AU2001296115A1 - Method and apparatus for generating x-ray or euv radiation - Google Patents

Method and apparatus for generating x-ray or euv radiation

Info

Publication number
AU2001296115A1
AU2001296115A1 AU2001296115A AU9611501A AU2001296115A1 AU 2001296115 A1 AU2001296115 A1 AU 2001296115A1 AU 2001296115 A AU2001296115 A AU 2001296115A AU 9611501 A AU9611501 A AU 9611501A AU 2001296115 A1 AU2001296115 A1 AU 2001296115A1
Authority
AU
Australia
Prior art keywords
jet
outlet
energy beam
radiation
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296115A
Inventor
Magnus Berglund
Bjorn A. M. Hansson
Oscar Hemberg
Hans Martin Hertz
Lars Rymell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jettec AB
Original Assignee
Jettec AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jettec AB filed Critical Jettec AB
Publication of AU2001296115A1 publication Critical patent/AU2001296115A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

A method and an apparatus is designed to produce X-ray or EUV radiation for use in lithography, microscopy, materials science, or medical diagnostics. The radiation is produced by urging a substance through an outlet (6) to generate a microscopic jet (2) in a direction from the outlet (6), and by directing at least one energy beam (1') onto the jet (2), wherein the energy beam (1') interacts with the jet (2) to produce the X-ray or EUV radiation. The temperature of the outlet (6) is controlled to increase the directional stability of the jet (2). The thus-achieved directional stability of the jet (2) provides for reduced pulse-to-pulse fluctuations of the produced radiation, improved spatial stability of the radiation source, as well as high average power since the energy beam (1') can be tightly focused on the jet (2), even at a comparatively large distance from the jet-generating outlet (6). The large distance provides for low erosion of the outlet (6), even when using a high-power energy beam (1').
AU2001296115A 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation Abandoned AU2001296115A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0003715A SE520087C2 (en) 2000-10-13 2000-10-13 Method and apparatus for generating X-ray or EUV radiation and using it
SE0003715 2000-10-13
PCT/SE2001/002217 WO2002032197A1 (en) 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation

Publications (1)

Publication Number Publication Date
AU2001296115A1 true AU2001296115A1 (en) 2002-04-22

Family

ID=20281418

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296115A Abandoned AU2001296115A1 (en) 2000-10-13 2001-10-12 Method and apparatus for generating x-ray or euv radiation

Country Status (6)

Country Link
EP (1) EP1332649B1 (en)
AT (1) ATE462289T1 (en)
AU (1) AU2001296115A1 (en)
DE (1) DE60141643D1 (en)
SE (1) SE520087C2 (en)
WO (1) WO2002032197A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003096764A1 (en) 2002-05-13 2003-11-20 Jettec Ab Method and arrangement for producing radiation
DE10339495B4 (en) 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Arrangement for the optical detection of a moving target current for pulsed energy-jet-pumped radiation generation
US6864497B2 (en) 2002-12-11 2005-03-08 University Of Central Florida Research Foundation Droplet and filament target stabilizer for EUV source nozzles
DE10314849B3 (en) 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Arrangement for stabilizing the radiation emission of a plasma
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
JP2007515741A (en) 2003-06-27 2007-06-14 イクストリーメ　テクノロジース　ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation
CN102714911A (en) * 2010-01-07 2012-10-03 Asml荷兰有限公司 EUV radiation source and lithographic apparatus
US11317500B2 (en) * 2017-08-30 2022-04-26 Kla-Tencor Corporation Bright and clean x-ray source for x-ray based metrology
EP3525556A1 (en) * 2018-02-09 2019-08-14 Excillum AB A method for protecting an x-ray source, and an x-ray source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (en) * 1996-04-25 1999-04-19 Jettec Ab Laser plasma X-ray source utilizing fluids as radiation target
FR2799667B1 (en) * 1999-10-18 2002-03-08 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING A DENSE FOG OF MICROMETRIC AND SUBMICROMETRIC DROPLETS, APPLICATION TO THE GENERATION OF LIGHT IN EXTREME ULTRAVIOLET IN PARTICULAR FOR LITHOGRAPHY

Also Published As

Publication number Publication date
EP1332649B1 (en) 2010-03-24
WO2002032197A1 (en) 2002-04-18
SE520087C2 (en) 2003-05-20
EP1332649A1 (en) 2003-08-06
SE0003715L (en) 2002-04-14
DE60141643D1 (en) 2010-05-06
ATE462289T1 (en) 2010-04-15
SE0003715D0 (en) 2000-10-13

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