SG109611A1 - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
SG109611A1
SG109611A1 SG200405051A SG200405051A SG109611A1 SG 109611 A1 SG109611 A1 SG 109611A1 SG 200405051 A SG200405051 A SG 200405051A SG 200405051 A SG200405051 A SG 200405051A SG 109611 A1 SG109611 A1 SG 109611A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
manufactured
device manufactured
manufacturing
Prior art date
Application number
SG200405051A
Other languages
English (en)
Inventor
Joerg Bruebach
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG109611A1 publication Critical patent/SG109611A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200405051A 2003-08-29 2004-08-23 Lithographic apparatus, device manufacturing method, and device manufactured thereby SG109611A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077702A EP1517183A1 (de) 2003-08-29 2003-08-29 Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel

Publications (1)

Publication Number Publication Date
SG109611A1 true SG109611A1 (en) 2005-03-30

Family

ID=34178538

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200405051A SG109611A1 (en) 2003-08-29 2004-08-23 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (7)

Country Link
US (1) US7230678B2 (de)
EP (1) EP1517183A1 (de)
JP (1) JP4194986B2 (de)
KR (1) KR100675918B1 (de)
CN (1) CN100565346C (de)
SG (1) SG109611A1 (de)
TW (1) TWI242114B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265366B2 (en) * 2004-03-31 2007-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060139607A1 (en) * 2004-12-23 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7534552B2 (en) * 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4580338B2 (ja) 2004-12-23 2010-11-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、エキシマ・レーザ、およびデバイス製造方法
US7631748B2 (en) * 2005-01-06 2009-12-15 Usnr/Kockums Cancar Company Conveyor system
US7256870B2 (en) * 2005-02-01 2007-08-14 Asml Netherlands B.V. Method and apparatus for controlling iso-dense bias in lithography
JP4710406B2 (ja) * 2005-04-28 2011-06-29 ウシオ電機株式会社 極端紫外光露光装置および極端紫外光光源装置
US8013979B2 (en) * 2007-08-17 2011-09-06 Asml Holding N.V. Illumination system with low telecentricity error and dynamic telecentricity correction
US9075324B2 (en) * 2007-08-17 2015-07-07 Asml Holding N.V. Beam positioning and pointing
US8416396B2 (en) 2010-07-18 2013-04-09 David H. Parker Methods and apparatus for optical amplitude modulated wavefront shaping
US9129352B2 (en) * 2012-08-30 2015-09-08 Samsung Electronics Co., Ltd. Optical proximity correction modeling method and system
CN106198395A (zh) * 2016-06-29 2016-12-07 中国科学院半导体研究所 一种雪崩二极管探测器光耦合系统及其测量方法
DE112018000764T5 (de) * 2017-02-10 2019-12-19 Kla-Tencor Corporation Identifizierung von prozessvariationen während der herstellung von produkten
CN111433674B (zh) * 2017-10-19 2024-01-09 西默有限公司 在单次光刻曝光通过过程中形成多个空间图像
CN111937256B (zh) 2018-03-30 2023-08-18 西默有限公司 脉冲光束的光谱特征选择和脉冲时序控制
CN112740111A (zh) * 2018-09-21 2021-04-30 Asml荷兰有限公司 辐射系统
WO2022219690A1 (ja) * 2021-04-12 2022-10-20 ギガフォトン株式会社 スペクトル波形の制御方法、レーザ装置、露光装置、及び電子デバイスの製造方法
CN116610007B (zh) * 2023-07-18 2023-10-27 上海图双精密装备有限公司 掩模对准光刻设备及其照明系统和照明方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937619A (en) * 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
JP2619419B2 (ja) * 1987-10-07 1997-06-11 株式会社日立製作所 縮小投影露光装置
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
JP3358090B2 (ja) * 1992-01-13 2002-12-16 株式会社ニコン 照明装置、その照明装置を備えた露光装置、及びその露光方法を用いたデバイス製造方法
US5372901A (en) * 1992-08-05 1994-12-13 Micron Technology, Inc. Removable bandpass filter for microlithographic aligners
US5739898A (en) * 1993-02-03 1998-04-14 Nikon Corporation Exposure method and apparatus
US5303002A (en) * 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
JP3325350B2 (ja) * 1993-08-16 2002-09-17 株式会社東芝 レーザ露光装置及び半導体装置の製造方法
JP3571397B2 (ja) * 1995-02-20 2004-09-29 シャープ株式会社 光源フィルタ、それを用いた投影露光装置および投影露光方法
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US20020186741A1 (en) * 1998-06-04 2002-12-12 Lambda Physik Ag Very narrow band excimer or molecular fluorine laser
JP3631094B2 (ja) 2000-03-30 2005-03-23 キヤノン株式会社 投影露光装置及びデバイス製造方法
TWI240151B (en) * 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4413414B2 (ja) 2000-11-09 2010-02-10 シャープ株式会社 露光用マスク、露光装置、露光方法及び液晶表示装置の製造方法
JP2002222756A (ja) * 2001-01-26 2002-08-09 Canon Inc 照明装置、露光装置、デバイス製造方法及びデバイス
DE10127449A1 (de) * 2001-06-07 2002-12-12 Zeiss Carl Beleuchtungssystem mit einer Vielzahl von Einzelgittern
US6784976B2 (en) * 2002-04-23 2004-08-31 Asml Holding N.V. System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
EP1380885A1 (de) * 2002-07-11 2004-01-14 Agfa-Gevaert AG Vorrichtung und Verfahren zum Aufbelichten von digitalisierten Bildinformationen auf ein lichtempfindliches Material
AU2003251669A1 (en) * 2002-08-26 2004-03-19 Carl Zeiss Smt Ag Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system

Also Published As

Publication number Publication date
TW200512546A (en) 2005-04-01
CN1591198A (zh) 2005-03-09
KR20050021915A (ko) 2005-03-07
US7230678B2 (en) 2007-06-12
KR100675918B1 (ko) 2007-01-29
TWI242114B (en) 2005-10-21
CN100565346C (zh) 2009-12-02
US20050078292A1 (en) 2005-04-14
JP4194986B2 (ja) 2008-12-10
EP1517183A1 (de) 2005-03-23
JP2005079591A (ja) 2005-03-24

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