SE537287C2 - En solcellsstruktur och en metod för tillverkning av densamma - Google Patents
En solcellsstruktur och en metod för tillverkning av densamma Download PDFInfo
- Publication number
- SE537287C2 SE537287C2 SE1350687A SE1350687A SE537287C2 SE 537287 C2 SE537287 C2 SE 537287C2 SE 1350687 A SE1350687 A SE 1350687A SE 1350687 A SE1350687 A SE 1350687A SE 537287 C2 SE537287 C2 SE 537287C2
- Authority
- SE
- Sweden
- Prior art keywords
- nanowire
- solar cell
- layer
- section
- cell structure
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 239000002070 nanowire Substances 0.000 claims abstract description 132
- 239000010410 layer Substances 0.000 claims abstract description 81
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000012790 adhesive layer Substances 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 34
- 229920000642 polymer Polymers 0.000 claims description 20
- 239000004065 semiconductor Substances 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 5
- 239000002861 polymer material Substances 0.000 claims description 4
- 230000000295 complement effect Effects 0.000 claims description 3
- 238000002161 passivation Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 18
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 16
- 238000005516 engineering process Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 230000010354 integration Effects 0.000 description 7
- 229920006254 polymer film Polymers 0.000 description 7
- 238000000231 atomic layer deposition Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000007480 spreading Effects 0.000 description 6
- 238000003892 spreading Methods 0.000 description 6
- 238000001465 metallisation Methods 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003306 harvesting Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000008092 positive effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- XUKUURHRXDUEBC-KAYWLYCHSA-N Atorvastatin Chemical compound C=1C=CC=CC=1C1=C(C=2C=CC(F)=CC=2)N(CC[C@@H](O)C[C@@H](O)CC(O)=O)C(C(C)C)=C1C(=O)NC1=CC=CC=C1 XUKUURHRXDUEBC-KAYWLYCHSA-N 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/144—Photovoltaic cells having only PN homojunction potential barriers comprising only Group III-V materials, e.g. GaAs,AlGaAs, or InP photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/163—Photovoltaic cells having only PN heterojunction potential barriers comprising only Group III-V materials, e.g. GaAs/AlGaAs or InP/GaInAs photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1276—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising growth substrates not made of Group III-V materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/129—Passivating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/143—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies comprising quantum structures
- H10F77/1437—Quantum wires or nanorods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/147—Shapes of bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/543—Solar cells from Group II-VI materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Sustainable Development (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE1350687A SE537287C2 (sv) | 2013-06-05 | 2013-06-05 | En solcellsstruktur och en metod för tillverkning av densamma |
| CN201480035600.XA CN105659390B (zh) | 2013-06-05 | 2014-06-05 | 太阳能电池结构及其制造方法 |
| PCT/SE2014/050685 WO2014196920A1 (en) | 2013-06-05 | 2014-06-05 | A solar cell structure and a method of its fabrication |
| CN201710962476.7A CN107799612A (zh) | 2013-06-05 | 2014-06-05 | 太阳能电池结构及其制造方法 |
| EP14807588.0A EP3005424A4 (en) | 2013-06-05 | 2014-06-05 | A solar cell structure and a method of its fabrication |
