SG10202008582VA - Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate - Google Patents

Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

Info

Publication number
SG10202008582VA
SG10202008582VA SG10202008582VA SG10202008582VA SG10202008582VA SG 10202008582V A SG10202008582V A SG 10202008582VA SG 10202008582V A SG10202008582V A SG 10202008582VA SG 10202008582V A SG10202008582V A SG 10202008582VA SG 10202008582V A SG10202008582V A SG 10202008582VA
Authority
SG
Singapore
Prior art keywords
surface treatment
producing
treatment composition
semiconductor substrate
composition
Prior art date
Application number
SG10202008582VA
Other languages
English (en)
Inventor
Yoshino Tsutomu
Onishi Shogo
Ishida Yasuto
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2020110739A external-priority patent/JP7495283B2/ja
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of SG10202008582VA publication Critical patent/SG10202008582VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3769—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines
    • C11D3/3773—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines in liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C11D3/2065—Polyhydric alcohols
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
    • H01L21/02074—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a planarization of conductive layers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Detergent Compositions (AREA)
SG10202008582VA 2019-09-06 2020-09-03 Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate SG10202008582VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019162883 2019-09-06
JP2020110739A JP7495283B2 (ja) 2019-09-06 2020-06-26 表面処理組成物、表面処理組成物の製造方法、表面処理方法、および半導体基板の製造方法

Publications (1)

Publication Number Publication Date
SG10202008582VA true SG10202008582VA (en) 2021-04-29

Family

ID=74863185

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202008582VA SG10202008582VA (en) 2019-09-06 2020-09-03 Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

Country Status (3)

Country Link
KR (1) KR102515938B1 (ja)
SG (1) SG10202008582VA (ja)
TW (1) TW202113052A (ja)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4585299B2 (ja) * 2004-12-09 2010-11-24 東京応化工業株式会社 リソグラフィー用リンス液及びそれを用いたレジストパターン形成方法
JP5948758B2 (ja) 2010-08-31 2016-07-06 三菱化学株式会社 半導体デバイス用基板洗浄液及び洗浄方法

Also Published As

Publication number Publication date
JP2021044537A (ja) 2021-03-18
KR20210029669A (ko) 2021-03-16
TW202113052A (zh) 2021-04-01
KR102515938B1 (ko) 2023-03-31

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