SE519573C2 - Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp - Google Patents

Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp

Info

Publication number
SE519573C2
SE519573C2 SE0102411A SE0102411A SE519573C2 SE 519573 C2 SE519573 C2 SE 519573C2 SE 0102411 A SE0102411 A SE 0102411A SE 0102411 A SE0102411 A SE 0102411A SE 519573 C2 SE519573 C2 SE 519573C2
Authority
SE
Sweden
Prior art keywords
stamp
group
reagent
molecular chain
fluorine
Prior art date
Application number
SE0102411A
Other languages
English (en)
Swedish (sv)
Other versions
SE0102411L (sv
SE0102411D0 (sv
Inventor
Babak Heidari
Torbjoern Ling
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0102411A priority Critical patent/SE519573C2/sv
Publication of SE0102411D0 publication Critical patent/SE0102411D0/xx
Priority to JP2003511035A priority patent/JP3920850B2/ja
Priority to EP02749471A priority patent/EP1402318A1/en
Priority to US10/482,710 priority patent/US7137336B2/en
Priority to PCT/SE2002/001334 priority patent/WO2003005124A1/en
Publication of SE0102411L publication Critical patent/SE0102411L/xx
Publication of SE519573C2 publication Critical patent/SE519573C2/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Laminated Bodies (AREA)
SE0102411A 2001-07-05 2001-07-05 Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp SE519573C2 (sv)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SE0102411A SE519573C2 (sv) 2001-07-05 2001-07-05 Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
JP2003511035A JP3920850B2 (ja) 2001-07-05 2002-07-04 非付着性層を有するスタンプ、該スタンプの形成方法及び修復方法
EP02749471A EP1402318A1 (en) 2001-07-05 2002-07-04 A stamp having an antisticking layer and a method of forming of repairing such a stamp
US10/482,710 US7137336B2 (en) 2001-07-05 2002-07-04 Stamp having an antisticking layer and a method of forming of repairing such a stamp
PCT/SE2002/001334 WO2003005124A1 (en) 2001-07-05 2002-07-04 A stamp having an antisticking layer and a method of forming of repairing such a stamp

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0102411A SE519573C2 (sv) 2001-07-05 2001-07-05 Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp

Publications (3)

Publication Number Publication Date
SE0102411D0 SE0102411D0 (sv) 2001-07-05
SE0102411L SE0102411L (sv) 2003-01-06
SE519573C2 true SE519573C2 (sv) 2003-03-11

Family

ID=20284750

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0102411A SE519573C2 (sv) 2001-07-05 2001-07-05 Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp

Country Status (5)

Country Link
US (1) US7137336B2 (ja)
EP (1) EP1402318A1 (ja)
JP (1) JP3920850B2 (ja)
SE (1) SE519573C2 (ja)
WO (1) WO2003005124A1 (ja)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1997691B (zh) 2003-09-23 2011-07-20 北卡罗来纳大学查珀尔希尔分校 光固化的全氟聚醚用作微流体器件中的新材料
EP1538482B1 (en) 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
WO2005101466A2 (en) 2003-12-19 2005-10-27 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US8158728B2 (en) 2004-02-13 2012-04-17 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
EP1594001B1 (en) 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
US20050272599A1 (en) * 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
CN100395121C (zh) * 2004-11-19 2008-06-18 鸿富锦精密工业（深圳）有限公司 热压印方法
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
JP4584754B2 (ja) * 2005-04-06 2010-11-24 株式会社日立産機システム ナノプリント金型、その製造方法及びこの金型を用いたナノプリント装置並びにナノプリント方法
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) * 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
KR101265321B1 (ko) * 2005-11-14 2013-05-20 엘지디스플레이 주식회사 스탬프 제조 방법, 그를 이용한 박막트랜지스터 및액정표시장치의 제조 방법
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
KR20070067995A (ko) * 2005-12-26 2007-06-29 엘지.필립스 엘시디 주식회사 평판표시소자의 제조장치 및 그 제조방법
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
JP4973089B2 (ja) * 2006-09-25 2012-07-11 凸版印刷株式会社 熱インプリント用モールド
US7832416B2 (en) 2006-10-10 2010-11-16 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and methods
US7791708B2 (en) * 2006-12-27 2010-09-07 Asml Netherlands B.V. Lithographic apparatus, substrate table, and method for enhancing substrate release properties
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
KR100988437B1 (ko) * 2007-09-21 2010-10-18 주식회사 엘지화학 네가티브 포토레지스트를 이용한 유리 또는 금속 식각방법 및 이를 이용한 클리쉐의 제조방법
EP2138896B1 (en) * 2008-06-25 2014-08-13 Obducat AB Nano imprinting method and apparatus
WO2011135533A2 (en) 2010-04-28 2011-11-03 Kimberly-Clark Worldwide, Inc. Nanopatterned medical device with enhanced cellular interaction
EP3542851B1 (en) 2011-10-27 2021-12-15 Sorrento Therapeutics, Inc. Implantable devices for delivery of bioactive agents
WO2013132079A1 (en) 2012-03-08 2013-09-12 Danmarks Tekniske Universitet Silane based coating of aluminium mold
CN108931884A (zh) * 2017-05-27 2018-12-04 蓝思科技（长沙）有限公司 压印膜及压印装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8600809A (nl) * 1986-03-28 1987-10-16 Philips Nv Methode om een matrijs te voorzien van een loslaag.
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6027595A (en) * 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
WO2001053889A1 (en) * 2000-01-21 2001-07-26 Obducat Aktiebolag A mold for nano imprinting
EP1193056A1 (en) * 2000-09-29 2002-04-03 International Business Machines Corporation Silicone elastomer stamp with hydrophilic surfaces and method of making same
US7687007B2 (en) * 2002-06-20 2010-03-30 Obducat Ab Mold for nano imprinting

Also Published As

Publication number Publication date
WO2003005124A1 (en) 2003-01-16
US20050039618A1 (en) 2005-02-24
US7137336B2 (en) 2006-11-21
EP1402318A1 (en) 2004-03-31
SE0102411L (sv) 2003-01-06
JP3920850B2 (ja) 2007-05-30
JP2004534663A (ja) 2004-11-18
SE0102411D0 (sv) 2001-07-05

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