2 (en) 2005-03-11 2014-01-21 Perkinelmer Health Sciences, Inc. Plasmas and methods of using them
JP2006324551A (en) 2005-05-20 2006-11-30 Shibaura Mechatronics Corp Plasma generator and plasma processing apparatus
US8622735B2 (en) * 2005-06-17 2014-01-07 Perkinelmer Health Sciences, Inc. Boost devices and methods of using them
US7742167B2 (en) * 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device
EP1949766A4 (en) * 2005-10-27 2012-05-30 Luxim Corp Plasma lamp with dielectric waveguide
US7824495B1 (en) 2005-11-09 2010-11-02 Ut-Battelle, Llc System to continuously produce carbon fiber via microwave assisted plasma processing
US7459899B2 (en) * 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
JP4507113B2 (en) 2006-01-11 2010-07-21 芝浦メカトロニクス株式会社 Plasma generator and plasma processing apparatus
JP4699928B2 (en) 2006-03-29 2011-06-15 日本碍子株式会社 Plasma generation electrode inspection device
US7397560B2 (en) * 2006-04-04 2008-07-08 Agilent Technologies, Inc. Surface contamination detection
US8143801B2 (en) * 2006-10-20 2012-03-27 Luxim Corporation Electrodeless lamps and methods
US8212563B2 (en) * 2006-10-31 2012-07-03 Active Spectrum, Inc. Method and apparatus for in-situ measurement of soot by electron spin resonance (ESR) spectrometry
EP2178181B1 (en) * 2007-07-12 2017-08-30 Imagineering, Inc. Ignition plug, and analyzing device
US8967080B2 (en) 2008-02-13 2015-03-03 Tokyo Electron Limited Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method
KR101006382B1 (en) * 2008-04-24 2011-01-10 익스팬테크주식회사 Apparatus for generating a plasma
JP2009272127A (en) 2008-05-07 2009-11-19 Novelion Systems Co Ltd Plasma generating device, and plasma treatment device
KR101757920B1 (en) * 2009-10-27 2017-07-14 도쿄엘렉트론가부시키가이샤 Plasma processing apparatus and plasma processing method
JP2011232106A (en) 2010-04-26 2011-11-17 Shimadzu Corp Icp optical emission spectrometer
JP5507421B2 (en) 2010-11-12 2014-05-28 株式会社日立ハイテクノロジーズ Mass spectrometer
KR20120073884A (en) * 2010-12-27 2012-07-05 삼성전자주식회사 Inductive coupled plasma processing apparatus
US20130009399A1 (en) * 2011-07-08 2013-01-10 Brown Kevin L Waste heat recovery
CA2905929C (en) * 2013-03-13 2022-04-12 Radom Corporation Plasma generator using dielectric resonator

Also Published As

Publication number Publication date
SG11201507580UA (en) 2015-10-29
JP2016522533A (en) 2016-07-28
AU2014240387A1 (en) 2015-10-01
WO2014159590A1 (en) 2014-10-02
US9491841B2 (en) 2016-11-08
CN105122951A (en) 2015-12-02
EP2972241A4 (en) 2016-09-21
US20160029472A1 (en) 2016-01-28
US20170027051A1 (en) 2017-01-26
AU2014240385A1 (en) 2015-10-01
JP2016520797A (en) 2016-07-14
CN105122951B (en) 2018-05-04
CA2905931C (en) 2021-10-26
US9706635B2 (en) 2017-07-11
CN105122042A (en) 2015-12-02
CN105122042B (en) 2019-09-20
EP2972241B1 (en) 2019-09-04
EP2974559A1 (en) 2016-01-20
AU2014240385B2 (en) 2018-02-15
WO2014159588A1 (en) 2014-10-02
US10863611B2 (en) 2020-12-08
EP2972241A1 (en) 2016-01-20
KR20150128841A (en) 2015-11-18
KR102226852B1 (en) 2021-03-11
JP6411449B2 (en) 2018-10-24
US20190215943A1 (en) 2019-07-11
EP2974559B1 (en) 2020-05-13
CA2905931A1 (en) 2014-10-02
AU2014240387B2 (en) 2017-11-30
WO2014159590A9 (en) 2015-02-19
CA2905929C (en) 2022-04-12
CA2905929A1 (en) 2014-10-02
JP6568050B2 (en) 2019-08-28
US10285256B2 (en) 2019-05-07
US20160025656A1 (en) 2016-01-28
EP2974559A4 (en) 2016-09-21

Similar Documents

Publication Publication Date Title
SG11201507579UA (en) Plasma generator using dielectric resonator
HK1210566A1 (en) Plasma generator
EP3082384A4 (en) Plasma generating device
GB201311997D0 (en) Synchronising parallel power switches
TWI562535B (en) High frequency component
EP2957468A4 (en) Gas generator
EP2952394A4 (en) Gas generator
EP2979935A4 (en) Gas generator
SG10201404153PA (en) Switchgear
EP2979767A4 (en) Plasma spraying device
EP2960118A4 (en) Gas generator
EP2980821A4 (en) Switchgear
PL3047314T3 (en) Dielectric mirror
EP3056265A4 (en) Gas generator
EP2988900A4 (en) Variable switching frequency power supply plasma cutters
ZA201602808B (en) Ozone generator
ZA201508318B (en) Plasma perforation
EP3080442A4 (en) Electrical generator
EP3037163A4 (en) Gas generator
EP2951896A4 (en) Burst-laser generator using an optical resonator
EP3090827C0 (en) Plasma cutting apparatus
EP2990275A4 (en) Gas generator
EP2987685A4 (en) Gas generator
GB2511490B (en) Electrical Generator
HUE037201T2 (en) Electrical switchgear