SE8700052D0 - Akromatiskt, anastigmatiskt optiskt projektionssystem - Google Patents

Akromatiskt, anastigmatiskt optiskt projektionssystem

Info

Publication number
SE8700052D0
SE8700052D0 SE8700052A SE8700052A SE8700052D0 SE 8700052 D0 SE8700052 D0 SE 8700052D0 SE 8700052 A SE8700052 A SE 8700052A SE 8700052 A SE8700052 A SE 8700052A SE 8700052 D0 SE8700052 D0 SE 8700052D0
Authority
SE
Sweden
Prior art keywords
projection system
optical projection
mirror
acromatic
prism
Prior art date
Application number
SE8700052A
Other languages
English (en)
Other versions
SE8700052L (sv
SE451411B (sv
Inventor
R S Hershel
M E Lee
Original Assignee
Gen Signal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/378,370 external-priority patent/US4425037A/en
Application filed by Gen Signal Corp filed Critical Gen Signal Corp
Publication of SE8700052L publication Critical patent/SE8700052L/sv
Publication of SE8700052D0 publication Critical patent/SE8700052D0/sv
Publication of SE451411B publication Critical patent/SE451411B/sv

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE8700052A 1981-05-15 1987-01-08 Akromatiskt, anastigmatiskt optiskt projektionssystem SE451411B (sv)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US26417181A 1981-05-15 1981-05-15
US26424981A 1981-05-15 1981-05-15
US06/378,370 US4425037A (en) 1981-05-15 1982-05-14 Apparatus for projecting a series of images onto dies of a semiconductor wafer
PCT/US1982/000668 WO1982004133A1 (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Publications (3)

Publication Number Publication Date
SE8700052L SE8700052L (sv) 1987-01-08
SE8700052D0 true SE8700052D0 (sv) 1987-01-08
SE451411B SE451411B (sv) 1987-10-05

Family

ID=27401672

Family Applications (4)

Application Number Title Priority Date Filing Date
SE8300183A SE450979B (sv) 1981-05-15 1983-01-14 Stegprojektionsmaskin med servofokusering
SE8700052A SE451411B (sv) 1981-05-15 1987-01-08 Akromatiskt, anastigmatiskt optiskt projektionssystem
SE8700051A SE450978B (sv) 1981-05-15 1987-01-08 Fokuseringssystem
SE8700053A SE459771B (sv) 1981-05-15 1987-01-08 Apparat foer instaellning av en halvledarskiva

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE8300183A SE450979B (sv) 1981-05-15 1983-01-14 Stegprojektionsmaskin med servofokusering

Family Applications After (2)

Application Number Title Priority Date Filing Date
SE8700051A SE450978B (sv) 1981-05-15 1987-01-08 Fokuseringssystem
SE8700053A SE459771B (sv) 1981-05-15 1987-01-08 Apparat foer instaellning av en halvledarskiva

Country Status (8)

Country Link
EP (3) EP0146670B1 (sv)
JP (1) JPS58500730A (sv)
CH (1) CH678666A5 (sv)
DE (2) DE3249685C2 (sv)
GB (1) GB2121552B (sv)
NL (1) NL8220224A (sv)
SE (4) SE450979B (sv)
WO (1) WO1982004133A1 (sv)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212500A (en) * 1991-03-15 1993-05-18 Eastman Kodak Company Writing beam focusing utilizing light of a different wavelength
DE69508228T2 (de) * 1994-06-02 1999-09-23 Koninkl Philips Electronics Nv Verfahren zur wiederholten abbildung eines maskenmusters auf einem substrat und vorrichtung zur durchführung des verfahrens
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
US5757469A (en) * 1995-03-22 1998-05-26 Etec Systems, Inc. Scanning lithography system haing double pass Wynne-Dyson optics
JP2565149B2 (ja) * 1995-04-05 1996-12-18 キヤノン株式会社 回路の製造方法及び露光装置
DE29705870U1 (de) * 1997-04-07 1998-08-20 Fehlert, Gerd-P., Dr.-Ing., 42115 Wuppertal Flachbildschirm

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US419159A (en) * 1890-01-07 Signments
US198159A (en) * 1877-12-11 Improvement in bottles for promoting vegetation
US3809050A (en) * 1971-01-13 1974-05-07 Cogar Corp Mounting block for semiconductor wafers
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3818327A (en) * 1972-09-05 1974-06-18 Industrial Nucleonics Corp Measuring gauge with support for holding measured sheet and discharging foreign matter
US3951546A (en) * 1974-09-26 1976-04-20 The Perkin-Elmer Corporation Three-fold mirror assembly for a scanning projection system
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
JPS5264932A (en) * 1975-11-25 1977-05-28 Hitachi Ltd Automatic focus adjusting device
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US4190352A (en) * 1977-06-30 1980-02-26 Bell Telephone Laboratories, Incorporated Method and apparatus for continuously patterning a photosensitive tape
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US4131267A (en) * 1978-06-02 1978-12-26 Disco Kabushiki Kaisha Apparatus for holding workpiece by suction
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
GB2063523B (en) * 1978-10-20 1982-12-15 Hitachi Ltd Wafer position setting apparatus
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing
DE2905635A1 (de) * 1979-02-14 1980-08-21 Censor Patent Versuch Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface

Also Published As

Publication number Publication date
GB2121552B (en) 1985-12-18
EP0146670B1 (en) 1989-07-19
EP0078323B1 (en) 1987-01-14
SE8700052L (sv) 1987-01-08
GB2121552A (en) 1983-12-21
SE451411B (sv) 1987-10-05
SE8700051L (sv) 1987-01-08
SE8700051D0 (sv) 1987-01-08
WO1982004133A1 (en) 1982-11-25
EP0078323A1 (en) 1983-05-11
SE8300183D0 (sv) 1983-01-14
EP0354148A3 (en) 1990-06-20
SE8700053D0 (sv) 1987-01-08
EP0354148A2 (en) 1990-02-07
SE450979B (sv) 1987-09-07
SE450978B (sv) 1987-09-07
JPS58500730A (ja) 1983-05-06
NL8220224A (nl) 1983-04-05
EP0078323A4 (en) 1983-08-09
EP0146670A3 (en) 1985-11-27
DE3249686C2 (de) 1986-11-13
CH678666A5 (sv) 1991-10-15
EP0146670A2 (en) 1985-07-03
SE459771B (sv) 1989-07-31
DE3249685C2 (sv) 1987-09-24
SE8700053L (sv) 1987-01-08
SE8300183L (sv) 1983-01-14
JPH0313574B2 (sv) 1991-02-22

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