SG107660A1 - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
SG107660A1
SG107660A1 SG200303388A SG200303388A SG107660A1 SG 107660 A1 SG107660 A1 SG 107660A1 SG 200303388 A SG200303388 A SG 200303388A SG 200303388 A SG200303388 A SG 200303388A SG 107660 A1 SG107660 A1 SG 107660A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
manufactured
device manufactured
manufacturing
Prior art date
Application number
SG200303388A
Other languages
English (en)
Inventor
Petrus Matthijs Henric Vosters
Hernes Jacobs
Heumen Mark Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03253057A external-priority patent/EP1477852A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG107660A1 publication Critical patent/SG107660A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200303388A 2002-06-13 2003-06-11 Lithographic apparatus, device manufacturing method, and device manufactured thereby SG107660A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02077355 2002-06-13
EP03253057A EP1477852A1 (en) 2003-05-16 2003-05-16 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Publications (1)

Publication Number Publication Date
SG107660A1 true SG107660A1 (en) 2004-12-29

Family

ID=31716849

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200303388A SG107660A1 (en) 2002-06-13 2003-06-11 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (8)

Country Link
US (1) US6995379B2 (zh)
EP (1) EP1372038B1 (zh)
JP (1) JP3955555B2 (zh)
KR (1) KR100525655B1 (zh)
CN (1) CN1327295C (zh)
DE (1) DE60302388T2 (zh)
SG (1) SG107660A1 (zh)
TW (1) TWI251125B (zh)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1477852A1 (en) * 2003-05-16 2004-11-17 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1667210A4 (en) * 2003-09-03 2008-11-05 Nikon Corp EXPOSURE DEVICE AND COMPONENTS MANUFACTURING METHOD
EP1705695A4 (en) * 2004-01-15 2007-08-08 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING THE SAME
US7184128B2 (en) * 2004-06-25 2007-02-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101280166B1 (ko) * 2004-11-25 2013-06-28 가부시키가이샤 니콘 이동체 시스템, 노광 장치 및 디바이스 제조 방법
JP4677267B2 (ja) * 2005-04-04 2011-04-27 キヤノン株式会社 平面ステージ装置及び露光装置
US7310132B2 (en) * 2006-03-17 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
UA100673C2 (uk) 2006-07-21 2013-01-25 Ксилеко, Инк. Спосіб переробки целюлозної або лігноцелюлозної біомаси (варіанти)
WO2008078688A1 (ja) * 2006-12-27 2008-07-03 Nikon Corporation ステージ装置、露光装置、及びデバイスの製造方法
NL2002888A1 (nl) * 2008-06-12 2009-12-15 Asml Netherlands Bv Lithographic apparatus, composite material and manufacturing method.
US8796644B2 (en) 2008-08-18 2014-08-05 Mapper Lithography Ip B.V. Charged particle beam lithography system and target positioning device
NL2004401A (en) * 2009-04-15 2010-10-18 Asml Netherlands Bv Lithographic apparatus, positioning system, and positioning method.
KR101113136B1 (ko) * 2009-06-02 2012-02-15 유한회사 미래시아건설 회전식 탄성볼라드
JP6010686B2 (ja) * 2012-04-27 2016-10-19 エーエスエムエル ネザーランズ ビー．ブイ． アクチュエータを備えるリソグラフィ装置、およびアクチュエータを保護する方法
CN103019045A (zh) * 2012-12-11 2013-04-03 清华大学 一种具有防撞功能的硅片台
CN104238273B (zh) * 2013-06-19 2016-09-28 上海微电子装备有限公司 一种工件台安全防护装置
CN104343885B (zh) * 2013-08-09 2016-08-24 上海微电子装备有限公司 高精密磁悬浮主动减震设备
EP3126870B1 (en) * 2014-04-03 2022-07-27 Evolv Technologies, Inc. Feature extraction for radar
CN105425548A (zh) * 2016-01-14 2016-03-23 哈尔滨工业大学 基于人字形线圈排布的动线圈磁浮无线微动台矢量圆弧换台方法及装置
JP6845305B2 (ja) * 2016-09-13 2021-03-17 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めシステムおよびリソグラフィ装置
DE102017200645A1 (de) * 2017-01-17 2017-12-28 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere Lithographiesystem
CN109725495B (zh) * 2017-10-31 2020-10-16 上海微电子装备（集团）股份有限公司 防撞装置及曝光机台
CN108345181A (zh) * 2018-03-29 2018-07-31 清华大学 一种具有二级防撞保护结构的硅片台双台交换系统

