SE381530B - Skikt av material med elektrisk ledningsformaga pa ett hogohmigt underlag samt forfarande for framstellning av skiktet - Google Patents

Skikt av material med elektrisk ledningsformaga pa ett hogohmigt underlag samt forfarande for framstellning av skiktet

Info

Publication number
SE381530B
SE381530B SE7211940A SE1194072A SE381530B SE 381530 B SE381530 B SE 381530B SE 7211940 A SE7211940 A SE 7211940A SE 1194072 A SE1194072 A SE 1194072A SE 381530 B SE381530 B SE 381530B
Authority
SE
Sweden
Prior art keywords
layer
hogohmig
procedure
manufacture
substrate
Prior art date
Application number
SE7211940A
Other languages
English (en)
Swedish (sv)
Inventor
E Krimmel
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19712146662 external-priority patent/DE2146662C3/de
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE381530B publication Critical patent/SE381530B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
SE7211940A 1971-09-17 1972-09-15 Skikt av material med elektrisk ledningsformaga pa ett hogohmigt underlag samt forfarande for framstellning av skiktet SE381530B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712146662 DE2146662C3 (de) 1971-09-17 Verfahren zur Herstellung einer elektrisch leitfähigen Schicht

Publications (1)

Publication Number Publication Date
SE381530B true SE381530B (sv) 1975-12-08

Family

ID=5819937

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7211940A SE381530B (sv) 1971-09-17 1972-09-15 Skikt av material med elektrisk ledningsformaga pa ett hogohmigt underlag samt forfarande for framstellning av skiktet

Country Status (12)

Country Link
US (1) US3818413A (fr)
JP (1) JPS4839180A (fr)
AT (1) AT321411B (fr)
BE (1) BE788894A (fr)
CA (1) CA968864A (fr)
CH (1) CH566063A5 (fr)
FR (1) FR2152942B1 (fr)
GB (1) GB1387166A (fr)
IT (1) IT967539B (fr)
LU (1) LU66097A1 (fr)
NL (1) NL7212362A (fr)
SE (1) SE381530B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3898607A (en) * 1974-02-28 1975-08-05 Motorola Inc High value vertical resistors by ion implantation and method for making same
US4318072A (en) * 1979-09-04 1982-03-02 Vishay Intertechnology, Inc. Precision resistor with improved temperature characteristics
DE3138960A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Verfahren zur erzeugung elektrisch leitender schichten
JPS59162580A (ja) * 1983-03-08 1984-09-13 Fuji Photo Film Co Ltd 電子写真装置用プロセスヘツド
US6373118B1 (en) * 1999-08-11 2002-04-16 Lewyn Consulting, Inc. High-value integrated circuit resistor
CN110824137B (zh) * 2019-10-10 2022-03-11 中国建筑材料科学研究总院有限公司 低辐射玻璃中银膜在衬底上结晶有序性的预测方法及装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999339A (en) * 1956-12-07 1961-09-12 Bansch & Lomb Inc Method of providing an electrically conductive surface
US3287161A (en) * 1962-10-01 1966-11-22 Xerox Corp Method for forming a thin film resistor
US3380156A (en) * 1965-11-15 1968-04-30 Trw Inc Method of fabricating thin film resistors
US3562022A (en) * 1967-12-26 1971-02-09 Hughes Aircraft Co Method of doping semiconductor bodies by indirection implantation
US3585088A (en) * 1968-10-18 1971-06-15 Ibm Methods of producing single crystals on supporting substrates

Also Published As

Publication number Publication date
DE2146662B2 (de) 1976-04-08
US3818413A (en) 1974-06-18
GB1387166A (en) 1975-03-12
IT967539B (it) 1974-03-11
FR2152942A1 (fr) 1973-04-27
BE788894A (fr) 1973-01-02
JPS4839180A (fr) 1973-06-08
LU66097A1 (fr) 1973-01-17
CA968864A (en) 1975-06-03
CH566063A5 (fr) 1975-08-29
DE2146662A1 (de) 1973-03-22
NL7212362A (fr) 1973-03-20
AT321411B (de) 1975-03-25
FR2152942B1 (fr) 1976-08-13

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