SE416309B - Fotosentiv elastomer komposition - Google Patents

Fotosentiv elastomer komposition

Info

Publication number
SE416309B
SE416309B SE7601250A SE7601250A SE416309B SE 416309 B SE416309 B SE 416309B SE 7601250 A SE7601250 A SE 7601250A SE 7601250 A SE7601250 A SE 7601250A SE 416309 B SE416309 B SE 416309B
Authority
SE
Sweden
Prior art keywords
elastomes
photosentive
composition
photosentive elastomes
elastomes composition
Prior art date
Application number
SE7601250A
Other languages
English (en)
Other versions
SE7601250L (sv
Inventor
Gwendyline Y Y T Chen
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of SE7601250L publication Critical patent/SE7601250L/sv
Publication of SE416309B publication Critical patent/SE416309B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
SE7601250A 1971-04-01 1976-02-05 Fotosentiv elastomer komposition SE416309B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13047071A 1971-04-01 1971-04-01

Publications (2)

Publication Number Publication Date
SE7601250L SE7601250L (sv) 1976-02-05
SE416309B true SE416309B (sv) 1980-12-15

Family

ID=22444838

Family Applications (2)

Application Number Title Priority Date Filing Date
SE7204111A SE441044B (sv) 1971-04-01 1972-03-29 Fotosensitivt element till anvendning som flexografisk tryckplat eller som fotoresist
SE7601250A SE416309B (sv) 1971-04-01 1976-02-05 Fotosentiv elastomer komposition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE7204111A SE441044B (sv) 1971-04-01 1972-03-29 Fotosensitivt element till anvendning som flexografisk tryckplat eller som fotoresist

Country Status (8)

Country Link
US (2) US4323637A (sv)
JP (1) JPS5143374B1 (sv)
CA (1) CA1099435A (sv)
DE (1) DE2215090C3 (sv)
FR (1) FR2136129A5 (sv)
GB (1) GB1366769A (sv)
NL (1) NL165302C (sv)
SE (2) SE441044B (sv)

Families Citing this family (254)

* Cited by examiner, † Cited by third party
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NL165302B (nl) 1980-10-15
CA1099435A (en) 1981-04-14
US4323637A (en) 1982-04-06
FR2136129A5 (sv) 1972-12-22
DE2215090C3 (de) 1981-02-12
SE7601250L (sv) 1976-02-05
NL165302C (nl) 1983-06-16
JPS5143374B1 (sv) 1976-11-20
DE2215090A1 (de) 1972-10-12
GB1366769A (en) 1974-09-11
NL7204392A (sv) 1972-10-03
SE441044B (sv) 1985-09-02
US4369246A (en) 1983-01-18

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