SE383582B - SEMICONDUCTOR DEVICE AND KIT FOR ITS MANUFACTURE - Google Patents
SEMICONDUCTOR DEVICE AND KIT FOR ITS MANUFACTUREInfo
- Publication number
- SE383582B SE383582B SE467372A SE467372A SE383582B SE 383582 B SE383582 B SE 383582B SE 467372 A SE467372 A SE 467372A SE 467372 A SE467372 A SE 467372A SE 383582 B SE383582 B SE 383582B
- Authority
- SE
- Sweden
- Prior art keywords
- kit
- manufacture
- semiconductor device
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76205—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
- H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0826—Combination of vertical complementary transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/098—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being PN junction gate field-effect transistors
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7105000A NL7105000A (en) | 1971-04-14 | 1971-04-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
SE383582B true SE383582B (en) | 1976-03-15 |
Family
ID=19812915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE467372A SE383582B (en) | 1971-04-14 | 1972-04-11 | SEMICONDUCTOR DEVICE AND KIT FOR ITS MANUFACTURE |
Country Status (11)
Country | Link |
---|---|
AU (1) | AU470407B2 (en) |
BE (1) | BE782012A (en) |
BR (1) | BR7202251D0 (en) |
CH (1) | CH539952A (en) |
DE (1) | DE2216642C3 (en) |
ES (1) | ES401687A1 (en) |
FR (1) | FR2133692B1 (en) |
GB (1) | GB1387021A (en) |
IT (1) | IT951314B (en) |
NL (1) | NL7105000A (en) |
SE (1) | SE383582B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL161301C (en) * | 1972-12-29 | 1980-01-15 | Philips Nv | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURE THEREOF. |
JPS5534619U (en) * | 1978-08-25 | 1980-03-06 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE740938A (en) * | 1967-12-05 | 1970-04-01 |
-
1971
- 1971-04-14 NL NL7105000A patent/NL7105000A/xx not_active Application Discontinuation
-
1972
- 1972-04-07 DE DE19722216642 patent/DE2216642C3/en not_active Expired
- 1972-04-10 AU AU40936/72A patent/AU470407B2/en not_active Expired
- 1972-04-11 GB GB1660972A patent/GB1387021A/en not_active Expired
- 1972-04-11 IT IT2301772A patent/IT951314B/en active
- 1972-04-11 CH CH531272A patent/CH539952A/en not_active IP Right Cessation
- 1972-04-11 SE SE467372A patent/SE383582B/en unknown
- 1972-04-12 ES ES401687A patent/ES401687A1/en not_active Expired
- 1972-04-12 BE BE782012A patent/BE782012A/en unknown
- 1972-04-13 FR FR7213006A patent/FR2133692B1/fr not_active Expired
- 1972-04-14 BR BR225172A patent/BR7202251D0/en unknown
Also Published As
Publication number | Publication date |
---|---|
BE782012A (en) | 1972-10-13 |
DE2216642C3 (en) | 1979-12-13 |
FR2133692B1 (en) | 1977-08-19 |
GB1387021A (en) | 1975-03-12 |
DE2216642A1 (en) | 1972-10-19 |
FR2133692A1 (en) | 1972-12-01 |
ES401687A1 (en) | 1975-03-16 |
AU4093672A (en) | 1973-10-18 |
CH539952A (en) | 1973-07-31 |
AU470407B2 (en) | 1973-10-18 |
DE2216642B2 (en) | 1979-04-12 |
IT951314B (en) | 1973-06-30 |
BR7202251D0 (en) | 1973-06-07 |
NL7105000A (en) | 1972-10-17 |
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