SE9602658D0 - Förfarande och anordning för bestämning av skikttjocklekar - Google Patents
Förfarande och anordning för bestämning av skikttjocklekarInfo
- Publication number
- SE9602658D0 SE9602658D0 SE9602658A SE9602658A SE9602658D0 SE 9602658 D0 SE9602658 D0 SE 9602658D0 SE 9602658 A SE9602658 A SE 9602658A SE 9602658 A SE9602658 A SE 9602658A SE 9602658 D0 SE9602658 D0 SE 9602658D0
- Authority
- SE
- Sweden
- Prior art keywords
- layers
- substrate
- alternating field
- layer thicknesses
- determining layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21C—NUCLEAR REACTORS
- G21C17/00—Monitoring; Testing ; Maintaining
- G21C17/06—Devices or arrangements for monitoring or testing fuel or fuel elements outside the reactor core, e.g. for burn-up, for contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/10—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
- G01B7/105—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9602658A SE508354C2 (sv) | 1996-07-05 | 1996-07-05 | Förfarande och anordning för bestämning av skikttjocklek |
US08/679,624 US5889401A (en) | 1996-07-05 | 1996-07-12 | Method and apparatus for determining the thickness of several layers superimposed on a substrate |
DE19628220A DE19628220B4 (de) | 1996-07-05 | 1996-07-15 | Verfahren und Vorrichtung zur Bestimmung der Dicke einer oder mehrerer übereinanderliegender Schichten auf einem Substrat |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9602658A SE508354C2 (sv) | 1996-07-05 | 1996-07-05 | Förfarande och anordning för bestämning av skikttjocklek |
US08/679,624 US5889401A (en) | 1996-07-05 | 1996-07-12 | Method and apparatus for determining the thickness of several layers superimposed on a substrate |
DE19628220A DE19628220B4 (de) | 1996-07-05 | 1996-07-15 | Verfahren und Vorrichtung zur Bestimmung der Dicke einer oder mehrerer übereinanderliegender Schichten auf einem Substrat |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9602658D0 true SE9602658D0 (sv) | 1996-07-05 |
SE9602658L SE9602658L (sv) | 1998-01-06 |
SE508354C2 SE508354C2 (sv) | 1998-09-28 |
Family
ID=27216458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9602658A SE508354C2 (sv) | 1996-07-05 | 1996-07-05 | Förfarande och anordning för bestämning av skikttjocklek |
Country Status (3)
Country | Link |
---|---|
US (1) | US5889401A (sv) |
DE (1) | DE19628220B4 (sv) |
SE (1) | SE508354C2 (sv) |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE515544C2 (sv) * | 1998-11-26 | 2001-08-27 | Westinghouse Atom Ab | Förfarande och anordning för bestämning av hydridinnehåll |
JP2002533659A (ja) | 1998-12-18 | 2002-10-08 | マイクロ−エプシロン・メステヒニク・ゲーエムベーハー・ウント・コンパニー・カー・ゲー | 渦電流センサの作動方法及び渦電流センサ |
DE19860487A1 (de) * | 1998-12-28 | 2000-07-06 | Siemens Ag | Verfahren und Vorrichtung zur räumlichen Vermessung einer Inhomogenität an einer Oberfläche eines Kernreaktorbauteils und Anwendung des Verfahrens zur Vermessung einer elektrisch praktisch nicht leitenden Schicht |
BR0009183A (pt) * | 1999-03-22 | 2003-03-05 | Inductive Signature Tech Inc | Referência de portador modulado por permeabilidade |
US6366083B1 (en) * | 1999-09-17 | 2002-04-02 | Framatome Anp Inc. | Method for measuring the thickness of oxide layer underlying crud layer containing ferromagnetic material on nuclear fuel rods |
US6369566B1 (en) * | 1999-09-27 | 2002-04-09 | Framatone Anp Inc. | Method for measuring crud thickness on nuclear fuel rods |
DE19951015C1 (de) * | 1999-10-22 | 2001-01-25 | Bosch Gmbh Robert | Verfahren zur Charakterisierung von Metallelektroden keramischer Sensorelemente |
DE10001516B4 (de) * | 2000-01-15 | 2014-05-08 | Alstom Technology Ltd. | Zerstörungsfreies Verfahren zur Bestimmung der Schichtdicke einer metallischen Schutzschicht auf einem metallischen Grundmaterial |
US7374477B2 (en) * | 2002-02-06 | 2008-05-20 | Applied Materials, Inc. | Polishing pads useful for endpoint detection in chemical mechanical polishing |
