SG10201705433VA - X-Ray Back Scattering For Inspection Of Part - Google Patents

X-Ray Back Scattering For Inspection Of Part

Info

Publication number
SG10201705433VA
SG10201705433VA SG10201705433VA SG10201705433VA SG10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA
Authority
SG
Singapore
Prior art keywords
inspection
back scattering
ray back
ray
scattering
Prior art date
Application number
SG10201705433VA
Other languages
English (en)
Inventor
Safai Morteza
Original Assignee
Boeing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boeing Co filed Critical Boeing Co
Publication of SG10201705433VA publication Critical patent/SG10201705433VA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203Measuring back scattering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06Cathodes
    • H01J35/065Field emission, photo emission or secondary emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/112Non-rotating anodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G1/00X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02Constructional details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/05Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/053Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SG10201705433VA 2016-09-14 2017-06-30 X-Ray Back Scattering For Inspection Of Part SG10201705433VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15/264,845 US10541102B2 (en) 2016-09-14 2016-09-14 X-ray back scattering for inspection of part

Publications (1)

Publication Number Publication Date
SG10201705433VA true SG10201705433VA (en) 2018-04-27

Family

ID=59021295

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201705433VA SG10201705433VA (en) 2016-09-14 2017-06-30 X-Ray Back Scattering For Inspection Of Part

Country Status (5)

Country Link
US (1) US10541102B2 (ja)
EP (1) EP3297407B1 (ja)
JP (2) JP2018059911A (ja)
CN (1) CN107817257A (ja)
SG (1) SG10201705433VA (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10908100B2 (en) * 2018-09-24 2021-02-02 The Boeing Company Flexible aperture x-ray inspection
KR20200037733A (ko) * 2018-10-01 2020-04-09 사이언타 오미크론 악티에볼라그 경질 x-선 광전자 분광 장치 및 시스템
CN109350097B (zh) * 2018-12-17 2021-11-05 深圳先进技术研究院 X射线源阵列、x射线断层扫描系统和方法
US11293884B2 (en) * 2020-01-07 2022-04-05 The Boeing Company Multi source backscattering

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JP2001208705A (ja) * 2000-01-27 2001-08-03 Mitsubishi Heavy Ind Ltd 散乱x線式欠陥検出装置及びx線検出装置
JP4152297B2 (ja) 2003-10-28 2008-09-17 ポーラ化成工業株式会社 被覆粉体を含有するオイルゲル化粧料及びその製造法
US7042982B2 (en) * 2003-11-19 2006-05-09 Lucent Technologies Inc. Focusable and steerable micro-miniature x-ray apparatus
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US20090072150A1 (en) * 2006-04-20 2009-03-19 Trissel Richard G Scintillator-based micro-radiographic imaging device
US7414245B2 (en) * 2006-04-20 2008-08-19 Trissel Richard G Scintillator-based micro-radiographic imaging device
JP2008256587A (ja) * 2007-04-06 2008-10-23 Toshiba Corp X線検査装置およびx線検査方法
JP2008268105A (ja) * 2007-04-24 2008-11-06 Toshiba Corp X線ビーム源、x線ビーム照射装置、x線ビーム透過撮影装置、x線ビームct装置、x線元素マッピング検査装置及びx線ビーム形成方法
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WO2012015053A1 (ja) * 2010-07-30 2012-02-02 株式会社リガク X線回折方法及びその装置
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US8761338B2 (en) * 2011-06-20 2014-06-24 The Boeing Company Integrated backscatter X-ray system
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Also Published As

Publication number Publication date
US20180076000A1 (en) 2018-03-15
EP3297407A1 (en) 2018-03-21
EP3297407B1 (en) 2024-09-25
US10541102B2 (en) 2020-01-21
JP7440671B2 (ja) 2024-02-28
JP2023040235A (ja) 2023-03-22
JP2018059911A (ja) 2018-04-12
CN107817257A (zh) 2018-03-20

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