SE520087C2 - Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den - Google Patents

Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den

Info

Publication number
SE520087C2
SE520087C2 SE0003715A SE0003715A SE520087C2 SE 520087 C2 SE520087 C2 SE 520087C2 SE 0003715 A SE0003715 A SE 0003715A SE 0003715 A SE0003715 A SE 0003715A SE 520087 C2 SE520087 C2 SE 520087C2
Authority
SE
Sweden
Prior art keywords
jet
outlet
ray
radiation
energy beam
Prior art date
Application number
SE0003715A
Other languages
English (en)
Swedish (sv)
Other versions
SE0003715L (sv
SE0003715D0 (sv
Inventor
Hans Martin Hertz
Bjoern A M Hansson
Oscar Hemberg
Magnus Berglund
Lars Rymell
Original Assignee
Jettec Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jettec Ab filed Critical Jettec Ab
Priority to SE0003715A priority Critical patent/SE520087C2/sv
Publication of SE0003715D0 publication Critical patent/SE0003715D0/xx
Priority to DE60141643T priority patent/DE60141643D1/de
Priority to EP01976963A priority patent/EP1332649B1/de
Priority to AU2001296115A priority patent/AU2001296115A1/en
Priority to AT01976963T priority patent/ATE462289T1/de
Priority to PCT/SE2001/002217 priority patent/WO2002032197A1/en
Priority to US09/974,975 priority patent/US6760406B2/en
Publication of SE0003715L publication Critical patent/SE0003715L/xx
Publication of SE520087C2 publication Critical patent/SE520087C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SE0003715A 2000-10-13 2000-10-13 Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den SE520087C2 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE0003715A SE520087C2 (sv) 2000-10-13 2000-10-13 Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den
DE60141643T DE60141643D1 (de) 2000-10-13 2001-10-12 Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung
EP01976963A EP1332649B1 (de) 2000-10-13 2001-10-12 Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung
AU2001296115A AU2001296115A1 (en) 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation
AT01976963T ATE462289T1 (de) 2000-10-13 2001-10-12 Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung
PCT/SE2001/002217 WO2002032197A1 (en) 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation
US09/974,975 US6760406B2 (en) 2000-10-13 2001-10-12 Method and apparatus for generating X-ray or EUV radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0003715A SE520087C2 (sv) 2000-10-13 2000-10-13 Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den

Publications (3)

Publication Number Publication Date
SE0003715D0 SE0003715D0 (sv) 2000-10-13
SE0003715L SE0003715L (sv) 2002-04-14
SE520087C2 true SE520087C2 (sv) 2003-05-20

Family

ID=20281418

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0003715A SE520087C2 (sv) 2000-10-13 2000-10-13 Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den

Country Status (6)

Country Link
EP (1) EP1332649B1 (de)
AT (1) ATE462289T1 (de)
AU (1) AU2001296115A1 (de)
DE (1) DE60141643D1 (de)
SE (1) SE520087C2 (de)
WO (1) WO2002032197A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003096764A1 (en) 2002-05-13 2003-11-20 Jettec Ab Method and arrangement for producing radiation
DE10339495B4 (de) 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Anordnung zur optischen Detektion eines bewegten Targetstromes für eine gepulste energiestrahlgepumpte Strahlungserzeugung
US6864497B2 (en) 2002-12-11 2005-03-08 University Of Central Florida Research Foundation Droplet and filament target stabilizer for EUV source nozzles
DE10314849B3 (de) 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
WO2005004555A1 (en) 2003-06-27 2005-01-13 Commissariat A L'energie Atomique Method and device for producing extreme ultraviolet radiation or soft x-ray radiation
US20120280148A1 (en) * 2010-01-07 2012-11-08 Asml Netherlands B.V. Euv radiation source and lithographic apparatus
US11317500B2 (en) * 2017-08-30 2022-04-26 Kla-Tencor Corporation Bright and clean x-ray source for x-ray based metrology
EP3525556A1 (de) * 2018-02-09 2019-08-14 Excillum AB Verfahren zum schutz einer röntgenquelle und röntgenquelle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie

Also Published As

Publication number Publication date
SE0003715L (sv) 2002-04-14
EP1332649A1 (de) 2003-08-06
SE0003715D0 (sv) 2000-10-13
DE60141643D1 (de) 2010-05-06
AU2001296115A1 (en) 2002-04-22
WO2002032197A1 (en) 2002-04-18
ATE462289T1 (de) 2010-04-15
EP1332649B1 (de) 2010-03-24

Similar Documents

Publication Publication Date Title
US6760406B2 (en) Method and apparatus for generating X-ray or EUV radiation
JP5073146B2 (ja) Ｘ線発生方法および装置
US6711233B2 (en) Method and apparatus for generating X-ray or EUV radiation
EP0895706B2 (de) Verfahren und vorrichtung zum erzeugen von röntgen- oder extremer uv- strahlung
US10381216B2 (en) Continuous-wave laser-sustained plasma illumination source
US7622727B2 (en) Extreme UV radiation source device
US8471226B2 (en) Extreme ultraviolet light source device and method for producing extreme ultraviolet light
JP6241062B2 (ja) 極端紫外光光源装置
EP1367866A1 (de) Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-uIltraviolett-Lichtquelle mit hoher Pulsrate
US7239686B2 (en) Method and arrangement for producing radiation
JP4264505B2 (ja) レーザープラズマ発生方法及び装置
JP2003513418A (ja) マイクロターゲットを用いた方法及びラジエーション生成システム
US9699877B2 (en) Extreme ultraviolet light generation apparatus including target droplet joining apparatus
Richardson et al. Mass-limited, debris-free laser-plasma EUV source
SE520087C2 (sv) Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den
JP2000098098A (ja) Ｘ線発生装置
JP2012525495A (ja) 高圧蒸発による高速コーティングのための方法及び装置
JP4403216B2 (ja) 極紫外（ｅｕｖ）線を発生するｅｕｖ線源
WO2009077943A1 (en) Method for laser-based plasma production and radiation source, in particular for euv radiation
SE522150C2 (sv) Förfarande och apparat för alstring av röntgenstrålning samt användning därav
JP2960206B2 (ja) 同位体分離方法及び装置
Fornaca et al. Target Steering System for EUV Droplet Generators