US6924641B1 (en) * | 2000-05-19 | 2005-08-02 | Applied Materials, Inc. | Method and apparatus for monitoring a metal layer during chemical mechanical polishing |
GB0016591D0 (en) * | 2000-07-06 | 2000-08-23 | Elcometer Instr Ltd | Dual mode coating thickness measuring instrument |
US6593737B2 (en) * | 2000-08-24 | 2003-07-15 | Shell Oil Company | Method for measuring the wall thickness of an electrically conductive object |
EP1373880A2 (de) * | 2001-03-16 | 2004-01-02 | Siemens Aktiengesellschaft | Verfahren zur zerstörungsfreien prüfung carbidhaltiger oder in oberflächennähe sulfidierter legierungen |
US6608495B2 (en) | 2001-03-19 | 2003-08-19 | Applied Materials, Inc. | Eddy-optic sensor for object inspection |
US6966816B2 (en) * | 2001-05-02 | 2005-11-22 | Applied Materials, Inc. | Integrated endpoint detection system with optical and eddy current monitoring |
US6811466B1 (en) * | 2001-12-28 | 2004-11-02 | Applied Materials, Inc. | System and method for in-line metal profile measurement |
US6937915B1 (en) | 2002-03-28 | 2005-08-30 | Lam Research Corporation | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control |
DE10222049A1 (de) * | 2002-05-17 | 2003-12-18 | Zeiss Carl Laser Optics Gmbh | Verfahren und Vorrichtung zum variablen Abschwächen der Intensität eines Lichtstrahls |
US7205166B2 (en) * | 2002-06-28 | 2007-04-17 | Lam Research Corporation | Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties |
US6808590B1 (en) | 2002-06-28 | 2004-10-26 | Lam Research Corporation | Method and apparatus of arrayed sensors for metrological control |
US20040011462A1 (en) * | 2002-06-28 | 2004-01-22 | Lam Research Corporation | Method and apparatus for applying differential removal rates to a surface of a substrate |
US7128803B2 (en) * | 2002-06-28 | 2006-10-31 | Lam Research Corporation | Integration of sensor based metrology into semiconductor processing tools |
US6929531B2 (en) | 2002-09-19 | 2005-08-16 | Lam Research Corporation | System and method for metal residue detection and mapping within a multi-step sequence |
US7084621B2 (en) * | 2002-09-25 | 2006-08-01 | Lam Research Corporation | Enhancement of eddy current based measurement capabilities |
US6788050B2 (en) | 2002-12-23 | 2004-09-07 | Lam Research Corp. | System, method and apparatus for thin-film substrate signal separation using eddy current |
US6945845B2 (en) * | 2003-03-04 | 2005-09-20 | Applied Materials, Inc. | Chemical mechanical polishing apparatus with non-conductive elements |
UA60955C2 (en) * | 2003-07-25 | 2006-01-16 | Subsidiary Entpr With Foreign | Method for contactlessly measuring conductivity of film polymeric electrolyte by a combined transducer |
US20050066739A1 (en) * | 2003-09-26 | 2005-03-31 | Lam Research Corporation | Method and apparatus for wafer mechanical stress monitoring and wafer thermal stress monitoring |
US6955588B1 (en) | 2004-03-31 | 2005-10-18 | Lam Research Corporation | Method of and platen for controlling removal rate characteristics in chemical mechanical planarization |
DE102004034081A1 (de) * | 2004-07-15 | 2006-02-09 | Robert Bosch Gmbh | Verfahren zur berührungsfreien Bestimmung einer Dicke einer Schicht aus elektrisch leitendem Material |
US7388369B2 (en) * | 2004-11-30 | 2008-06-17 | Electric Power Research Institute, Inc. | Method and apparatus for measuring hydrogen concentration in zirconium alloy components in the fuel pool of a nuclear power plant |
SE530770C2 (sv) * | 2005-08-24 | 2008-09-09 | Westinghouse Electric Sweden | System och användning avseende virvelströmsmätningar på komponenter för nukleära reaktorer |
DE102006062152B3 (de) * | 2006-12-22 | 2008-05-29 | Areva Np Gmbh | Verfahren zur Vorbehandlung eines Brennstabhüllrohres für Materialuntersuchungen |
US8337278B2 (en) * | 2007-09-24 | 2012-12-25 | Applied Materials, Inc. | Wafer edge characterization by successive radius measurements |
US8309024B2 (en) * | 2008-04-23 | 2012-11-13 | Enerize Corporation | Methods and systems for non-destructive determination of fluorination of carbon powders |
