SG11201701889SA - Adaptive periodic waveform controller - Google Patents

Adaptive periodic waveform controller

Info

Publication number
SG11201701889SA
SG11201701889SA SG11201701889SA SG11201701889SA SG11201701889SA SG 11201701889S A SG11201701889S A SG 11201701889SA SG 11201701889S A SG11201701889S A SG 11201701889SA SG 11201701889S A SG11201701889S A SG 11201701889SA SG 11201701889S A SG11201701889S A SG 11201701889SA
Authority
SG
Singapore
Prior art keywords
periodic waveform
waveform controller
adaptive periodic
adaptive
controller
Prior art date
Application number
SG11201701889SA
Inventor
Ii Larry J Fisk
Aaron T Radomski
Jonathan Smyka
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG11201701889SA publication Critical patent/SG11201701889SA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146Amplitude modulation, includes pulsing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32917Plasma diagnostics
    • H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32917Plasma diagnostics
    • H01J37/3299Feedback systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Ac-Ac Conversion (AREA)
SG11201701889SA 2014-12-04 2015-12-02 Adaptive periodic waveform controller SG11201701889SA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201462087290P 2014-12-04 2014-12-04
US14/953,917 US10049857B2 (en) 2014-12-04 2015-11-30 Adaptive periodic waveform controller
PCT/US2015/063421 WO2016089992A1 (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller

Publications (1)

Publication Number Publication Date
SG11201701889SA true SG11201701889SA (en) 2017-04-27

Family

ID=56092386

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201701889SA SG11201701889SA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller
SG10202002400WA SG10202002400WA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10202002400WA SG10202002400WA (en) 2014-12-04 2015-12-02 Adaptive periodic waveform controller

Country Status (7)

Country Link
US (4) US10049857B2 (en)
EP (3) EP3227903B1 (en)
JP (1) JP6454417B2 (en)
KR (3) KR102151584B1 (en)
CN (2) CN107004559B (en)
SG (2) SG11201701889SA (en)
WO (1) WO2016089992A1 (en)

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US10396601B2 (en) * 2017-05-25 2019-08-27 Mks Instruments, Inc. Piecewise RF power systems and methods for supplying pre-distorted RF bias voltage signals to an electrode in a processing chamber
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US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
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WO2020068107A1 (en) * 2018-09-28 2020-04-02 Lam Research Corporation Systems and methods for optimizing power delivery to an electrode of a plasma chamber
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US11587767B2 (en) 2019-06-19 2023-02-21 Analogic Corporation Radio frequency generators, and related systems, methods, and devices
US11626907B2 (en) 2019-06-19 2023-04-11 Analogic Corporation Radio frequency generators, and related systems, methods, and devices
US11158488B2 (en) * 2019-06-26 2021-10-26 Mks Instruments, Inc. High speed synchronization of plasma source/bias power delivery
US11315757B2 (en) 2019-08-13 2022-04-26 Mks Instruments, Inc. Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications
US10741363B1 (en) * 2019-10-08 2020-08-11 Mks Instruments, Inc. Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching
US11232931B2 (en) 2019-10-21 2022-01-25 Mks Instruments, Inc. Intermodulation distortion mitigation using electronic variable capacitor
US11545943B2 (en) 2020-12-04 2023-01-03 Mks Instruments, Inc. Switched capacitor modulator
JP2023551849A (en) * 2020-12-30 2023-12-13 コメット アーゲー RF signal generation method, controller, RF generator and plasma device
US11715624B2 (en) 2021-08-09 2023-08-01 Mks Instruments, Inc. Adaptive pulse shaping with post match sensor
US11721523B2 (en) 2021-09-07 2023-08-08 Advanced Energy Industries, Inc. Control of rail voltage in multi-level pulsing RF power amplifier
US20230080707A1 (en) * 2021-09-13 2023-03-16 Advanced Energy Industries, Inc. Model reference adaptive control with signum projection tensor operations
US11972926B2 (en) 2021-10-05 2024-04-30 Advanced Energy Industries, Inc. Dynamic control-setpoint modification
US11823869B2 (en) 2021-10-15 2023-11-21 Mks Instruments, Inc. Impedance matching in a RF power generation system
US11990324B2 (en) 2022-03-03 2024-05-21 Advanced Energy Industries, Inc. Adaptive predictive control system

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Also Published As

Publication number Publication date
EP3876259A1 (en) 2021-09-08
EP3561852A1 (en) 2019-10-30
KR101965251B1 (en) 2019-04-03
JP2018504869A (en) 2018-02-15
KR102151584B1 (en) 2020-09-03
CN110299277A (en) 2019-10-01
US20210013007A1 (en) 2021-01-14
JP6454417B2 (en) 2019-01-16
CN110299277B (en) 2021-12-31
US10217609B2 (en) 2019-02-26
WO2016089992A1 (en) 2016-06-09
KR20190037358A (en) 2019-04-05
US10049857B2 (en) 2018-08-14
EP3227903A1 (en) 2017-10-11
EP3227903A4 (en) 2018-04-25
EP3561852B1 (en) 2021-03-31
US10727027B2 (en) 2020-07-28
US20180294141A1 (en) 2018-10-11
KR102265722B1 (en) 2021-06-16
US11367592B2 (en) 2022-06-21
CN107004559B (en) 2019-07-05
US20190214231A1 (en) 2019-07-11
EP3227903B1 (en) 2019-05-15
KR20200104940A (en) 2020-09-04
US20160163514A1 (en) 2016-06-09
CN107004559A (en) 2017-08-01
KR20170093109A (en) 2017-08-14
SG10202002400WA (en) 2020-05-28

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