| JP2016518303A JP2016526304A (ja) | 2013-06-05 | 2014-06-05 | 太陽電池構造及びその製造方法 |
| US14/896,369 US20160155870A1 (en) | 2013-06-05 | 2014-06-05 | A solar cell structure and a method of its fabrication |
| KR1020167000131A KR20160029791A (ko) | 2013-06-05 | 2014-06-05 | 태양 전지 구조 및 이의 제조 방법 |
| HK18104721.8A HK1245506A1 (zh) | 2013-06-05 | 2018-04-11 | 太阳能电池结构及其制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE1350687A SE537287C2 (sv) | 2013-06-05 | 2013-06-05 | En solcellsstruktur och en metod för tillverkning av densamma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE1350687A1 SE1350687A1 (sv) | 2014-12-06 |
| SE537287C2 true SE537287C2 (sv) | 2015-03-24 |
Family
ID=52008430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE1350687A SE537287C2 (sv) | 2013-06-05 | 2013-06-05 | En solcellsstruktur och en metod för tillverkning av densamma |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20160155870A1 (enExample) |
| EP (1) | EP3005424A4 (enExample) |
| JP (1) | JP2016526304A (enExample) |
| KR (1) | KR20160029791A (enExample) |
| CN (2) | CN105659390B (enExample) |
| HK (1) | HK1245506A1 (enExample) |
| SE (1) | SE537287C2 (enExample) |
| WO (1) | WO2014196920A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3016148A1 (en) | 2014-10-28 | 2016-05-04 | Sol Voltaics AB | Dual layer photovoltaic device |
| FR3031242B1 (fr) | 2014-12-29 | 2016-12-30 | Aledia | Procede de fabrication de nanofils ou de microfils semiconducteurs a pieds isoles |
| DE102017104906A1 (de) * | 2017-03-08 | 2018-09-13 | Olav Birlem | Anordnung und Verfahren zum Bereitstellen einer Vielzahl von Nanodrähten |
| CN107310244A (zh) * | 2017-06-22 | 2017-11-03 | 大连保税区金宝至电子有限公司 | 太阳能电极印刷网版的蚀刻加工方法 |
| US10565015B2 (en) | 2017-09-18 | 2020-02-18 | The Regents Of The University Of Michigan | Spiroketal-based C2-symmetric scaffold for asymmetric catalysis |
| CN109616553B (zh) * | 2018-11-22 | 2020-06-30 | 中南大学 | 一种新型纤锌矿GaAs核壳纳米线光电探测器的制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04296060A (ja) * | 1991-03-26 | 1992-10-20 | Hitachi Ltd | 太陽電池 |
| US5322573A (en) * | 1992-10-02 | 1994-06-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | InP solar cell with window layer |
| EP0743686A3 (en) * | 1995-05-15 | 1998-12-02 | Matsushita Electric Industrial Co., Ltd | Precursor for semiconductor thin films and method for producing semiconductor thin films |
| US20060207647A1 (en) * | 2005-03-16 | 2006-09-21 | General Electric Company | High efficiency inorganic nanorod-enhanced photovoltaic devices |
| US8362460B2 (en) * | 2006-08-11 | 2013-01-29 | Cyrium Technologies Incorporated | Method of fabricating semiconductor devices on a group IV substrate with controlled interface properties and diffusion tails |
| EP1892769A2 (en) * | 2006-08-25 | 2008-02-27 | General Electric Company | Single conformal junction nanowire photovoltaic devices |
| AU2008275956A1 (en) * | 2007-07-19 | 2009-01-22 | California Institute Of Technology | Structures of ordered arrays of semiconductors |
| US8106289B2 (en) * | 2007-12-31 | 2012-01-31 | Banpil Photonics, Inc. | Hybrid photovoltaic device |
| KR100953448B1 (ko) * | 2008-04-02 | 2010-04-20 | 한국기계연구원 | 반도체 나노소재를 이용한 광전 변환 장치 및 그 제조 방법 |
| US20100012190A1 (en) * | 2008-07-16 | 2010-01-21 | Hajime Goto | Nanowire photovoltaic cells and manufacture method thereof |
| KR101040956B1 (ko) * | 2009-02-26 | 2011-06-16 | 전자부품연구원 | 산화아연 나노와이어를 이용한 박막 실리콘 태양전지 및 그의 제조방법 |
| US8952354B2 (en) * | 2009-04-15 | 2015-02-10 | Sol Voltaics Ab | Multi-junction photovoltaic cell with nanowires |
| US20120192934A1 (en) * | 2009-06-21 | 2012-08-02 | The Regents Of The University Of California | Nanostructure, Photovoltaic Device, and Method of Fabrication Thereof |
