SE456607B - Elektrooptisk metanordning - Google Patents

Elektrooptisk metanordning

Info

Publication number
SE456607B
SE456607B SE8104772A SE8104772A SE456607B SE 456607 B SE456607 B SE 456607B SE 8104772 A SE8104772 A SE 8104772A SE 8104772 A SE8104772 A SE 8104772A SE 456607 B SE456607 B SE 456607B
Authority
SE
Sweden
Prior art keywords
pattern
light
layer
grating
deposited
Prior art date
Application number
SE8104772A
Other languages
English (en)
Swedish (sv)
Other versions
SE8104772L (sv
Inventor
K E Erickson
Original Assignee
Cubic Precision Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cubic Precision Inc filed Critical Cubic Precision Inc
Publication of SE8104772L publication Critical patent/SE8104772L/
Publication of SE456607B publication Critical patent/SE456607B/sv

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C11/00Photogrammetry or videogrammetry, e.g. stereogrammetry; Photographic surveying
    • G01C11/04Interpretation of pictures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
SE8104772A 1980-08-11 1981-08-10 Elektrooptisk metanordning SE456607B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/176,886 US4286871A (en) 1980-08-11 1980-08-11 Photogrammetric measuring system

Publications (2)

Publication Number Publication Date
SE8104772L SE8104772L (sv) 1982-02-12
SE456607B true SE456607B (sv) 1988-10-17

Family

ID=22646279

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8104772A SE456607B (sv) 1980-08-11 1981-08-10 Elektrooptisk metanordning

Country Status (8)

Country Link
US (1) US4286871A ( )
JP (1) JPS6029044B2 ( )
CA (1) CA1154585A ( )
CH (1) CH645186A5 ( )
DE (1) DE3131269C2 ( )
FR (1) FR2488395A1 ( )
IT (1) IT1137863B ( )
SE (1) SE456607B ( )

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4538105A (en) * 1981-12-07 1985-08-27 The Perkin-Elmer Corporation Overlay test wafer
US4475811A (en) * 1983-04-28 1984-10-09 The Perkin-Elmer Corporation Overlay test measurement systems
JPS60118912U (ja) * 1984-01-18 1985-08-12 アルプス電気株式会社 反射型光学式ロ−タリエンコ−ダのコ−ドホイ−ル
JPS60217361A (ja) * 1984-04-13 1985-10-30 Alps Electric Co Ltd 光反射式コ−ド板
IT1179627B (it) * 1984-05-02 1987-09-16 Olivetti & Co Spa Disco otturatore per trasduttore ottico
JPS6196410A (ja) * 1984-10-17 1986-05-15 Asahi Chem Ind Co Ltd ロ−タリ−エンコ−ダ−用デイスクの製造法
GB8615197D0 (en) * 1986-06-21 1986-07-23 Renishaw Plc Opto-electronic scale reading apparatus
US5021649A (en) * 1989-03-28 1991-06-04 Canon Kabushiki Kaisha Relief diffraction grating encoder
JPH11183199A (ja) * 1997-12-25 1999-07-09 Merutekku:Kk フォトセンサー用スケール
DE10011872A1 (de) 2000-03-10 2001-09-27 Heidenhain Gmbh Dr Johannes Reflexions-Messteilung und Verfahren zur Herstellung derselben
DE10150099A1 (de) * 2001-10-11 2003-04-17 Heidenhain Gmbh Dr Johannes Verfahren zur Herstellung eines Maßstabes, sowie derart hergestellter Maßstab und eine Positionsmesseinrichtung
JP4280509B2 (ja) * 2003-01-31 2009-06-17 キヤノン株式会社 投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法
US7235280B2 (en) * 2003-11-12 2007-06-26 Srs Technologies, Inc. Non-intrusive photogrammetric targets
US7470892B2 (en) * 2004-03-03 2008-12-30 Mitsubishi Denki Kabushiki Kaisha Optical encoder
EP2051047B1 (en) * 2007-06-01 2019-12-25 Mitutoyo Corporation Reflective encoder, scale thereof, and method for manufacturing scale
KR102617793B1 (ko) * 2022-12-27 2023-12-27 주식회사 휴라이트 수소 발생 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3116555A (en) * 1958-12-01 1964-01-07 Canadian Patents Dev Photogrammetric plotter
US3330964A (en) * 1963-09-09 1967-07-11 Itck Corp Photoelectric coordinate measuring system
DE1548707C3 (de) * 1966-07-26 1979-02-15 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Fotoelektrischer Schrittgeber
US3839039A (en) * 1969-11-18 1974-10-01 Fuji Photo Optical Co Ltd Process for producing color stripe filter
CA921695A (en) * 1970-01-19 1973-02-27 National Research Council Of Canada Stereocompiler
GB1353470A (en) * 1970-10-19 1974-05-15 Post D Position measuring apparatus utilizing moire fringe multiplication
US3768911A (en) * 1971-08-17 1973-10-30 Keuffel & Esser Co Electro-optical incremental motion and position indicator
US3877810A (en) * 1972-11-08 1975-04-15 Rca Corp Method for making a photomask
US3873203A (en) * 1973-03-19 1975-03-25 Motorola Inc Durable high resolution silicon template
CH626169A5 ( ) * 1976-11-25 1981-10-30 Leitz Ernst Gmbh

