SG10201400557WA - Chemical mechanical planarization for tungsten-containing substrates - Google Patents
Chemical mechanical planarization for tungsten-containing substratesInfo
- Publication number
- SG10201400557WA SG10201400557WA SG10201400557WA SG10201400557WA SG10201400557WA SG 10201400557W A SG10201400557W A SG 10201400557WA SG 10201400557W A SG10201400557W A SG 10201400557WA SG 10201400557W A SG10201400557W A SG 10201400557WA SG 10201400557W A SG10201400557W A SG 10201400557WA
- Authority
- SG
- Singapore
- Prior art keywords
- tungsten
- chemical mechanical
- mechanical planarization
- containing substrates
- substrates
- Prior art date
Links
- 239000000126 substance Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 title 1
- 229910052721 tungsten Inorganic materials 0.000 title 1
- 239000010937 tungsten Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Cosmetics (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361777165P | 2013-03-12 | 2013-03-12 | |
US14/142,087 US20140273458A1 (en) | 2013-03-12 | 2013-12-27 | Chemical Mechanical Planarization for Tungsten-Containing Substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201400557WA true SG10201400557WA (en) | 2014-10-30 |
Family
ID=50238282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201400557WA SG10201400557WA (en) | 2013-03-12 | 2014-03-11 | Chemical mechanical planarization for tungsten-containing substrates |
Country Status (8)
Country | Link |
---|---|
US (1) | US20140273458A1 (en) |
EP (1) | EP2779217A2 (en) |
JP (1) | JP2014194016A (en) |
KR (1) | KR20140111992A (en) |
CN (1) | CN104046246B (en) |
IL (1) | IL231408A0 (en) |
SG (1) | SG10201400557WA (en) |
TW (1) | TWI503407B (en) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8999193B2 (en) * | 2012-05-10 | 2015-04-07 | Air Products And Chemicals, Inc. | Chemical mechanical polishing composition having chemical additives and methods for using same |
US9238754B2 (en) * | 2014-03-11 | 2016-01-19 | Cabot Microelectronics Corporation | Composition for tungsten CMP |
KR102390630B1 (en) * | 2014-03-12 | 2022-04-26 | 씨엠씨 머티리얼즈, 인코포레이티드 | Compositions and methods for cmp of tungsten materials |
CN104371649B (en) * | 2014-09-28 | 2017-05-10 | 顾泉 | Chemical-mechanical polishing composition |
US20160122590A1 (en) * | 2014-10-31 | 2016-05-05 | Air Products And Chemicals, Inc. | Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor |
CN104513627B (en) * | 2014-12-22 | 2017-04-05 | 深圳市力合材料有限公司 | A kind of integrated circuit copper CMP composition and preparation method thereof |
US10570313B2 (en) | 2015-02-12 | 2020-02-25 | Versum Materials Us, Llc | Dishing reducing in tungsten chemical mechanical polishing |
US10032644B2 (en) | 2015-06-05 | 2018-07-24 | Versum Materials Us, Llc | Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives |
JP6663033B2 (en) | 2016-03-01 | 2020-03-11 | ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド | Method for chemical mechanical polishing of substrate |
TWI601198B (en) * | 2016-03-01 | 2017-10-01 | 羅門哈斯電子材料Cmp控股公司 | Method of chemical mechanical polishing a substrate |
KR101816795B1 (en) | 2016-06-30 | 2018-01-10 | 한국화학연구원 | Novel tertiary amine-based polyol and preparation method of polyurethane using the same autocatalysts |
WO2018147148A1 (en) * | 2017-02-08 | 2018-08-16 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP6508501B1 (en) * | 2017-08-03 | 2019-05-08 | Jsr株式会社 | Semiconductor processing composition and processing method |
JP6784798B2 (en) * | 2018-06-01 | 2020-11-11 | ケーシーテック カンパニー リミテッド | Slurry composition for polishing |
US11066575B2 (en) * | 2018-09-06 | 2021-07-20 | Versum Materials Us, Llc | Chemical mechanical planarization for tungsten-containing substrates |
JP7088797B2 (en) * | 2018-09-25 | 2022-06-21 | 株式会社フジミインコーポレーテッド | Tungsten dissolution inhibitor, and polishing composition and surface treatment composition using it. |
CN111378366B (en) * | 2018-12-27 | 2022-11-18 | 安集微电子(上海)有限公司 | Chemical mechanical polishing solution and application thereof |
CN111378379B (en) * | 2018-12-29 | 2022-08-05 | 安集微电子(上海)有限公司 | Chemical mechanical polishing solution and application thereof |
CN111378377A (en) * | 2018-12-29 | 2020-07-07 | 安集微电子(上海)有限公司 | Chemical mechanical polishing solution and application thereof |
US10676647B1 (en) | 2018-12-31 | 2020-06-09 | Cabot Microelectronics Corporation | Composition for tungsten CMP |
