SG10201602315RA - Method of dividing wafer - Google Patents
Method of dividing waferInfo
- Publication number
- SG10201602315RA SG10201602315RA SG10201602315RA SG10201602315RA SG10201602315RA SG 10201602315R A SG10201602315R A SG 10201602315RA SG 10201602315R A SG10201602315R A SG 10201602315RA SG 10201602315R A SG10201602315R A SG 10201602315RA SG 10201602315R A SG10201602315R A SG 10201602315RA
- Authority
- SG
- Singapore
- Prior art keywords
- dividing wafer
- wafer
- dividing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015071638A JP2016192494A (en) | 2015-03-31 | 2015-03-31 | Wafer dividing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201602315RA true SG10201602315RA (en) | 2016-10-28 |
Family
ID=57015567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201602315RA SG10201602315RA (en) | 2015-03-31 | 2016-03-24 | Method of dividing wafer |
Country Status (5)
Country | Link |
---|---|
US (1) | US9653366B2 (en) |
JP (1) | JP2016192494A (en) |
CN (1) | CN106024709B (en) |
MY (1) | MY176318A (en) |
SG (1) | SG10201602315RA (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6964945B2 (en) * | 2018-01-05 | 2021-11-10 | 株式会社ディスコ | Processing method |
JP6968501B2 (en) * | 2018-01-26 | 2021-11-17 | 株式会社ディスコ | How to set up the cutting equipment |
JP6748891B2 (en) * | 2018-02-08 | 2020-09-02 | 株式会社東京精密 | Dicing device and dicing method |
JP7001493B2 (en) * | 2018-02-26 | 2022-01-19 | 株式会社ディスコ | Captured image formation unit |
JP2019202356A (en) * | 2018-05-21 | 2019-11-28 | 株式会社ディスコ | Processing method for work piece |
JP2020038912A (en) * | 2018-09-05 | 2020-03-12 | 株式会社ディスコ | Wafer recognition method |
JP7368098B2 (en) * | 2019-04-17 | 2023-10-24 | 株式会社ディスコ | Wafer processing method |
JP7300938B2 (en) | 2019-09-02 | 2023-06-30 | 株式会社ディスコ | Kerf recognition method |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0917752A (en) * | 1995-06-28 | 1997-01-17 | Sony Corp | Method and apparatus for cutting of flat object |
JPH1110481A (en) * | 1997-06-17 | 1999-01-19 | Disco Abrasive Syst Ltd | Cutting device with workpiece thickness measuring means and cutting method for workpiece |
JP4394210B2 (en) * | 1999-09-08 | 2010-01-06 | 株式会社ディスコ | Cutting method |
US7022546B2 (en) * | 2000-12-05 | 2006-04-04 | Analog Devices, Inc. | Method and device for protecting micro electromechanical systems structures during dicing of a wafer |
JP2002329965A (en) * | 2001-05-07 | 2002-11-15 | New Create Kk | Method and device for manufacturing thin film laminate |
JP4549654B2 (en) | 2003-11-04 | 2010-09-22 | 株式会社ディスコ | Cutting blade setup method |
JP2005203540A (en) * | 2004-01-15 | 2005-07-28 | Disco Abrasive Syst Ltd | Method for cutting wafer |
JP2009010178A (en) * | 2007-06-28 | 2009-01-15 | Disco Abrasive Syst Ltd | Method of processing wafer |
JP5340808B2 (en) * | 2009-05-21 | 2013-11-13 | 株式会社ディスコ | Laser processing method of semiconductor wafer |
JP5389604B2 (en) | 2009-10-20 | 2014-01-15 | 株式会社ディスコ | Method for managing consumption of cutting blade in cutting apparatus |
JP5645593B2 (en) * | 2010-10-21 | 2014-12-24 | 株式会社ディスコ | Wafer division method |
JP5717575B2 (en) | 2011-07-28 | 2015-05-13 | 株式会社ディスコ | Cutting blade outer diameter size detection method |
JP5858684B2 (en) * | 2011-08-15 | 2016-02-10 | 株式会社ディスコ | Cutting method |
JP6078272B2 (en) * | 2012-09-10 | 2017-02-08 | 株式会社ディスコ | Wafer processing method |
JP6039512B2 (en) * | 2013-07-18 | 2016-12-07 | Towa株式会社 | Cutting apparatus and method for manufacturing electronic parts |
JP2016001677A (en) * | 2014-06-12 | 2016-01-07 | 株式会社ディスコ | Wafer processing method |
JP6328513B2 (en) * | 2014-07-28 | 2018-05-23 | 株式会社ディスコ | Wafer processing method |
-
2015
- 2015-03-31 JP JP2015071638A patent/JP2016192494A/en active Pending
-
2016
- 2016-03-21 MY MYPI2016701003A patent/MY176318A/en unknown
- 2016-03-22 CN CN201610164246.1A patent/CN106024709B/en active Active
- 2016-03-24 SG SG10201602315RA patent/SG10201602315RA/en unknown
- 2016-03-25 US US15/080,919 patent/US9653366B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN106024709B (en) | 2021-05-07 |
CN106024709A (en) | 2016-10-12 |
US9653366B2 (en) | 2017-05-16 |
JP2016192494A (en) | 2016-11-10 |
MY176318A (en) | 2020-07-28 |
US20160293501A1 (en) | 2016-10-06 |
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