Also Published As

Publication number Publication date
JPS6029044B2 (ja) 1985-07-08
JPS5763414A (en) 1982-04-16
CH645186A5 (fr) 1984-09-14
DE3131269A1 (de) 1982-04-08
DE3131269C2 (de) 1985-08-22
FR2488395A1 (fr) 1982-02-12
FR2488395B1 ( ) 1985-03-29
US4286871A (en) 1981-09-01
SE8104772L (sv) 1982-02-12
IT8123461A0 (it) 1981-08-10
CA1154585A (en) 1983-10-04
IT1137863B (it) 1986-09-10

Similar Documents

Publication Publication Date Title
SE456607B (sv) Elektrooptisk metanordning
US4286838A (en) Compact optical structure with integrated source
KR900001269B1 (ko) 노출 마스크와 대상물을 얼라인먼트하는 노출장치 및 그 방법
JP3064433B2 (ja) 位置合わせ装置およびそれを備えた投影露光装置
SU1450761A3 (ru) Устройство дл измерени относительных перемещений двух объектов
JPS6347616A (ja) 移動量測定方法
US20190101373A1 (en) Apparatus for measuring thickness and surface profile of multilayered film structure using imaging spectral optical system and measuring method
JPH056853A (ja) 近接リソグラフイツクシステムにおける横位置測定装置及びその方法
US4708437A (en) Incident-light phase grid and method for making same
EP0652487A1 (en) Rotational deviation detecting method and system using a periodic pattern
US6982796B2 (en) Wavefront splitting element for EUV light and phase measuring apparatus using the same
GB2301884A (en) Characterising multilayer thin film systems by interferometry
JPH07198423A (ja) 測長または測角装置
JP2005127830A (ja) 形状プロファイル測定装置およびそれを用いた半導体デバイスの製造方法
JP2775519B2 (ja) 参照レティクルを用いた2重焦点装置
JP2614863B2 (ja) X線縮小投影露光装置
JPH0626178B2 (ja) パターン位置検出方法とその装置
JP3010875B2 (ja) 縮小投影式露光装置
JPS6122626A (ja) 投影露光装置
SU1615657A1 (ru) Устройство дл копировани голографических дифракционных решеток
JPH05144704A (ja) 光投影露光装置
JP2789787B2 (ja) 位置検出装置
CN111352304A (zh) 调焦调平装置、光刻设备及调焦调平方法
Jones The Optical Micrometer
TW202340790A (zh) 緊湊型光學顯微鏡、包含光學顯微鏡之度量衡器及包含度量衡器之晶圓定位度量衡裝置

Legal Events

Date Code Title Description
NUG Patent has lapsed

Ref document number: 8104772-2

Effective date: 19940310

Format of ref document f/p: F