SG10201705433VA - X-Ray Back Scattering For Inspection Of Part - Google Patents
X-Ray Back Scattering For Inspection Of PartInfo
- Publication number
- SG10201705433VA SG10201705433VA SG10201705433VA SG10201705433VA SG10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA SG 10201705433V A SG10201705433V A SG 10201705433VA
- Authority
- SG
- Singapore
- Prior art keywords
- inspection
- back scattering
- ray back
- ray
- scattering
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/06—Cathodes
- H01J35/065—Field emission, photo emission or secondary emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
- H05G1/02—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/264,845 US10541102B2 (en) | 2016-09-14 | 2016-09-14 | X-ray back scattering for inspection of part |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201705433VA true SG10201705433VA (en) | 2018-04-27 |
Family
ID=59021295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201705433VA SG10201705433VA (en) | 2016-09-14 | 2017-06-30 | X-Ray Back Scattering For Inspection Of Part |
Country Status (5)
Country | Link |
---|---|
US (1) | US10541102B2 (ja) |
EP (1) | EP3297407B1 (ja) |
JP (2) | JP2018059911A (ja) |
CN (1) | CN107817257A (ja) |
SG (1) | SG10201705433VA (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10908100B2 (en) * | 2018-09-24 | 2021-02-02 | The Boeing Company | Flexible aperture x-ray inspection |
KR20200037733A (ko) * | 2018-10-01 | 2020-04-09 | 사이언타 오미크론 악티에볼라그 | 경질 x-선 광전자 분광 장치 및 시스템 |
CN109350097B (zh) * | 2018-12-17 | 2021-11-05 | 深圳先进技术研究院 | X射线源阵列、x射线断层扫描系统和方法 |
US11293884B2 (en) * | 2020-01-07 | 2022-04-05 | The Boeing Company | Multi source backscattering |
Family Cites Families (35)
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US3801785A (en) * | 1972-11-01 | 1974-04-02 | Raytheon Co | Spatially modulated imaging system |
US5199057A (en) * | 1989-08-09 | 1993-03-30 | Nikon Corporation | Image formation-type soft X-ray microscopic apparatus |
JPH04152297A (ja) * | 1990-10-16 | 1992-05-26 | Nikon Corp | X線回折素子 |
US6128364A (en) * | 1996-01-10 | 2000-10-03 | Leica Microsystems Lithography Gmbh | Condenser-monochromator arrangement for X-radiation |
JPH10185842A (ja) * | 1996-12-20 | 1998-07-14 | Toshiba Fa Syst Eng Kk | X線検査装置 |
JP2001208705A (ja) * | 2000-01-27 | 2001-08-03 | Mitsubishi Heavy Ind Ltd | 散乱x線式欠陥検出装置及びx線検出装置 |
JP4152297B2 (ja) | 2003-10-28 | 2008-09-17 | ポーラ化成工業株式会社 | 被覆粉体を含有するオイルゲル化粧料及びその製造法 |
US7042982B2 (en) * | 2003-11-19 | 2006-05-09 | Lucent Technologies Inc. | Focusable and steerable micro-miniature x-ray apparatus |
US7095822B1 (en) * | 2004-07-28 | 2006-08-22 | Xradia, Inc. | Near-field X-ray fluorescence microprobe |
DE102004052350B4 (de) | 2004-10-28 | 2008-01-10 | Bruker Axs B.V. | Röntgendiffraktometer mit Wechselapertur |
WO2006115114A1 (ja) * | 2005-04-20 | 2006-11-02 | Kyoto Institute Of Technology | フレネルゾーンプレート及び該フレネルゾーンプレートを使用したx線顕微鏡 |
US7280293B2 (en) * | 2005-07-18 | 2007-10-09 | International Business Machines Corporation | Multi-level mapping of tape error recoveries |
US7809104B2 (en) | 2005-11-11 | 2010-10-05 | L-3 Communications Security and Detection Systems Inc. | Imaging system with long-standoff capability |
