ATE462289T1 - Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung - Google Patents

Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung

Info

Publication number
ATE462289T1
ATE462289T1 AT01976963T AT01976963T ATE462289T1 AT E462289 T1 ATE462289 T1 AT E462289T1 AT 01976963 T AT01976963 T AT 01976963T AT 01976963 T AT01976963 T AT 01976963T AT E462289 T1 ATE462289 T1 AT E462289T1
Authority
AT
Austria
Prior art keywords
jet
outlet
energy beam
radiation
ray
Prior art date
Application number
AT01976963T
Other languages
English (en)
Inventor
Hans Hertz
Oscar Hemberg
Bjoern Hansson
Magnus Berglund
Lars Rymell
Original Assignee
Jettec Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jettec Ab filed Critical Jettec Ab
Application granted granted Critical
Publication of ATE462289T1 publication Critical patent/ATE462289T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT01976963T 2000-10-13 2001-10-12 Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung ATE462289T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0003715A SE520087C2 (sv) 2000-10-13 2000-10-13 Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den
PCT/SE2001/002217 WO2002032197A1 (en) 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation

Publications (1)

Publication Number Publication Date
ATE462289T1 true ATE462289T1 (de) 2010-04-15

Family

ID=20281418

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01976963T ATE462289T1 (de) 2000-10-13 2001-10-12 Verfahren und vorrichtung zur erzeugung von röntgen- oder euv-strahlung

Country Status (6)

Country Link
EP (1) EP1332649B1 (de)
AT (1) ATE462289T1 (de)
AU (1) AU2001296115A1 (de)
DE (1) DE60141643D1 (de)
SE (1) SE520087C2 (de)
WO (1) WO2002032197A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003096764A1 (en) 2002-05-13 2003-11-20 Jettec Ab Method and arrangement for producing radiation
DE10339495B4 (de) 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Anordnung zur optischen Detektion eines bewegten Targetstromes für eine gepulste energiestrahlgepumpte Strahlungserzeugung
US6864497B2 (en) 2002-12-11 2005-03-08 University Of Central Florida Research Foundation Droplet and filament target stabilizer for EUV source nozzles
DE10314849B3 (de) 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
WO2005004555A1 (en) 2003-06-27 2005-01-13 Commissariat A L'energie Atomique Method and device for producing extreme ultraviolet radiation or soft x-ray radiation
US20120280148A1 (en) * 2010-01-07 2012-11-08 Asml Netherlands B.V. Euv radiation source and lithographic apparatus
US11317500B2 (en) * 2017-08-30 2022-04-26 Kla-Tencor Corporation Bright and clean x-ray source for x-ray based metrology
EP3525556A1 (de) * 2018-02-09 2019-08-14 Excillum AB Verfahren zum schutz einer röntgenquelle und röntgenquelle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie

Also Published As

Publication number Publication date
SE0003715L (sv) 2002-04-14
EP1332649A1 (de) 2003-08-06
SE0003715D0 (sv) 2000-10-13
DE60141643D1 (de) 2010-05-06
AU2001296115A1 (en) 2002-04-22
WO2002032197A1 (en) 2002-04-18
SE520087C2 (sv) 2003-05-20
EP1332649B1 (de) 2010-03-24

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties