SE461980B - Foerfarande foer kemisk aangavsaettning av vanadinoxidfilmer - Google Patents
Foerfarande foer kemisk aangavsaettning av vanadinoxidfilmerInfo
- Publication number
- SE461980B SE461980B SE8300497A SE8300497A SE461980B SE 461980 B SE461980 B SE 461980B SE 8300497 A SE8300497 A SE 8300497A SE 8300497 A SE8300497 A SE 8300497A SE 461980 B SE461980 B SE 461980B
- Authority
- SE
- Sweden
- Prior art keywords
- vanadium
- glass
- compound
- vanadium oxide
- glass substrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 23
- 239000000126 substance Substances 0.000 title description 3
- 239000011521 glass Substances 0.000 claims description 64
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 47
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical group [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 34
- 229910052720 vanadium Inorganic materials 0.000 claims description 30
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 30
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 15
- LMHHRCOWPQNFTF-UHFFFAOYSA-N s-propan-2-yl azepane-1-carbothioate Chemical compound CC(C)SC(=O)N1CCCCCC1 LMHHRCOWPQNFTF-UHFFFAOYSA-N 0.000 claims description 14
- 238000005229 chemical vapour deposition Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- 230000001590 oxidative effect Effects 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 7
- 150000003682 vanadium compounds Chemical class 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 43
- 230000008859 change Effects 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 16
- 238000000576 coating method Methods 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 11
- 230000007704 transition Effects 0.000 description 11
- 239000000523 sample Substances 0.000 description 9
- 230000003595 spectral effect Effects 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 5
- 239000003570 air Substances 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 239000010734 process oil Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- -1 silver halides Chemical class 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 description 1
- 241000755266 Kathetostoma giganteum Species 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- KFAFTZQGYMGWLU-UHFFFAOYSA-N oxo(oxovanadiooxy)vanadium Chemical compound O=[V]O[V]=O KFAFTZQGYMGWLU-UHFFFAOYSA-N 0.000 description 1
- VVRQVWSVLMGPRN-UHFFFAOYSA-N oxotungsten Chemical class [W]=O VVRQVWSVLMGPRN-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003482 tantalum compounds Chemical class 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/27—Oxides by oxidation of a coating previously applied
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/322—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/344,906 US4401690A (en) | 1982-02-01 | 1982-02-01 | Thermochromic vanadium oxide with depressed switching temperature |
US06/344,257 US4393095A (en) | 1982-02-01 | 1982-02-01 | Chemical vapor deposition of vanadium oxide coatings |
US06/344,860 US4400412A (en) | 1982-02-01 | 1982-02-01 | Thermochromic vanadium oxide coated glass |
Publications (3)
Publication Number | Publication Date |
---|---|
SE8300497D0 SE8300497D0 (sv) | 1983-01-31 |
SE8300497L SE8300497L (sv) | 1983-08-02 |
SE461980B true SE461980B (sv) | 1990-04-23 |
Family
ID=27407607
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8300497A SE461980B (sv) | 1982-02-01 | 1983-01-31 | Foerfarande foer kemisk aangavsaettning av vanadinoxidfilmer |
SE8803445A SE462801B (sv) | 1982-02-01 | 1988-09-28 | Foerfarande foer framstaellning av ett termokromt foenster |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8803445A SE462801B (sv) | 1982-02-01 | 1988-09-28 | Foerfarande foer framstaellning av ett termokromt foenster |
Country Status (7)
Country | Link |
---|---|
AU (2) | AU546405B2 (es) |
DE (2) | DE3303154A1 (es) |
ES (1) | ES8504643A1 (es) |
FR (1) | FR2520727B1 (es) |
GB (1) | GB2114965B (es) |
IT (1) | IT1160718B (es) |
SE (2) | SE461980B (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0314330B1 (en) * | 1987-10-26 | 1993-10-06 | Pfizer Inc. | Microbiological process for making uk-61.689 and microorganisms useful therefor |
DE19613221C2 (de) * | 1996-04-02 | 2001-02-22 | Fraunhofer Ges Forschung | Sonnenschutzverglasung |
AU4505899A (en) | 1998-06-03 | 1999-12-20 | Bruno K. Meyer | Thermochromic coating |
GB9822338D0 (en) | 1998-10-13 | 1998-12-09 | Glaverbel | Solar control coated glass |
EP1129149A1 (en) * | 1999-08-24 | 2001-09-05 | Koninklijke Philips Electronics N.V. | Substrate provided with a layer of thermochromic oxide |
FR2809388B1 (fr) | 2000-05-23 | 2002-12-20 | Saint Gobain Vitrage | Vitrage comprenant au moins une couche a proprietes thermochromes |
GB0614545D0 (en) | 2006-07-21 | 2006-08-30 | Univ London | Coating Film |
DE102007061272A1 (de) * | 2007-12-19 | 2009-06-25 | Schott Ag | Schichten, insbesondere photonische Schichten, enthaltend thermochrome Verbindungen, auf Glas- oder Glaskeramiksubstraten |
US8100190B2 (en) | 2009-08-11 | 2012-01-24 | Halliburton Energy Services, Inc. | Methods for swelling swellable elements in a portion of a well using a water-in-oil emulsion |
US11292962B2 (en) | 2011-09-29 | 2022-04-05 | The Research Foundation For The State University Of New York | Doped nanoparticles and methods of making and using same |
KR101278058B1 (ko) * | 2011-12-08 | 2013-06-24 | 삼성코닝정밀소재 주식회사 | 써모크로믹 글라스 제조방법 |
DE102012012219B4 (de) | 2012-06-21 | 2014-12-24 | Justus-Liebig-Universität Giessen | Thermochrome Schicht für Glas, Verfahren zur Herstellung einer thermochromen Schicht und Verwendung einer thermochromen Schicht |
DE102020132629A1 (de) | 2020-01-07 | 2021-07-08 | Taniobis Gmbh | Wolfram(VI)oxidtetrachlorid mit hoher Reinheit und Verfahren zu dessen Herstellung |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3410710A (en) * | 1959-10-16 | 1968-11-12 | Corning Glass Works | Radiation filters |
US3438803A (en) * | 1965-05-18 | 1969-04-15 | Anchor Hocking Glass Corp | Method and means for vapor coating |
US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
CH504006A (fr) * | 1969-01-30 | 1971-02-28 | Pilkington Brothers Ltd | Filtre optique |
US3951100A (en) | 1972-12-15 | 1976-04-20 | Ppg Industries, Inc. | Chemical vapor deposition of coatings |
IT996924B (it) | 1972-12-21 | 1975-12-10 | Glaverbel | Procedimento per formare uno strato di ossido metallico |
US3914515A (en) * | 1973-07-16 | 1975-10-21 | Rca Corp | Process for forming transition metal oxide films on a substrate and photomasks therefrom |
US4307942A (en) * | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
-
1983
- 1983-01-28 AU AU10859/83A patent/AU546405B2/en not_active Ceased
- 1983-01-31 DE DE19833303154 patent/DE3303154A1/de active Granted
- 1983-01-31 SE SE8300497A patent/SE461980B/sv not_active IP Right Cessation
- 1983-01-31 DE DE3347918A patent/DE3347918C2/de not_active Expired
- 1983-01-31 IT IT19371/83A patent/IT1160718B/it active
- 1983-02-01 FR FR8301524A patent/FR2520727B1/fr not_active Expired
- 1983-02-01 ES ES519443A patent/ES8504643A1/es not_active Expired
- 1983-02-01 GB GB08302654A patent/GB2114965B/en not_active Expired
-
1985
- 1985-07-11 AU AU44817/85A patent/AU559271B2/en not_active Ceased
-
1988
- 1988-09-28 SE SE8803445A patent/SE462801B/sv not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU559271B2 (en) | 1987-03-05 |
DE3303154C2 (es) | 1989-08-03 |
AU546405B2 (en) | 1985-08-29 |
AU1085983A (en) | 1983-08-11 |
FR2520727A1 (fr) | 1983-08-05 |
ES519443A0 (es) | 1985-04-16 |
GB8302654D0 (en) | 1983-03-02 |
DE3347918A1 (es) | 1985-05-15 |
AU4481785A (en) | 1985-10-31 |
GB2114965B (en) | 1985-08-29 |
IT1160718B (it) | 1987-03-11 |
FR2520727B1 (fr) | 1986-02-07 |
DE3347918C2 (es) | 1989-02-09 |
DE3303154A1 (de) | 1983-08-11 |
SE8300497D0 (sv) | 1983-01-31 |
ES8504643A1 (es) | 1985-04-16 |
SE462801B (sv) | 1990-09-03 |
SE8300497L (sv) | 1983-08-02 |
GB2114965A (en) | 1983-09-01 |
SE8803445D0 (sv) | 1988-09-28 |
SE8803445L (sv) | 1988-09-28 |
IT8319371A0 (it) | 1983-01-31 |
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