TW201003672A (en) * | 2008-06-09 | 2010-01-16 | Westinghouse Electric Sweden | Method comprising measurement on fuel channels of fuel assemblies for nuclear boiling water reactors |
WO2010147598A1 (en) * | 2009-06-19 | 2010-12-23 | Dolphin Measurement Systems, Llc | Method and system for measurement of parameters of a flat material |
CN102575998B (zh) * | 2009-09-22 | 2016-03-30 | Adem有限公司 | 用于测量固体和液体对象构成的阻抗传感系统及方法 |
US9528814B2 (en) | 2011-05-19 | 2016-12-27 | NeoVision, LLC | Apparatus and method of using impedance resonance sensor for thickness measurement |
FR2981741B1 (fr) * | 2011-10-20 | 2013-11-29 | Messier Bugatti Dowty | Procede de mesure d'epaisseur d'une couche de revetement par induction de champs magnetiques |
US9465089B2 (en) | 2011-12-01 | 2016-10-11 | Neovision Llc | NMR spectroscopy device based on resonance type impedance (IR) sensor and method of NMR spectra acquisition |
US8952708B2 (en) | 2011-12-02 | 2015-02-10 | Neovision Llc | Impedance resonance sensor for real time monitoring of different processes and methods of using same |
JP5648663B2 (ja) * | 2012-09-20 | 2015-01-07 | センサ・システム株式会社 | 焼入れ硬化層厚さの検査装置及びニッケルめっき皮膜厚さの検査装置 |
RU2577037C1 (ru) * | 2014-12-09 | 2016-03-10 | Открытое акционерное общество Центральный научно-исследовательский институт специального машиностроения | Способ вихретокового контроля толщины композитных материалов на неметаллических подложках и устройство для его осуществления |
JP6792859B2 (ja) * | 2016-08-09 | 2020-12-02 | 国立大学法人東京工業大学 | 解析方法、解析プログラム、および解析装置 |
FR3062203B1 (fr) * | 2017-01-24 | 2020-11-13 | Safran Aircraft Engines | Procede de realisation d'un abaque pour la mesure simultanee de l'epaisseur des differentes couches d'un revetement metallique |
DE102017129150B4 (de) | 2017-12-07 | 2020-03-05 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | Verfahren und Vorrichtung zur Messung der Dicke von nicht magnetisierbaren Schichten auf einem magnetisierbaren Grundwerkstoff |
CN114577894B (zh) * | 2022-01-14 | 2023-05-26 | 湖南凌扬电子科技有限公司 | 磁性金属底材与非导电涂层间的含金属夹层识别方法及系统 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4303885A (en) * | 1979-06-18 | 1981-12-01 | Electric Power Research Institute, Inc. | Digitally controlled multifrequency eddy current test apparatus and method |
JPS5967405A (ja) * | 1982-09-30 | 1984-04-17 | Sumitomo Metal Ind Ltd | ライナ厚測定方法 |
DE3404720A1 (de) * | 1984-02-10 | 1985-08-14 | Karl Deutsch Prüf- und Meßgerätebau GmbH + Co KG, 5600 Wuppertal | Verfahren und vorrichtung zur schichtdickenmessung |
JPS61237052A (ja) * | 1985-04-15 | 1986-10-22 | Nippon Telegr & Teleph Corp <Ntt> | 亜鉛めつき鋼の腐食寿命診断器 |
FR2589566A1 (fr) * | 1985-11-06 | 1987-05-07 | Cegedur | Procede de mesure au defile et sans contact de l'epaisseur et de la temperature de feuilles metalliques minces au moyen de courants de foucault |
US5017869A (en) * | 1989-12-14 | 1991-05-21 | General Electric Company | Swept frequency eddy current system for measuring coating thickness |
DE4119903C5 (de) * | 1991-06-17 | 2005-06-30 | Immobiliengesellschaft Helmut Fischer Gmbh & Co. Kg | Verfahren und Vorrichtung zur Messung dünner Schichten |
US5453689A (en) * | 1991-12-06 | 1995-09-26 | Massachusetts Institute Of Technology | Magnetometer having periodic winding structure and material property estimator |
DE4327712C2 (de) * | 1993-08-18 | 1997-07-10 | Micro Epsilon Messtechnik | Sensoranordnung und Verfahren zum Erfassen von Eigenschaften der Oberflächenschicht eines metallischen Targets |
-
1996
- 1996-07-05 SE SE9602658A patent/SE508354C2/sv unknown
- 1996-07-12 US US08/679,624 patent/US5889401A/en not_active Expired - Lifetime
- 1996-07-15 DE DE19628220A patent/DE19628220B4/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
SE508354C2 (sv) | 1998-09-28 |
DE19628220A1 (de) | 1998-02-05 |
US5889401A (en) | 1999-03-30 |
DE19628220B4 (de) | 2011-06-16 |
SE9602658L (sv) | 1998-01-06 |
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