US20090072150A1 (en) * | 2006-04-20 | 2009-03-19 | Trissel Richard G | Scintillator-based micro-radiographic imaging device |
US7414245B2 (en) * | 2006-04-20 | 2008-08-19 | Trissel Richard G | Scintillator-based micro-radiographic imaging device |
JP2008256587A (ja) * | 2007-04-06 | 2008-10-23 | Toshiba Corp | X線検査装置およびx線検査方法 |
JP2008268105A (ja) * | 2007-04-24 | 2008-11-06 | Toshiba Corp | X線ビーム源、x線ビーム照射装置、x線ビーム透過撮影装置、x線ビームct装置、x線元素マッピング検査装置及びx線ビーム形成方法 |
US7593510B2 (en) | 2007-10-23 | 2009-09-22 | American Science And Engineering, Inc. | X-ray imaging with continuously variable zoom and lateral relative displacement of the source |
WO2012015053A1 (ja) * | 2010-07-30 | 2012-02-02 | 株式会社リガク | X線回折方法及びその装置 |
WO2012058207A2 (en) | 2010-10-27 | 2012-05-03 | American Science And Engineering, Inc. | Versatile x-ray beam scanner |
US8761338B2 (en) * | 2011-06-20 | 2014-06-24 | The Boeing Company | Integrated backscatter X-ray system |
US9151721B2 (en) | 2011-06-20 | 2015-10-06 | The Boeing Company | Integrated backscatter X-ray system |
WO2013022515A1 (en) * | 2011-08-06 | 2013-02-14 | Rigaku Innovative Technologies, Inc. | Nanotube based device for guiding x-ray photons and neutrons |
CN103021496B (zh) * | 2011-09-24 | 2015-10-21 | 同济大学 | 硬X射线微聚焦高级次多层膜Laue透镜 |
US8855268B1 (en) | 2011-11-01 | 2014-10-07 | The Boeing Company | System for inspecting objects underwater |
JP6096419B2 (ja) | 2012-04-12 | 2017-03-15 | 株式会社堀場製作所 | X線検出装置 |
US8879688B2 (en) * | 2012-05-22 | 2014-11-04 | The Boeing Company | Reconfigurable detector system |
US9128030B1 (en) * | 2013-03-06 | 2015-09-08 | The Boeing Company | X-ray backscattering battery inspection |
US9543109B2 (en) * | 2013-09-19 | 2017-01-10 | Sigray, Inc. | X-ray sources using linear accumulation |
CN103559927B (zh) * | 2013-11-21 | 2016-03-30 | 中国科学院高能物理研究所 | 一种消球差硬x射线聚焦光学元件及其设计方法 |
US9529126B2 (en) * | 2014-01-09 | 2016-12-27 | Wisconsin Alumni Research Foundation | Fresnel zone plate |
US9305344B2 (en) | 2014-04-22 | 2016-04-05 | The Boeing Company | Method for improving linear feature detectability in digital images |
FR3025938B1 (fr) * | 2014-09-17 | 2018-05-25 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Realisation d'espaceurs au niveau de flancs d'une grille de transistor |
US9739727B2 (en) | 2015-01-21 | 2017-08-22 | The Boeing Company | Systems and methods for aligning an aperture |
US10656304B2 (en) | 2015-09-10 | 2020-05-19 | American Science And Engineering, Inc. | Backscatter characterization using interlinearly adaptive electromagnetic X-ray scanning |
-
2016
- 2016-09-14 US US15/264,845 patent/US10541102B2/en active Active
-
2017
- 2017-06-01 EP EP17173861.0A patent/EP3297407B1/en active Active
- 2017-06-30 SG SG10201705433VA patent/SG10201705433VA/en unknown
- 2017-07-27 CN CN201710621462.9A patent/CN107817257A/zh active Pending
- 2017-09-06 JP JP2017171142A patent/JP2018059911A/ja active Pending
-
2023
- 2023-01-12 JP JP2023003360A patent/JP7440671B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20180076000A1 (en) | 2018-03-15 |
EP3297407A1 (en) | 2018-03-21 |
EP3297407B1 (en) | 2024-09-25 |
US10541102B2 (en) | 2020-01-21 |
JP7440671B2 (ja) | 2024-02-28 |
JP2023040235A (ja) | 2023-03-22 |
JP2018059911A (ja) | 2018-04-12 |
CN107817257A (zh) | 2018-03-20 |
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