SE437585B - Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad - Google Patents
Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltradInfo
- Publication number
- SE437585B SE437585B SE8006463A SE8006463A SE437585B SE 437585 B SE437585 B SE 437585B SE 8006463 A SE8006463 A SE 8006463A SE 8006463 A SE8006463 A SE 8006463A SE 437585 B SE437585 B SE 437585B
- Authority
- SE
- Sweden
- Prior art keywords
- wire
- electron beam
- electron
- metal wire
- beam apparatus
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 15
- 239000002184 metal Substances 0.000 title claims description 15
- 238000010894 electron beam technology Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims 2
- 238000002844 melting Methods 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7906958A NL7906958A (nl) | 1979-09-19 | 1979-09-19 | Metaaldraadkathode voor elektronenstraalapparaat. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE8006463L SE8006463L (sv) | 1981-03-20 |
| SE437585B true SE437585B (sv) | 1985-03-04 |
Family
ID=19833868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE8006463A SE437585B (sv) | 1979-09-19 | 1980-09-16 | Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US4419561A (it) |
| JP (1) | JPS5652856A (it) |
| BR (1) | BR8008838A (it) |
| CA (1) | CA1151320A (it) |
| DE (1) | DE3034598C2 (it) |
| FR (1) | FR2466096A1 (it) |
| GB (1) | GB2059149B (it) |
| IT (1) | IT1141056B (it) |
| NL (1) | NL7906958A (it) |
| SE (1) | SE437585B (it) |
| WO (1) | WO1981000929A1 (it) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8302275A (nl) * | 1983-06-28 | 1985-01-16 | Philips Nv | Electronenstraalapparaat met metaaldraadbron. |
| CN86105432A (zh) * | 1985-09-27 | 1987-05-27 | 美国电话电报公司 | 带电粒子束曝光 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL74193C (it) * | 1948-05-10 | |||
| US3466487A (en) * | 1967-06-16 | 1969-09-09 | United Aircraft Corp | Device for moving a beam of charged particles |
| NL7018701A (it) * | 1970-12-23 | 1972-06-27 | ||
| JPS4929969A (it) * | 1972-07-20 | 1974-03-16 | ||
| JPS5357760A (en) * | 1976-11-04 | 1978-05-25 | Fujitsu Ltd | Electron beam exposure apparatus |
| JPS5412675A (en) * | 1977-06-30 | 1979-01-30 | Jeol Ltd | Electon beam exposure method |
-
1979
- 1979-09-19 NL NL7906958A patent/NL7906958A/nl not_active Application Discontinuation
-
1980
- 1980-09-13 DE DE3034598A patent/DE3034598C2/de not_active Expired
- 1980-09-15 GB GB8029777A patent/GB2059149B/en not_active Expired
- 1980-09-15 FR FR8019846A patent/FR2466096A1/fr active Granted
- 1980-09-16 IT IT24696/80A patent/IT1141056B/it active
- 1980-09-16 SE SE8006463A patent/SE437585B/sv not_active IP Right Cessation
- 1980-09-17 CA CA000360401A patent/CA1151320A/en not_active Expired
- 1980-09-18 WO PCT/NL1980/000030 patent/WO1981000929A1/en not_active Ceased
- 1980-09-18 US US06/217,885 patent/US4419561A/en not_active Expired - Lifetime
- 1980-09-18 BR BR8008838A patent/BR8008838A/pt unknown
- 1980-09-19 JP JP13054780A patent/JPS5652856A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| CA1151320A (en) | 1983-08-02 |
| GB2059149B (en) | 1984-01-18 |
| DE3034598C2 (de) | 1985-05-15 |
| FR2466096A1 (fr) | 1981-03-27 |
| FR2466096B1 (it) | 1984-12-14 |
| IT8024696A0 (it) | 1980-09-16 |
| US4419561A (en) | 1983-12-06 |
| DE3034598A1 (de) | 1981-04-09 |
| WO1981000929A1 (en) | 1981-04-02 |
| GB2059149A (en) | 1981-04-15 |
| NL7906958A (nl) | 1981-03-23 |
| SE8006463L (sv) | 1981-03-20 |
| JPS6329782B2 (it) | 1988-06-15 |
| JPS5652856A (en) | 1981-05-12 |
| IT1141056B (it) | 1986-10-01 |
| BR8008838A (pt) | 1981-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3730666B2 (ja) | 大電流リボンビーム注入装置 | |
| DE69408017T2 (de) | Ionen implantierer | |
| EP1618587B1 (en) | Beam uniformity and angular distribution measurement system | |
| Cutler et al. | Thermal velocity effects in electron guns | |
| KR20030012855A (ko) | 병진 가능한 받침대와 패러데이 컵을 이용한 충전입자균일 주사 장치 및 방법 | |
| WO1998002900A9 (en) | High current ribbon beam ion implanter | |
| US5193105A (en) | Ion controlling electrode assembly for a scanning electron beam computed tomography scanner | |
| CN113169011B (zh) | 用于高生产量扫描束离子注入机的扫描和校正器磁体设计 | |
| US3450824A (en) | Method and apparatus for producing and directing an electron beam | |
| JPS62272437A (ja) | イオン注入装置用質量分析装置 | |
| SE437585B (sv) | Elektronstraleapparat med en elektronkella som innefattar en katod med en metalltrad | |
| US20200211816A1 (en) | Ion implanter and measuring device | |
| JP2009516335A (ja) | イオン注入装置のセグメント化された電界レンズを提供する技術 | |
| TWI490909B (zh) | 離子植入系統中所使用的電極用終端 | |
| KR100920433B1 (ko) | 분석용 전자석 | |
| JP2665819B2 (ja) | イオン注入装置 | |
| Keller | Beam scanning-electrostatic | |
| US10102999B2 (en) | Asymmetric core quadrupole with concave pole tips | |
| TW202201458A (zh) | 聚焦離子束加工裝置 | |
| US20130009075A1 (en) | Beam line system of ion implanter | |
| JPH02144835A (ja) | Ｘ線管の陰極構体 | |
| JPS62272434A (ja) | イオン注入装置用質量分析装置 | |
| JPS62232838A (ja) | 液体金属イオン源 | |
| JP3356494B2 (ja) | 高周波多重極線型加速器 | |
| GB1076885A (en) | Improvements in or relating to electron beam generators |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |
Ref document number: 8006463-7 Effective date: 19891006 Format of ref document f/p: F |