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977912A (ja) * 1982-10-26 1984-05-04 Nec Home Electronics Ltd シヨツクアブソ−バ
JPS6055570A (ja) * 1983-09-06 1985-03-30 Fujitsu Ltd 磁気ヘツド
US5040431A (en) * 1988-01-22 1991-08-20 Canon Kabushiki Kaisha Movement guiding mechanism
US5508518A (en) * 1995-05-03 1996-04-16 International Business Machines Corporation Lithography tool with vibration isolation
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
ATE404906T1 (de) 1996-11-28 2008-08-15 Nikon Corp Ausrichtvorrichtung und belichtungsverfahren
EP1107067B1 (en) * 1999-12-01 2006-12-27 ASML Netherlands B.V. Positioning apparatus and lithographic apparatus comprising the same
EP1111469B1 (en) * 1999-12-21 2007-10-17 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
EP1111471B1 (en) * 1999-12-21 2005-11-23 ASML Netherlands B.V. Lithographic projection apparatus with collision preventing device
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6476402B1 (en) * 2000-07-19 2002-11-05 Samsung Electronics Co., Ltd. Apparatus for pyroelectric emission lithography using patterned emitter

Also Published As

Publication number Publication date
DE60302388T2 (de) 2006-07-27
KR20040026102A (ko) 2004-03-27
US6995379B2 (en) 2006-02-07
EP1372038A1 (en) 2003-12-17
TWI251125B (en) 2006-03-11
US20040031932A1 (en) 2004-02-19
EP1372038B1 (en) 2005-11-23
TW200424781A (en) 2004-11-16
DE60302388D1 (de) 2005-12-29
JP3955555B2 (ja) 2007-08-08
CN1501168A (zh) 2004-06-02
KR100525655B1 (ko) 2005-11-02
JP2004040106A (ja) 2004-02-05
CN1327295C (zh) 2007-07-18

Similar Documents

Publication Publication Date Title
SG121762A1 (en) Lithographic apparatus, and device manufacturing method
SG116555A1 (en) Lithographic apparatus and device manufacturing method.
SG116549A1 (en) Lithographic apparatus and device manufacturing method.
SG115684A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG108323A1 (en) Chuck, lithographic apparatus and device manufacturing method
SG116539A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby.
SG121819A1 (en) Lithographic apparatus and device manufacturing method
SG121820A1 (en) Lithographic apparatus and device manufacturing method
SG2010050110A (en) Lithographic apparatus and device manufacturing method
SG130007A1 (en) Lithographic apparatus and device manufacturing method
SG121829A1 (en) Lithographic apparatus and device manufacturing method
SG108317A1 (en) Lithographic apparatus and device manufacturing method
HK1140550A1 (zh) 曝光方法和裝置、以及設備製造方法
HK1093119A1 (en) Exposure apparatus, exposure method, and device manufacturing method
SG10201607457PA (en) Exposure apparatus, exposure method and device manufacturing method
SG109000A1 (en) Lithographic apparatus and device manufacturing method
SG108997A1 (en) Lithographic apparatus and device manufacturing method
SG106138A1 (en) Lithographic apparatus and device manufacturing method
SG107660A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG115686A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG121780A1 (en) Lithographic apparatus and device manufacturing method
SG123587A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG110038A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG123556A1 (en) Lithographic apparatus and device manufacturing method
SG115682A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby