SE9602658D0 - Förfarande och anordning för bestämning av skikttjocklekar - Google Patents

Förfarande och anordning för bestämning av skikttjocklekar

Info

Publication number
SE9602658D0
SE9602658D0 SE9602658A SE9602658A SE9602658D0 SE 9602658 D0 SE9602658 D0 SE 9602658D0 SE 9602658 A SE9602658 A SE 9602658A SE 9602658 A SE9602658 A SE 9602658A SE 9602658 D0 SE9602658 D0 SE 9602658D0
Authority
SE
Sweden
Prior art keywords
layers
substrate
alternating field
layer thicknesses
determining layer
Prior art date
Application number
SE9602658A
Other languages
English (en)
Other versions
SE508354C2 (sv
SE9602658L (sv
Inventor
Pascal Jourdain
Lars Hallstadius
Hans-Urs Zwicky
Kurt-Aake Magnusson
Gerhard Bart
Original Assignee
Asea Atom Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asea Atom Ab filed Critical Asea Atom Ab
Priority to SE9602658A priority Critical patent/SE508354C2/sv
Publication of SE9602658D0 publication Critical patent/SE9602658D0/sv
Priority to US08/679,624 priority patent/US5889401A/en
Priority to DE19628220A priority patent/DE19628220B4/de
Publication of SE9602658L publication Critical patent/SE9602658L/sv
Publication of SE508354C2 publication Critical patent/SE508354C2/sv

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21CNUCLEAR REACTORS
    • G21C17/00Monitoring; Testing ; Maintaining
    • G21C17/06Devices or arrangements for monitoring or testing fuel or fuel elements outside the reactor core, e.g. for burn-up, for contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/10Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
    • G01B7/105Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/30Nuclear fission reactors
SE9602658A 1996-07-05 1996-07-05 Förfarande och anordning för bestämning av skikttjocklek SE508354C2 (sv)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE9602658A SE508354C2 (sv) 1996-07-05 1996-07-05 Förfarande och anordning för bestämning av skikttjocklek
US08/679,624 US5889401A (en) 1996-07-05 1996-07-12 Method and apparatus for determining the thickness of several layers superimposed on a substrate
DE19628220A DE19628220B4 (de) 1996-07-05 1996-07-15 Verfahren und Vorrichtung zur Bestimmung der Dicke einer oder mehrerer übereinanderliegender Schichten auf einem Substrat

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE9602658A SE508354C2 (sv) 1996-07-05 1996-07-05 Förfarande och anordning för bestämning av skikttjocklek
US08/679,624 US5889401A (en) 1996-07-05 1996-07-12 Method and apparatus for determining the thickness of several layers superimposed on a substrate
DE19628220A DE19628220B4 (de) 1996-07-05 1996-07-15 Verfahren und Vorrichtung zur Bestimmung der Dicke einer oder mehrerer übereinanderliegender Schichten auf einem Substrat

Publications (3)

Publication Number Publication Date
SE9602658D0 true SE9602658D0 (sv) 1996-07-05
SE9602658L SE9602658L (sv) 1998-01-06
SE508354C2 SE508354C2 (sv) 1998-09-28

Family

ID=27216458

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9602658A SE508354C2 (sv) 1996-07-05 1996-07-05 Förfarande och anordning för bestämning av skikttjocklek

Country Status (3)

Country Link
US (1) US5889401A (sv)
DE (1) DE19628220B4 (sv)
SE (1) SE508354C2 (sv)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE515544C2 (sv) * 1998-11-26 2001-08-27 Westinghouse Atom Ab Förfarande och anordning för bestämning av hydridinnehåll
JP2002533659A (ja) 1998-12-18 2002-10-08 マイクロ−エプシロン・メステヒニク・ゲーエムベーハー・ウント・コンパニー・カー・ゲー 渦電流センサの作動方法及び渦電流センサ
DE19860487A1 (de) * 1998-12-28 2000-07-06 Siemens Ag Verfahren und Vorrichtung zur räumlichen Vermessung einer Inhomogenität an einer Oberfläche eines Kernreaktorbauteils und Anwendung des Verfahrens zur Vermessung einer elektrisch praktisch nicht leitenden Schicht
BR0009183A (pt) * 1999-03-22 2003-03-05 Inductive Signature Tech Inc Referência de portador modulado por permeabilidade
US6366083B1 (en) * 1999-09-17 2002-04-02 Framatome Anp Inc. Method for measuring the thickness of oxide layer underlying crud layer containing ferromagnetic material on nuclear fuel rods
US6369566B1 (en) * 1999-09-27 2002-04-09 Framatone Anp Inc. Method for measuring crud thickness on nuclear fuel rods
DE19951015C1 (de) * 1999-10-22 2001-01-25 Bosch Gmbh Robert Verfahren zur Charakterisierung von Metallelektroden keramischer Sensorelemente
DE10001516B4 (de) * 2000-01-15 2014-05-08 Alstom Technology Ltd. Zerstörungsfreies Verfahren zur Bestimmung der Schichtdicke einer metallischen Schutzschicht auf einem metallischen Grundmaterial
US7374477B2 (en) * 2002-02-06 2008-05-20 Applied Materials, Inc. Polishing pads useful for endpoint detection in chemical mechanical polishing
US6924641B1 (en) * 2000-05-19 2005-08-02 Applied Materials, Inc. Method and apparatus for monitoring a metal layer during chemical mechanical polishing
GB0016591D0 (en) * 2000-07-06 2000-08-23 Elcometer Instr Ltd Dual mode coating thickness measuring instrument
US6593737B2 (en) * 2000-08-24 2003-07-15 Shell Oil Company Method for measuring the wall thickness of an electrically conductive object
EP1373880A2 (de) * 2001-03-16 2004-01-02 Siemens Aktiengesellschaft Verfahren zur zerstörungsfreien prüfung carbidhaltiger oder in oberflächennähe sulfidierter legierungen
US6608495B2 (en) 2001-03-19 2003-08-19 Applied Materials, Inc. Eddy-optic sensor for object inspection
US6966816B2 (en) * 2001-05-02 2005-11-22 Applied Materials, Inc. Integrated endpoint detection system with optical and eddy current monitoring
US6811466B1 (en) * 2001-12-28 2004-11-02 Applied Materials, Inc. System and method for in-line metal profile measurement
US6937915B1 (en) 2002-03-28 2005-08-30 Lam Research Corporation Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control
DE10222049A1 (de) * 2002-05-17 2003-12-18 Zeiss Carl Laser Optics Gmbh Verfahren und Vorrichtung zum variablen Abschwächen der Intensität eines Lichtstrahls
US7205166B2 (en) * 2002-06-28 2007-04-17 Lam Research Corporation Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties
US6808590B1 (en) 2002-06-28 2004-10-26 Lam Research Corporation Method and apparatus of arrayed sensors for metrological control
US20040011462A1 (en) * 2002-06-28 2004-01-22 Lam Research Corporation Method and apparatus for applying differential removal rates to a surface of a substrate
US7128803B2 (en) * 2002-06-28 2006-10-31 Lam Research Corporation Integration of sensor based metrology into semiconductor processing tools
US6929531B2 (en) 2002-09-19 2005-08-16 Lam Research Corporation System and method for metal residue detection and mapping within a multi-step sequence
US7084621B2 (en) * 2002-09-25 2006-08-01 Lam Research Corporation Enhancement of eddy current based measurement capabilities
US6788050B2 (en) 2002-12-23 2004-09-07 Lam Research Corp. System, method and apparatus for thin-film substrate signal separation using eddy current
US6945845B2 (en) * 2003-03-04 2005-09-20 Applied Materials, Inc. Chemical mechanical polishing apparatus with non-conductive elements
UA60955C2 (en) * 2003-07-25 2006-01-16 Subsidiary Entpr With Foreign Method for contactlessly measuring conductivity of film polymeric electrolyte by a combined transducer
US20050066739A1 (en) * 2003-09-26 2005-03-31 Lam Research Corporation Method and apparatus for wafer mechanical stress monitoring and wafer thermal stress monitoring
US6955588B1 (en) 2004-03-31 2005-10-18 Lam Research Corporation Method of and platen for controlling removal rate characteristics in chemical mechanical planarization
DE102004034081A1 (de) * 2004-07-15 2006-02-09 Robert Bosch Gmbh Verfahren zur berührungsfreien Bestimmung einer Dicke einer Schicht aus elektrisch leitendem Material
US7388369B2 (en) * 2004-11-30 2008-06-17 Electric Power Research Institute, Inc. Method and apparatus for measuring hydrogen concentration in zirconium alloy components in the fuel pool of a nuclear power plant
SE530770C2 (sv) * 2005-08-24 2008-09-09 Westinghouse Electric Sweden System och användning avseende virvelströmsmätningar på komponenter för nukleära reaktorer
DE102006062152B3 (de) * 2006-12-22 2008-05-29 Areva Np Gmbh Verfahren zur Vorbehandlung eines Brennstabhüllrohres für Materialuntersuchungen
US8337278B2 (en) * 2007-09-24 2012-12-25 Applied Materials, Inc. Wafer edge characterization by successive radius measurements
US8309024B2 (en) * 2008-04-23 2012-11-13 Enerize Corporation Methods and systems for non-destructive determination of fluorination of carbon powders
TW201003672A (en) * 2008-06-09 2010-01-16 Westinghouse Electric Sweden Method comprising measurement on fuel channels of fuel assemblies for nuclear boiling water reactors
WO2010147598A1 (en) * 2009-06-19 2010-12-23 Dolphin Measurement Systems, Llc Method and system for measurement of parameters of a flat material
CN102575998B (zh) * 2009-09-22 2016-03-30 Adem有限公司 用于测量固体和液体对象构成的阻抗传感系统及方法
US9528814B2 (en) 2011-05-19 2016-12-27 NeoVision, LLC Apparatus and method of using impedance resonance sensor for thickness measurement
FR2981741B1 (fr) * 2011-10-20 2013-11-29 Messier Bugatti Dowty Procede de mesure d'epaisseur d'une couche de revetement par induction de champs magnetiques
US9465089B2 (en) 2011-12-01 2016-10-11 Neovision Llc NMR spectroscopy device based on resonance type impedance (IR) sensor and method of NMR spectra acquisition
US8952708B2 (en) 2011-12-02 2015-02-10 Neovision Llc Impedance resonance sensor for real time monitoring of different processes and methods of using same
JP5648663B2 (ja) * 2012-09-20 2015-01-07 センサ・システム株式会社 焼入れ硬化層厚さの検査装置及びニッケルめっき皮膜厚さの検査装置
RU2577037C1 (ru) * 2014-12-09 2016-03-10 Открытое акционерное общество Центральный научно-исследовательский институт специального машиностроения Способ вихретокового контроля толщины композитных материалов на неметаллических подложках и устройство для его осуществления
JP6792859B2 (ja) * 2016-08-09 2020-12-02 国立大学法人東京工業大学 解析方法、解析プログラム、および解析装置
FR3062203B1 (fr) * 2017-01-24 2020-11-13 Safran Aircraft Engines Procede de realisation d'un abaque pour la mesure simultanee de l'epaisseur des differentes couches d'un revetement metallique
DE102017129150B4 (de) 2017-12-07 2020-03-05 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Verfahren und Vorrichtung zur Messung der Dicke von nicht magnetisierbaren Schichten auf einem magnetisierbaren Grundwerkstoff
CN114577894B (zh) * 2022-01-14 2023-05-26 湖南凌扬电子科技有限公司 磁性金属底材与非导电涂层间的含金属夹层识别方法及系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303885A (en) * 1979-06-18 1981-12-01 Electric Power Research Institute, Inc. Digitally controlled multifrequency eddy current test apparatus and method
JPS5967405A (ja) * 1982-09-30 1984-04-17 Sumitomo Metal Ind Ltd ライナ厚測定方法
DE3404720A1 (de) * 1984-02-10 1985-08-14 Karl Deutsch Prüf- und Meßgerätebau GmbH + Co KG, 5600 Wuppertal Verfahren und vorrichtung zur schichtdickenmessung
JPS61237052A (ja) * 1985-04-15 1986-10-22 Nippon Telegr & Teleph Corp <Ntt> 亜鉛めつき鋼の腐食寿命診断器
FR2589566A1 (fr) * 1985-11-06 1987-05-07 Cegedur Procede de mesure au defile et sans contact de l'epaisseur et de la temperature de feuilles metalliques minces au moyen de courants de foucault
US5017869A (en) * 1989-12-14 1991-05-21 General Electric Company Swept frequency eddy current system for measuring coating thickness
DE4119903C5 (de) * 1991-06-17 2005-06-30 Immobiliengesellschaft Helmut Fischer Gmbh & Co. Kg Verfahren und Vorrichtung zur Messung dünner Schichten
US5453689A (en) * 1991-12-06 1995-09-26 Massachusetts Institute Of Technology Magnetometer having periodic winding structure and material property estimator
DE4327712C2 (de) * 1993-08-18 1997-07-10 Micro Epsilon Messtechnik Sensoranordnung und Verfahren zum Erfassen von Eigenschaften der Oberflächenschicht eines metallischen Targets

Also Published As

Publication number Publication date
SE508354C2 (sv) 1998-09-28
DE19628220A1 (de) 1998-02-05
US5889401A (en) 1999-03-30
DE19628220B4 (de) 2011-06-16
SE9602658L (sv) 1998-01-06

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