CN114433159A (en) * | 2020-10-31 | 2022-05-06 | 华为技术有限公司 | Composite catalyst for chemical mechanical planarization, preparation method thereof and polishing solution |
CN114806414B (en) * | 2022-05-05 | 2023-07-11 | 万华化学集团电子材料有限公司 | Silicon polishing composition, preparation method and application thereof |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4789648A (en) | 1985-10-28 | 1988-12-06 | International Business Machines Corporation | Method for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud vias |
US5340370A (en) * | 1993-11-03 | 1994-08-23 | Intel Corporation | Slurries for chemical mechanical polishing |
US6083419A (en) * | 1997-07-28 | 2000-07-04 | Cabot Corporation | Polishing composition including an inhibitor of tungsten etching |
AU6379500A (en) * | 1999-08-13 | 2001-03-13 | Cabot Microelectronics Corporation | Chemical mechanical polishing systems and methods for their use |
KR20010035668A (en) * | 1999-10-01 | 2001-05-07 | 윤종용 | Slurries for Chemical Mechanical Polishing of metal layer and CMP Method using the slurry |
US7316603B2 (en) * | 2002-01-22 | 2008-01-08 | Cabot Microelectronics Corporation | Compositions and methods for tantalum CMP |
US20030139047A1 (en) * | 2002-01-24 | 2003-07-24 | Thomas Terence M. | Metal polishing slurry having a static etch inhibitor and method of formulation |
US7513920B2 (en) * | 2002-02-11 | 2009-04-07 | Dupont Air Products Nanomaterials Llc | Free radical-forming activator attached to solid and used to enhance CMP formulations |
US20030162398A1 (en) | 2002-02-11 | 2003-08-28 | Small Robert J. | Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
GB2393186B (en) * | 2002-07-31 | 2006-02-22 | Kao Corp | Polishing composition |
US6803353B2 (en) * | 2002-11-12 | 2004-10-12 | Atofina Chemicals, Inc. | Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents |
US20050211952A1 (en) * | 2004-03-29 | 2005-09-29 | Timothy Mace | Compositions and methods for chemical mechanical planarization of tungsten and titanium |
JP5164129B2 (en) * | 2004-03-29 | 2013-03-13 | ニッタ・ハース株式会社 | Semiconductor polishing composition |
JP2007536566A (en) * | 2004-05-07 | 2007-12-13 | ドウジン セミケム カンパニー リミテッド | (Photo) Composition for resist removal |
CN101180379B (en) * | 2005-03-25 | 2013-07-24 | 气体产品与化学公司 | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers |
US7732393B2 (en) * | 2006-03-20 | 2010-06-08 | Cabot Microelectronics Corporation | Oxidation-stabilized CMP compositions and methods |
KR101094662B1 (en) * | 2008-07-24 | 2011-12-20 | 솔브레인 주식회사 | Chemical mechanical polishing composition including a stopping agent of poly-silicon polishing |
JP5858597B2 (en) * | 2010-01-29 | 2016-02-10 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | Cleaning agent for tungsten wiring semiconductor |
US8858819B2 (en) * | 2010-02-15 | 2014-10-14 | Air Products And Chemicals, Inc. | Method for chemical mechanical planarization of a tungsten-containing substrate |
US20130183889A1 (en) * | 2010-09-24 | 2013-07-18 | Kao Corporation | Process for producing polishing liquid composition |
US8906123B2 (en) * | 2010-12-29 | 2014-12-09 | Air Products And Chemicals Inc. | CMP slurry/method for polishing ruthenium and other films |
WO2012141111A1 (en) * | 2011-04-11 | 2012-10-18 | 旭硝子株式会社 | Polishing agent and polishing method |
-
2013
- 2013-12-27 US US14/142,087 patent/US20140273458A1/en not_active Abandoned
-
2014
- 2014-03-07 TW TW103107964A patent/TWI503407B/en not_active IP Right Cessation
- 2014-03-09 IL IL231408A patent/IL231408A0/en unknown
- 2014-03-11 SG SG10201400557WA patent/SG10201400557WA/en unknown
- 2014-03-11 EP EP14158825.1A patent/EP2779217A2/en not_active Withdrawn
- 2014-03-12 CN CN201410265586.4A patent/CN104046246B/en not_active Expired - Fee Related
- 2014-03-12 JP JP2014049128A patent/JP2014194016A/en active Pending
- 2014-03-12 KR KR1020140029018A patent/KR20140111992A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TWI503407B (en) | 2015-10-11 |
CN104046246B (en) | 2016-06-15 |
IL231408A0 (en) | 2014-08-31 |
JP2014194016A (en) | 2014-10-09 |
EP2779217A2 (en) | 2014-09-17 |
TW201435073A (en) | 2014-09-16 |
CN104046246A (en) | 2014-09-17 |
KR20140111992A (en) | 2014-09-22 |
US20140273458A1 (en) | 2014-09-18 |
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