SG10202002400WA - Adaptive periodic waveform controller - Google Patents

Adaptive periodic waveform controller

Info

Publication number
SG10202002400WA
SG10202002400WA SG10202002400WA SG10202002400WA SG10202002400WA SG 10202002400W A SG10202002400W A SG 10202002400WA SG 10202002400W A SG10202002400W A SG 10202002400WA SG 10202002400W A SG10202002400W A SG 10202002400WA SG 10202002400W A SG10202002400W A SG 10202002400WA
Authority
SG
Singapore
Prior art keywords
periodic waveform
waveform controller
adaptive periodic
adaptive
controller
Prior art date
Application number
SG10202002400WA
Other languages
English (en)
Inventor
Ii Fisk
Aaron T Radomski
Jonathan Smyka
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG10202002400WA publication Critical patent/SG10202002400WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Ac-Ac Conversion (AREA)
SG10202002400WA 2014-12-04 2015-12-02 Adaptive periodic waveform controller SG10202002400WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462087290P 2014-12-04 2014-12-04
US14/953,917 US10049857B2 (en) 2014-12-04 2015-11-30 Adaptive periodic waveform controller

Publications (1)

Publication Number Publication Date
SG10202002400WA true SG10202002400WA (en) 2020-05-28

Family

ID=56092386

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202002400WA SG10202002400WA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller
SG11201701889SA SG11201701889SA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201701889SA SG11201701889SA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller

Country Status (7)

Country Link
US (4) US10049857B2 (ko)
EP (3) EP3561852B1 (ko)
JP (1) JP6454417B2 (ko)
KR (3) KR102265722B1 (ko)
CN (2) CN110299277B (ko)
SG (2) SG10202002400WA (ko)
WO (1) WO2016089992A1 (ko)

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US20170358431A1 (en) * 2016-06-13 2017-12-14 Applied Materials, Inc. Systems and methods for controlling a voltage waveform at a substrate during plasma processing
US10312048B2 (en) * 2016-12-12 2019-06-04 Applied Materials, Inc. Creating ion energy distribution functions (IEDF)
US10396601B2 (en) * 2017-05-25 2019-08-27 Mks Instruments, Inc. Piecewise RF power systems and methods for supplying pre-distorted RF bias voltage signals to an electrode in a processing chamber
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
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US11232931B2 (en) 2019-10-21 2022-01-25 Mks Instruments, Inc. Intermodulation distortion mitigation using electronic variable capacitor
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US11721523B2 (en) 2021-09-07 2023-08-08 Advanced Energy Industries, Inc. Control of rail voltage in multi-level pulsing RF power amplifier
US20230080707A1 (en) * 2021-09-13 2023-03-16 Advanced Energy Industries, Inc. Model reference adaptive control with signum projection tensor operations
US11972926B2 (en) 2021-10-05 2024-04-30 Advanced Energy Industries, Inc. Dynamic control-setpoint modification
US11823869B2 (en) 2021-10-15 2023-11-21 Mks Instruments, Inc. Impedance matching in a RF power generation system
US11990324B2 (en) 2022-03-03 2024-05-21 Advanced Energy Industries, Inc. Adaptive predictive control system
US11996274B2 (en) 2022-04-07 2024-05-28 Mks Instruments, Inc. Real-time, non-invasive IEDF plasma sensor
US11996269B2 (en) 2022-09-08 2024-05-28 Mks Instruments, Inc. Extremum seeking control apparatuses with online parameter adjustment and methods

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Also Published As

Publication number Publication date
EP3561852A1 (en) 2019-10-30
KR102151584B1 (ko) 2020-09-03
US10727027B2 (en) 2020-07-28
US11367592B2 (en) 2022-06-21
EP3227903B1 (en) 2019-05-15
JP6454417B2 (ja) 2019-01-16
SG11201701889SA (en) 2017-04-27
US20180294141A1 (en) 2018-10-11
CN110299277A (zh) 2019-10-01
EP3227903A4 (en) 2018-04-25
US20190214231A1 (en) 2019-07-11
US20160163514A1 (en) 2016-06-09
CN110299277B (zh) 2021-12-31
EP3876259A1 (en) 2021-09-08
US10217609B2 (en) 2019-02-26
KR102265722B1 (ko) 2021-06-16
JP2018504869A (ja) 2018-02-15
EP3227903A1 (en) 2017-10-11
KR20190037358A (ko) 2019-04-05
KR20170093109A (ko) 2017-08-14
US10049857B2 (en) 2018-08-14
KR101965251B1 (ko) 2019-04-03
US20210013007A1 (en) 2021-01-14
EP3561852B1 (en) 2021-03-31
KR20200104940A (ko) 2020-09-04
CN107004559A (zh) 2017-08-01
WO2016089992A1 (en) 2016-06-09
CN107004559B (zh) 2019-07-05

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