SG102052A1 - Radiation sensitive composition for color liquid display devices - Google Patents

Radiation sensitive composition for color liquid display devices

Info

Publication number
SG102052A1
SG102052A1 SG200203331A SG200203331A SG102052A1 SG 102052 A1 SG102052 A1 SG 102052A1 SG 200203331 A SG200203331 A SG 200203331A SG 200203331 A SG200203331 A SG 200203331A SG 102052 A1 SG102052 A1 SG 102052A1
Authority
SG
Singapore
Prior art keywords
display devices
color liquid
radiation sensitive
sensitive composition
liquid display
Prior art date
Application number
SG200203331A
Inventor
Abe Shigeru
Koyama Takayoshi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG102052A1 publication Critical patent/SG102052A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
SG200203331A 2001-06-06 2002-06-05 Radiation sensitive composition for color liquid display devices SG102052A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001171267A JP2002365795A (en) 2001-06-06 2001-06-06 Radiation sensitive composition for color liquid crystal display

Publications (1)

Publication Number Publication Date
SG102052A1 true SG102052A1 (en) 2004-02-27

Family

ID=19013065

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200203331A SG102052A1 (en) 2001-06-06 2002-06-05 Radiation sensitive composition for color liquid display devices

Country Status (4)

Country Link
JP (1) JP2002365795A (en)
KR (1) KR20020093587A (en)
SG (1) SG102052A1 (en)
TW (1) TW569043B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005316388A (en) 2004-03-30 2005-11-10 Jsr Corp Radiation sensitive composition for color filter, color filter and color liquid crystal display
JP4864375B2 (en) * 2004-08-09 2012-02-01 ドンジン セミケム カンパニー リミテッド Photosensitive resin composition for spacer, spacer and liquid crystal display element
KR101212138B1 (en) * 2005-08-26 2012-12-14 엘지디스플레이 주식회사 Liquid Crystal Display and Method for Manufacturing the Same
JP4745093B2 (en) * 2006-03-17 2011-08-10 東京応化工業株式会社 Black photosensitive composition
JP4715575B2 (en) * 2006-03-20 2011-07-06 Ｊｓｒ株式会社 Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
KR101313538B1 (en) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 Negative photosensitive resin composition
SG137817A1 (en) * 2006-05-29 2007-12-28 Jsr Corp Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
JP4706559B2 (en) * 2006-05-29 2011-06-22 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP2011197599A (en) * 2010-03-24 2011-10-06 Dainippon Printing Co Ltd Color filter, method of manufacturing the same, and liquid crystal display device having the same
JP5916373B2 (en) * 2011-12-22 2016-05-11 東京応化工業株式会社 Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer
JP6318699B2 (en) * 2014-02-27 2018-05-09 凸版印刷株式会社 Black photosensitive resin composition, black matrix, black matrix substrate, color filter, liquid crystal display device, and organic electroluminescence display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0875788A1 (en) * 1997-04-30 1998-11-04 JSR Corporation Radiation sensitive composition for color filters
JPH11149153A (en) * 1997-11-14 1999-06-02 Jsr Corp Radiation sensitive composition for black resist
JPH11174464A (en) * 1997-12-12 1999-07-02 Hitachi Chem Co Ltd Photosensitive film for forming resin spacer
JPH11337949A (en) * 1998-05-28 1999-12-10 Hitachi Chem Co Ltd Photosensitive film for forming colored resin spacer
JP2000227654A (en) * 1998-11-30 2000-08-15 Jsr Corp Radiation sensitive composition for black resist

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3277732B2 (en) * 1994-11-24 2002-04-22 ソニー株式会社 Color display
JPH1138225A (en) * 1997-07-17 1999-02-12 Jsr Corp Radiation sensitive composition for color filter
JP3726556B2 (en) * 1999-05-24 2005-12-14 Ｊｓｒ株式会社 Preparation method of radiation sensitive composition for color filter
JP2002167404A (en) * 2000-11-29 2002-06-11 Sumitomo Chem Co Ltd Colored photosensitive composition
JP5010780B2 (en) * 2001-03-23 2012-08-29 Ｊｓｒ株式会社 Radiation sensitive composition for color liquid crystal display device and color liquid crystal display device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0875788A1 (en) * 1997-04-30 1998-11-04 JSR Corporation Radiation sensitive composition for color filters
JPH11149153A (en) * 1997-11-14 1999-06-02 Jsr Corp Radiation sensitive composition for black resist
JPH11174464A (en) * 1997-12-12 1999-07-02 Hitachi Chem Co Ltd Photosensitive film for forming resin spacer
JPH11337949A (en) * 1998-05-28 1999-12-10 Hitachi Chem Co Ltd Photosensitive film for forming colored resin spacer
JP2000227654A (en) * 1998-11-30 2000-08-15 Jsr Corp Radiation sensitive composition for black resist

Also Published As

Publication number Publication date
TW569043B (en) 2004-01-01
JP2002365795A (en) 2002-12-18
KR20020093587A (en) 2002-12-16

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