| EP2507842A2 (en) * | 2009-11-30 | 2012-10-10 | California Institute of Technology | Three-dimensional patterning methods and related devices |
| US20110146744A1 (en) * | 2009-12-23 | 2011-06-23 | General Electric Company | Photovoltaic cell |
| JP2011138804A (ja) * | 2009-12-25 | 2011-07-14 | Honda Motor Co Ltd | ナノワイヤ太陽電池及びその製造方法 |
| US20110240099A1 (en) * | 2010-03-30 | 2011-10-06 | Ellinger Carolyn R | Photovoltaic nanowire device |
| JP2012056015A (ja) * | 2010-09-08 | 2012-03-22 | Honda Motor Co Ltd | ナノワイヤデバイスの製造方法 |
| US20140096816A1 (en) * | 2010-12-22 | 2014-04-10 | Harry A. Atwater | Heterojunction microwire array semiconductor devices |
| CN102157617B (zh) * | 2011-01-31 | 2013-06-19 | 常州大学 | 一种硅基纳米线太阳电池的制备方法 |
-
2013
- 2013-06-05 SE SE1350687A patent/SE537287C2/sv not_active IP Right Cessation
-
2014
- 2014-06-05 WO PCT/SE2014/050685 patent/WO2014196920A1/en not_active Ceased
- 2014-06-05 KR KR1020167000131A patent/KR20160029791A/ko not_active Withdrawn
- 2014-06-05 JP JP2016518303A patent/JP2016526304A/ja active Pending
- 2014-06-05 US US14/896,369 patent/US20160155870A1/en not_active Abandoned
- 2014-06-05 CN CN201480035600.XA patent/CN105659390B/zh not_active Expired - Fee Related
- 2014-06-05 CN CN201710962476.7A patent/CN107799612A/zh active Pending
- 2014-06-05 EP EP14807588.0A patent/EP3005424A4/en active Pending
-
2018
- 2018-04-11 HK HK18104721.8A patent/HK1245506A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016526304A (ja) | 2016-09-01 |
| HK1245506A1 (zh) | 2018-08-24 |
| EP3005424A4 (en) | 2017-01-11 |
| CN105659390B (zh) | 2017-11-14 |
| CN107799612A (zh) | 2018-03-13 |
| EP3005424A1 (en) | 2016-04-13 |
| WO2014196920A1 (en) | 2014-12-11 |
| US20160155870A1 (en) | 2016-06-02 |
| KR20160029791A (ko) | 2016-03-15 |
| CN105659390A (zh) | 2016-06-08 |
| SE1350687A1 (sv) | 2014-12-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5106880B2 (ja) | 多接合太陽電池における変成層 | |
| CN103460354B (zh) | 薄型硅太阳能电池和制造方法 | |
| EP2797124B1 (en) | Method for manufacturing a solar cell | |
| JP5512086B2 (ja) | 背面側接触のためのviaを有する倒置変性ソーラーセル構造 | |
| US4431858A (en) | Method of making quasi-grain boundary-free polycrystalline solar cell structure and solar cell structure obtained thereby | |
| CN101399296B (zh) | 具有刚性支撑的薄倒置变质多结太阳能电池 | |
| CN104167454B (zh) | 太阳能电池及其制造方法 | |
| US20100203730A1 (en) | Epitaxial Lift Off in Inverted Metamorphic Multijunction Solar Cells | |
| JP7502383B2 (ja) | パターニングされたエミッタを有する多接合太陽電池及び該太陽電池の製造方法 | |
| SE1350687A1 (sv) | En solcellsstruktur och en metod för tillverkning av densamma | |
| KR20050113177A (ko) | 개선된 광전지 및 그 제조 | |
| CN102934236A (zh) | 太阳能电池及其制造方法 | |
| US20200335649A1 (en) | Inverted metamorphic multijunction solar cells having a permanent supporting substrate | |
| US20120276676A1 (en) | Epitaxial lift off in inverted metamorphic multijunction solar cells | |
| US9035367B2 (en) | Method for manufacturing inverted metamorphic multijunction solar cells | |
| TW201318030A (zh) | 半導體光檢測裝置及其製備的方法 | |
| US20150171272A1 (en) | Semiconductor plate device | |
| KR20160047759A (ko) | 분리 가능한 기판위에 복수의 태양전지층이 형성되는 다중접합 태양전지의 구조 및 그 제조방법 | |
| US9184332B2 (en) | Inverted metamorphic multi-junction (IMM) solar cell and associated fabrication method | |
| CN103515461A (zh) | 纹理化的多结太阳能电池及制造方法 | |
| WO2017084492A1 (zh) | 双结薄膜太阳能电池组件及其制作方法 | |
| US20220020891A1 (en) | Systems and Methods for Three-Terminal Tandem Solar Cells | |
| Pavlovic et al. | „IntegRex-Process Development of a Module Interconnection Concept for Thin Crystalline Silicon Films “ | |
| KR20200021775A (ko) | 지지 핸들 및 이를 이용한 화합물 반도체 태양전지의 제조 방법 | |
| HK1147141A (en) | Nanowire-based solar cell structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |