SG10201506936WA - Wafer processing method - Google Patents

Wafer processing method

Info

Publication number
SG10201506936WA
SG10201506936WA SG10201506936WA SG10201506936WA SG10201506936WA SG 10201506936W A SG10201506936W A SG 10201506936WA SG 10201506936W A SG10201506936W A SG 10201506936WA SG 10201506936W A SG10201506936W A SG 10201506936WA SG 10201506936W A SG10201506936W A SG 10201506936WA
Authority
SG
Singapore
Prior art keywords
processing method
wafer processing
wafer
processing
Prior art date
Application number
SG10201506936WA
Other languages
English (en)
Inventor
Nakamura Marsaru
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201506936WA publication Critical patent/SG10201506936WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68377—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support with parts of the auxiliary support remaining in the finished device

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Dicing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
SG10201506936WA 2014-09-18 2015-09-01 Wafer processing method SG10201506936WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014189619A JP2016063060A (ja) 2014-09-18 2014-09-18 ウエーハの加工方法

Publications (1)

Publication Number Publication Date
SG10201506936WA true SG10201506936WA (en) 2016-04-28

Family

ID=55526431

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201506936WA SG10201506936WA (en) 2014-09-18 2015-09-01 Wafer processing method

Country Status (6)

Country Link
US (1) US9490171B2 (zh)
JP (1) JP2016063060A (zh)
KR (1) KR20160033631A (zh)
CN (1) CN105448827A (zh)
SG (1) SG10201506936WA (zh)
TW (1) TWI653678B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113290484B (zh) * 2018-02-08 2023-04-25 株式会社东京精密 切割装置、切割方法以及切割带
JP7019254B2 (ja) * 2018-04-10 2022-02-15 株式会社ディスコ 被加工物の切削方法
JP2020009872A (ja) * 2018-07-06 2020-01-16 株式会社ディスコ ウェーハの加工方法
JP2020009876A (ja) * 2018-07-06 2020-01-16 株式会社ディスコ ウェーハの加工方法
JP7139047B2 (ja) * 2018-07-06 2022-09-20 株式会社ディスコ ウェーハの加工方法
JP2020043115A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043114A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043117A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043145A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043144A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043143A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP2020043116A (ja) * 2018-09-06 2020-03-19 株式会社ディスコ ウェーハの加工方法
JP7154698B2 (ja) * 2018-09-06 2022-10-18 株式会社ディスコ ウェーハの加工方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4800694B2 (ja) * 2005-07-26 2011-10-26 日東電工株式会社 ダイシング・ダイボンドフィルム
CN101512742B (zh) * 2006-09-27 2011-10-19 富士通半导体股份有限公司 半导体器件的制造方法
JP2009028810A (ja) 2007-07-24 2009-02-12 Disco Abrasive Syst Ltd 切削方法及び切削装置
US20110018127A1 (en) * 2008-03-31 2011-01-27 Byoungchul Lee Multilayer UV-Curable Adhesive Film
KR20110010601A (ko) * 2008-03-31 2011-02-01 헨켈 코포레이션 다중층 ｕｖ-경화성 접착 필름
JP2011035075A (ja) * 2009-07-30 2011-02-17 Sumitomo Bakelite Co Ltd 半導体用フィルムの製造方法および半導体用フィルム
JP2011187571A (ja) * 2010-03-05 2011-09-22 Nitto Denko Corp ダイシング・ダイボンドフィルム
JP2012060037A (ja) * 2010-09-10 2012-03-22 Sumitomo Bakelite Co Ltd 半導体用フィルム、半導体ウエハーの個片化方法および半導体装置の製造方法

Also Published As

Publication number Publication date
US9490171B2 (en) 2016-11-08
JP2016063060A (ja) 2016-04-25
US20160086853A1 (en) 2016-03-24
KR20160033631A (ko) 2016-03-28
TWI653678B (zh) 2019-03-11
CN105448827A (zh) 2016-03-30
TW201614723A (en) 2016-04-16

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